Patents by Inventor Hiroshi Inokawa

Hiroshi Inokawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10168277
    Abstract: A photodiode includes semiconductor layers and a gate insulating layer provided on a buried insulating layer formed on a substrate and has a diffraction grating portion in which a plurality of groove portions are formed in a two-dimensional lattice shape, on the gate insulating layer. Measurement light is guided by an optical system including a photoelastic modulator and is incident on the photodiode. The measurement light is emitted from the light source device in a state of being linearly polarized light having a predetermined wavelength and is converted at a predetermined frequency by the optical system such that states in which the measurement light becomes linearly polarized light beams of two orthogonal directions are repeated. In addition, electric signals from the photodiode in the state in which the measurement light becomes the linearly polarized light beams of the two orthogonal directions are lock-in detected.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: January 1, 2019
    Assignees: NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY, YAMAHA HATSUDOKI KABUSHIKI KAISHA
    Inventors: Hiroshi Inokawa, Hiroaki Satoh, Atsushi Ono
  • Publication number: 20180011013
    Abstract: A photodiode includes semiconductor layers and a gate insulating layer provided on a buried insulating layer formed on a substrate and has a diffraction grating portion in which a plurality of groove portions are formed in a two-dimensional lattice shape, on the gate insulating layer. Measurement light is guided by an optical system including a photoelastic modulator and is incident on the photodiode. The measurement light is emitted from the light source device in a state of being linearly polarized light having a predetermined wavelength and is converted at a predetermined frequency by the optical system such that states in which the measurement light becomes linearly polarized light beams of two orthogonal directions are repeated. In addition, electric signals from the photodiode in the state in which the measurement light becomes the linearly polarized light beams of the two orthogonal directions are lock-in detected.
    Type: Application
    Filed: February 10, 2016
    Publication date: January 11, 2018
    Inventors: Hiroshi INOKAWA, Hiroaki SATOH, Atsushi ONO
  • Patent number: 7684975
    Abstract: The invention can include a token list generating unit 11 for decomposing a natural language text to be processed into tokens that are components of the natural language text and registering them on a token list, and a token string selecting unit 13 for selecting optimum token strings for composing the natural language text to be processed on the basis of the token list generated by the token list generating unit 11. The token list generating unit 11 registers, on the token list, tokens among the tokens obtained by decomposing the natural language text to be processed except tokens decomposable into smaller tokens according to conditions imposed on the morphological analysis.
    Type: Grant
    Filed: February 12, 2004
    Date of Patent: March 23, 2010
    Assignee: International Business Machines Corporation
    Inventors: Kazuo Aoki, Hiroshi Inokawa, Akihiro Nakayama
  • Patent number: 7121623
    Abstract: A vehicle is provided which enables rear occupants to sit on a rear seat in a vehicle provided with seats arranged in a substantially longitudinal direction while simultaneously securing the comfort and safety of the rear occupants in a relatively small vehicle. The seat structure of the vehicle includes a wide rear seat provided with right and left seated parts for rear occupants M2, M2 at a rear side of a front seat for a driver. A backrest corresponding to the right and left seated parts is provided on the rear seat that extends diagonally rearward from a center portion thereof toward sides of the vehicle body. Raised, convex portions for regulating the lateral movement of the occupants are provided between each seated part in the rear seat, at the center of the backrest and in the front seat.
    Type: Grant
    Filed: September 23, 2004
    Date of Patent: October 17, 2006
    Assignee: Honda Motor Co., Ltd.
    Inventors: Kiyotaka Fujihara, Koichi Sugioka, Mamoru Otsubo, Eiji Ozawa, Toshikazu Saito, Yumio Shibata, Hiroshi Inokawa
  • Publication number: 20050116517
    Abstract: A vehicle is provided which enables rear occupants to sit on a rear seat in a vehicle provided with seats arranged in a substantially longitudinal direction while simultaneously securing the comfort and safety of the rear occupants in a relatively small vehicle. The seat structure of the vehicle includes a wide rear seat provided with right and left seated parts for rear occupants M2, M2 at a rear side of a front seat for a driver. A backrest corresponding to the right and left seated parts is provided on the rear seat that extends diagonally rearward from a center portion thereof toward sides of the vehicle body. Raised, convex portions for regulating the lateral movement of the occupants are provided between each seated part in the rear seat, at the center of the backrest and in the front seat.
    Type: Application
    Filed: September 23, 2004
    Publication date: June 2, 2005
    Applicant: HONDA MOTOR CO., LTD.
    Inventors: Kiyotaka Fujihara, Koichi Sugioka, Mamoru Otsubo, Eiji Ozawa, Toshikazu Saito, Yumio Shibata, Hiroshi Inokawa
  • Publication number: 20040254784
    Abstract: The invention can include a token list generating unit 11 for decomposing a natural language text to be processed into tokens that are components of the natural language text and registering them on a token list, and a token string selecting unit 13 for selecting optimum token strings for composing the natural language text to be processed on the basis of the token list generated by the token list generating unit 11. The token list generating unit 11 registers, on the token list, tokens among the tokens obtained by decomposing the natural language text to be processed except tokens decomposable into smaller tokens according to conditions imposed on the morphological analysis.
