Abstract: A hydrazide compound represented by the formula (1): has excellent pesticidal activity.

Abstract: A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

Abstract: A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

Abstract: A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

Abstract: A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

Abstract: The imidazo[1,2-a]pyrimidines given by the following formula [I]: [wherein R1 and R2 represent a C1–C6 alkyl group optionally substituted by one or more selected from the group consisting of C1–C4 alkoxy group, C2–C8 dialkylamino group, C1–C4 alkylthio group, C2–C5 alkoxycarbonyl group, cyano group and halogen atoms; or R1 and R2 represent a 3–8 membered heterocyclic group together with the nitrogen atom bonded with R1 and R2; R3 represents a halogen atom or C1–C4 alkyl group; and Ar represents a phenyl group optionally substituted by a halogen atom or atoms; and the like] have excellent activity for controlling plant diseases.

Abstract: A sidewall rubber disposed outside of a carcass layer, reinforcing a portion between beads, in a widthwise direction of the tire is configured from a wide rubber ribbon having a width of 20 to 100 mm wound spirally along a circumferential direction of the tire outward of the tire such that the rubber ribbon is deviated radially outward of the tire.

Abstract: An object of the invention is to provide a brake apparatus which can facilitate slope starting and slope climbing and which can be produced small in size and light in weight. In addition, another object of the invention is to provide a brake apparatus which can obtain a stable brake force under any conditions including running in the rain. The invention provides a brake apparatus in which a restriction is imposed on the rotation of a wheel (101) via a brake drum (3) provided on a rotational shaft of the wheel (101) so as to rotate together with the rotational shaft, the brake apparatus being characterized by comprising a brake shoe (30) for imposing a restriction on the rotation of the brake drum (3) in a forward or backward direction through wedge engagement with an inner circumferential surface of the brake drum (3) when the brake drum (3) rotates either in the forward direction or in the backward.

Abstract: A semiconductor device comprising a substrate, a plurality of dielectric films formed on the substrate, laid one upon another, and a fuse interconnect-wire formed above the substrate and covered with a predetermined one of the dielectric films, and including a fuse main body which is to be blown to electrically disconnect the fuse interconnect-wire, which is smaller than a bottom of a fuse-blowing recess made in the predetermined dielectric film, which has a length not less than the diameter of a fuse-blowing laser beam and which opposes the bottom of the fuse-blowing recess.

Abstract: A semiconductor device is disclosed, which comprises a semiconductor substrate, an interlayer insulation film formed above the semiconductor substrate, a fuse formed on or in the interlayer insulation film, and a wiring layer formed in a portion of the interlayer insulation film, which is under the fuse, the wiring layer being isolated from the fuse and having a width smaller than the fuse.

Abstract: A processing method comprises forming a water-soluble protective film on a first film having a processing area above a substrate irradiating processing light on the processing area selectively with to selectively remove the first film in the processing area and the protective film on the processing area, and removing the protective film with water after the selective irradiating.

Abstract: An apparatus for laser beam machining includes a scanning system configured to move an object in a scanning direction from a first edge of the object to another edge of the object; a beam shaping unit configured to convert a laser beam to an asymmetrical machining laser beam in the scanning direction on a plane orthogonal to an optical axis of the laser beam; and an irradiation optical system configured to irradiate the machining laser beam emitted from the beam shaping unit onto the object.

Abstract: An operating apparatus 1100 of a brake apparatus 1001 for restricting rotation of a brake drum 1003 including an operating lever 1112 and an operation restricting portion 1120 is provided. The operating lever 1112 is supported to be able to operate in a movable range. The movable range includes: a brake release mode permitting rotation of the brake drum 1003 both in regular rotation and reverse rotation; and an auxiliary brake mode restricting only reverse rotation of the brake drum. The operating lever 1112 is urged in a direction reaching the auxiliary brake mode from the brake release mode in a normal state. The operation restricting portion 1120 restricts a movement of the operating lever 1112 reaching the auxiliary brake mode by being brought into contact with the operating lever 1112 in the brake release mode.

Abstract: There is provided a semiconductor device including a semiconductor substrate and a conductive layer above the semiconductor substrate, wherein the conductive layer contains copper, a surface region of the conductive layer contains at least one of C—H bonds and C—C bonds, and a total amount of C atoms forming the C—H bonds and C atoms forming the C—C bonds in the surface region is 30 atomic % or more of a whole amount of elements in the surface region.

Abstract: The imidazo[1,2-a]pyrimidines given by the following formula [I]: 1

Abstract: A flexible hose of the invention has a hose wall which is formed by laminating resin layers. The resin layer acting as a gas barrier is formed by spirally winding a gas barrier resin strip and thermally fusing or bonding axially adjoining edges of the strip to each other. The resin layers are thermally fused or bonded to one another to become one piece.

Abstract: A laser processing apparatus comprises a laser oscillator for producing a laser beam to selectively remove part of a substrate to be processed, a scanning system for applying the laser beam to an arbitrary position of the substrate and incident means for applying the laser beam to the substrate substantially at right angle.

Abstract: An object of the invention is to provide a brake apparatus which can facilitate slope starting and slope climbing and which can be produced small in size and light in weight. In addition, another object of the invention is to provide a brake apparatus which can obtain a stable brake force under any conditions including running in the rain.

Abstract: A laser processing apparatus comprises a laser oscillator for producing a laser beam to selectively remove part of a substrate to be processed, a scanning system for applying the laser beam to an arbitrary position of the substrate and incident means for applying the laser beam to the substrate substantially at right angle.

Abstract: In a laser beam machining method, a liquid, through which a laser beam can be transmitted, is supplied to the target surface of an object to be processed. A laser beam is guided to the target surface through the liquid. The laser beam processes the target surface under the application of ultrasonic vibration.