Patents by Inventor Hiroshi Kanbara

Hiroshi Kanbara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140296380
    Abstract: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
    Type: Application
    Filed: June 16, 2014
    Publication date: October 2, 2014
    Inventors: Hideto KATO, Hiroshi KANBARA, Tomoyoshi FURIHATA, Yoshinori HIRANO
  • Patent number: 8785114
    Abstract: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
    Type: Grant
    Filed: June 10, 2011
    Date of Patent: July 22, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hideto Kato, Hiroshi Kanbara, Tomoyoshi Furihata, Yoshinori Hirano
  • Publication number: 20110305990
    Abstract: A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, providing the inorganic material film with an aperture, and etching away the sacrificial film pattern through the aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) forming a sacrificial film using a composition comprising a cresol novolac resin and a crosslinker, (B) exposing patternwise the film to first high-energy radiation, (C) developing, and (D) exposing the sacrificial film pattern to second high-energy radiation and heat treating for thereby forming crosslinks within the cresol novolac resin.
    Type: Application
    Filed: June 10, 2011
    Publication date: December 15, 2011
    Inventors: Hideto KATO, Hiroshi Kanbara, Tomoyoshi Furihata, Yoshinori Hirano
  • Publication number: 20060189720
    Abstract: A rubber composition includes (1) a diene rubber, (2) a silica and (3) an epoxidized liquid diene rubber having a number-average molecular weight of 10000 to 100000, wherein based on 100 parts by mass of the diene rubber (1), the rubber composition comprises 0.1 to 150 parts by mass of the silica (2) and 0.1 to 30 parts by mass of the epoxidized liquid diene rubber (3). A crosslinkable rubber composition includes the above rubber composition and crosslinking agent. A crosslinked article is prepared by crosslinking the above crosslinkable rubber composition. The rubber compositions have improved silica dispersibility in the case of mixing a silica with a diene rubber, excellent processability, and excellent mechanical properties after crosslinking.
    Type: Application
    Filed: February 9, 2004
    Publication date: August 24, 2006
    Applicant: Kuraray Co., Ltd.
    Inventors: Koji Kitayama, Kei Hirata, Tsutomu Yamada, Hiroshi Kanbara, Mizuho Maeda
  • Patent number: 7055334
    Abstract: An indoor air-conditioning unit 10 which can effectively deactivate allergens includes an intake grill 11 for drawing in indoor air. Indoor heat exchangers 13, 14, and 15 exchange heat between air drawn in from the intake grill 11 and a refrigerant to thereby cool or heat the air. A diffuser 16 returns the air which has been heat-exchanged with the indoor heat exchangers 13, 14, 15, back into the room. A cross-flow fan 17 blows air which has been drawn in from the inlet and heat exchanged from the diffuser 16 into the room. An allergen deactivation filter 18 is arranged in an internal space 5 through which the air flows and supports an allergen deactivation enzyme. An enzyme activation device maintains the internal space S in an atmosphere for activating the allergen deactivation enzyme.
    Type: Grant
    Filed: March 17, 2004
    Date of Patent: June 6, 2006
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Daisuke Tanaka, Katsuhiro Hashitsume, Seiji Ando, Yuji Nakajima, Susumu Kojima, Kenichi Miyazawa, Hiroshi Kanbara, Takayuki Suzuki
  • Publication number: 20040182093
    Abstract: An indoor air-conditioning unit 10 which can effectively deactivate allergens includes: an intake grill 11 for drawing in indoor air; indoor heat exchangers 13, 14, 15 for exchanging heat between air drawn in from the intake grill 11 and a refrigerant to thereby cool or heat the air; a diffuser 16 for returning the air which has been heat-exchanged by the indoor heat exchangers 13, 14, 15, back into the room; a cross-flow fan 17 for blowing air which has been drawn in from the inlet and heat exchanged, from the diffuser 16 into the room; an allergen deactivation filter 18 arranged in an internal space S through which the air flows, and which supports an allergen deactivation enzyme; and an enzyme activation device which maintains the internal space S in an atmosphere for activating the allergen deactivation enzyme.