    Type: Application
    Filed: February 12, 2004
    Publication date: December 16, 2004
    Applicant: International Business Machines Corporation
    Inventors: Kazuo Aoki, Hiroshi Inokawa, Akihiro Nakayama
  • Patent number: 6360839
    Abstract: A cooling device is efficiently arranged which simplifies and reduces the weight of piping for the cooling device by shortening the piping. A cooling water pump is arranged on a vertically elongated skid plate at one side of a crankcase. A reservoir tank is located on the other side of the crankcase. The reservoir tank is formed of synthetic resin or similar material. The reservoir tank is housed in a space between the skid plate and a front section of an ACG case of the reservoir tank.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: March 26, 2002
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Naoki Urano, Hiroshi Inokawa
  • Patent number: 6283242
    Abstract: A compact air cleaner for a motorcycle engine has its intake duct directed in a widthwise direction of the motorcycle. The air cleaner includes an air cleaner case, an air cleaner element and a case cover. The air cleaner element partitions an inner portion of the air cleaner case and case cover into a clean room and a dirty room. The air cleaner element extends in the motorcycle's travel direction. An intake port communicates with the dirty room and opens to a space surrounded by a rear face of the clean room, a front portion of a rear fender and a bottom portion of a seat.
    Type: Grant
    Filed: September 10, 1999
    Date of Patent: September 4, 2001
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Akio Umeoka, Hiroshi Inokawa
  • Patent number: 6229165
    Abstract: This invention provides a semiconductor device including a silicon layer, an insulating layer formed on the silicon layer, a first semiconductor device formed on the insulating film to convert light into an electric signal, and a second semiconductor device formed on the insulating film, wherein a silicon region is formed in the silicon layer to shield the second semiconductor device from light, and a through hole extending through the silicon layer except for the silicon region to input light to the first semiconductor device is formed in that portion of the silicon layer corresponding to the lower portions of the first and second semiconductor devices.
    Type: Grant
    Filed: August 28, 1998
    Date of Patent: May 8, 2001
    Assignee: NTT Electronics Corporation
    Inventors: Tetsushi Sakai, Nobuaki Ieda, Masayuki Ino, Shigeru Nakajima, Yukio Akazawa, Tsuneo Mano, Hiroshi Inokawa
  • Patent number: 5585659
    Abstract: A method for fabricating semiconductor devices wherein polysilicon gates for complementary-type field-effect semiconductor devices are formed of polysilicon to which impurity doped simultaneously to the polysilicon deposition; the both gates having the dual N.sup.+ /P.sup.+ polysilicon gate structure, so that the both N- and P-channel transistors are formed as the surface-channel type ones; and therefore, the off-characteristic, the short channel effect, and the controllability of threshold voltage are progressed. More specifically, N- and P-channel MISFETs are provided on a common semiconductor substrate (1); N-type polysilicon (9) doped with N-type impurity is adopted as the gate electrode for the N-channel MISFET; P-type polysilicon (8) doped with P-type impurity is adopted as the gate electrode for the P-channel MISFET; and a narrow region preventing the mutual diffusion of impurities is provided between portions of respective polysilicon.
    Type: Grant
    Filed: October 11, 1994
    Date of Patent: December 17, 1996
    Assignee: Nippon Telegraph And Telephone Corporation
    Inventors: Toshio Kobayashi, Yukio Okazaki, Masayasu Miyake, Hiroshi Inokawa, Takashi Morimoto
  • Patent number: 5382532
    Abstract: A method for fabricating semiconductor devices wherein polysilicon gates for complementary-type field-effect semiconductor devices are formed of polysilicon to which impurity doped simultaneously to the polysilicon deposition; the both gates having the dual N.sup.+ /P.sup.+ polysilicon gate structure, so that the both N- and P-channel transistors are formed as the surface-channel type ones; and therefore, the off-characteristic, the short channel effect, and the controllability of threshold voltage are progressed. More specifically, N- and P-channel MISFETs are provided on a common semiconductor substrate (1); N-type polysilicon (9) doped with N-type impurity is adopted as the gate electrode for the N-channel MISFET; P-type polysilicon (8) doped with P-type impurity is adopted as the gate electrode for the P-channel MISFET; and a narrow region preventing the mutual diffusion of impurities is provided between portions of respective polysilicon.
    Type: Grant
    Filed: September 16, 1992
    Date of Patent: January 17, 1995
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Toshio Kobayashi, Yukio Okazaki, Masayasu Miyake, Hiroshi Inokawa, Takashi Morimoto
  • Patent number: 5213991
    Abstract: In a method of making a MOSFET-type semiconductor device of this invention, a surface of a semiconductor substrate is covered in a predetermined pattern with an insulating layer comprising a silicon-nitride-containing film or with an insulating layer whose top surface and side surfaces bear a silicon-nitride-containing film, thereby forming on the semiconductor substrate a recess region at which the semiconductor substrate is exposed. An epitaxial silicon film and polycrystalline silicon film are formed simultaneously on the exposed semiconductor substrate and on the insulating film, respectively. A whole channel region and a part of source and drain diffused-layer regions are formed in the epitaxial silicon film, and source and drain diffused-layer regions are formed in the polycrystalline silicon film. A gate electrode of this MOSFET-type semiconductor device may be formed at the recess region by a self-align method.
    Type: Grant
    Filed: March 24, 1992
    Date of Patent: May 25, 1993
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Hiroshi Inokawa, Toshio Kobayashi, Kazuhide Kiuchi