    Type: Application
    Filed: March 17, 2004
    Publication date: September 23, 2004
    Inventors: Daisuke Tanaka, Katsuhiro Hashitsume, Seiji Ando, Yuji Nakajima, Susumu Kojima, Kenichi Miyazawa, Hiroshi Kanbara, Takayuki Suzuki
  • Publication number: 20040167281
    Abstract: A rubber composition comprising (1) a diene rubber, (2) a highly saturated rubber, and (3) a block copolymer that comprises a diene polymer block A and a hydrogenated diene polymer block B and has a primary structure selected from the following structures:
    Type: Application
    Filed: December 15, 2003
    Publication date: August 26, 2004
    Inventors: Hideo Takamatsu, Mizuho Maeda, Koji Kitayama, Tsutomu Yamada, Hiroshi Kanbara
  • Patent number: 5422221
    Abstract: In a resist composition, a novolak resin including at least one recurring unit of the formula (1): ##STR1## wherein n is an integer of 1 to 4 and m is an integer of 0 to 3, having a weight average molecular weight of 1,000 to 10,000 calculated as polystyrene, and having the hydrogen atom of a hydroxyl group therein replaced by a 1,2-naphthoquinonediazidosulfonyl group in a proportion of 0.03 to 0.27 mol per hydrogen atom serves as an alkali-soluble resin and a photosensitive agent. The composition is uniform in that the photosensitive agent is uniformly incorporated in the novolak resin, and thus forms a uniform resist film. It is a useful positive resist having improved sensitivity, resolution, heat resistance, and film retentivity.
    Type: Grant
    Filed: February 16, 1994
    Date of Patent: June 6, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoshi Okazaki, Mitsuo Umemura, Hiroshi Kanbara, Jun Hatakeyama, Tetsuya Inukai, Kazuhiro Nishikawa
  • Patent number: 5258487
    Abstract: The present polyamido-acid copolymer has a polymerization backbone chain represented by the following formula: ##STR1## wherein q represents a bivalent organic group and R represents a tetravalent aromatic group. This copolymer forms a polyimide resin film excellent in adhesion to various inorganic substances and mechanical strength.
    Type: Grant
    Filed: August 2, 1991
    Date of Patent: November 2, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hiroshi Kanbara
  • Patent number: 5221331
    Abstract: An aquatic antifouling composition characterized by containing as effective antifouling component a metal salt of hexamethylenedithiocarbamic acid represented by the formula below: ##STR1## (where M is a divalent or trivalent metal; n is 2 or 3.
    Type: Grant
    Filed: November 27, 1991
    Date of Patent: June 22, 1993
    Assignee: Rohm and Haas Company
    Inventors: Hirotake Ikari, Teruyoshi Takahashi, Hiroshi Kanbara
  • Patent number: 5117001
    Abstract: Siloxane compounds having the general formula [1]: ##STR1## wherein R is a substituted or unsubstituted monovalent hydrocarbon group having from 1 to 10 carbon atoms, and n is an integer of from 0 to 100. The compound, because of the two vinylsilyl groups and two acid anhydride groups introduced into the molecule thereof, is useful as an intermediate or modifying agent in the synthesis of various organic resins such as polyimide resins.
    Type: Grant
    Filed: February 28, 1991
    Date of Patent: May 26, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hiroshi Kanbara
  • Patent number: 5100993
    Abstract: A UV curable composition of a specific organopolysiloxane having mercaptoalkyl and phenylene groups and a vinyl-containing organopolysiloxane cures into a film which emits little stimulative sulfur odor and has enough resistance to light or UV radiation to retain its as-cured properties even after long-term exposure to sunlight or UV radiation.
    Type: Grant
    Filed: January 10, 1990
    Date of Patent: March 31, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshinori Hida, Shohei Kozakai, Seizi Katayama, Hiroshi Kanbara
  • Patent number: 5059705
    Abstract: Siloxane compounds having the following formula [1]: ##STR1## wherein each R is a substituted or unsubstituted monovalent hydrocarbon group having from 1 to 10 carbon atoms, and n is an integer of from 0 to 100. The compounds are extremely high in reactivity and, therefore, useful as an intermediate or modifying agent in the synthesis of silicone resins and other various organic resins.
    Type: Grant
    Filed: February 28, 1991
    Date of Patent: October 22, 1991
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshige Okinoshima, Hiroshi Kanbara
  • Patent number: 4962217
    Abstract: Novel organosilicon compounds containing a mercapto group are provided, which compounds are of the following general formula, HSCH.sub.2 C.sub.6 H.sub.4 (CH.sub.2).sub.n Si(CH.sub.3).sub.3-m (OR).sub.m, wherein R represents a methyl group or an ethyl group, n is a value of 0,1 or 2, and m is a value or 1, 2 or 3. the ocmpounds are substantially free of any offensive odor derived from the mercapto group and are useful as a silane coupling or crosslinking agent.
    Type: Grant
    Filed: January 4, 1990
    Date of Patent: October 9, 1990
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Seizi Katayama, Hiroshi Kanbara