Patents by Inventor Hiroshi Kawamukai

Hiroshi Kawamukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210251875
    Abstract: A cosmetic material containing a component (A): ionic polymer particles containing structural units derived from (a) one or more hydrophobic monomers selected from the group consisting of styrene and a derivative thereof, a vinyl ester, and a hydrophobic acrylic monomer, and (b) an ionic hydrophilic monomer or a salt thereof, wherein the ratio by mass of (a) to (b), (a)/(b) is 99.5/0.5 to 80/20, and the tetrahydrofuran-insoluble fraction therein is 10% or more and 100% or less, and a component (B): UV protective agent, wherein the ratio by mass of the component (A) to the component (B) is 5/95 to 30/70.
    Type: Application
    Filed: September 30, 2019
    Publication date: August 19, 2021
    Applicant: KAO CORPORATION
    Inventors: Chihiro OHBA, Shingo HIRONO, Tomokazu ISEKI, Hiroshi KAWAMUKAI, Takashi KODATE
  • Patent number: 6906167
    Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization. That is, a polyether is obtained by a process which comprises ring-opening-polymerizing at least one substituted epoxide, except for propylene oxide and epihalohydrin, in the presence of a rare earth metal compound represented by the formula (I) and a reducing compound: Wherein M represents a rare earth element selected from Sc, Y and lanthanide, and L1, L2 and L3 are same as or different from each other and each of them represents an oxygen-binding ligand.
    Type: Grant
    Filed: July 6, 2004
    Date of Patent: June 14, 2005
    Assignee: Kao Corporation
    Inventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
  • Publication number: 20050004344
    Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization. That is, a polyether is obtained by a process which comprises ring-opening-polymerizing at least one substituted epoxide, except for propylene oxide and epihalohydrin, in the presence of a rare earth metal compound represented by the formula (I) and a reducing compound: Wherein M represents a rare earth element selected from Sc, Y and lanthanide, and L1, L2 and L3 are same as or different from each other and each of them represents an oxygen-binding ligand.
    Type: Application
    Filed: July 6, 2004
    Publication date: January 6, 2005
    Applicant: Kao Corporation
    Inventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
  • Patent number: 6800723
    Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization. That is, a polyether is obtained by a process which comprises ring-opening-polymerizing at least one substituted epoxide, except for propylene oxide and epihalohydrin, in the presence of a rare earth metal compound represented by the formula (I) and a reducing compound: Wherein M represents a rare earth element selected from Sc, Y and lanthanide, and L1, L2 and L3 are same as or different from each other and each of them represents an oxygen-binding ligand.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: October 5, 2004
    Assignee: Kao Corporation
    Inventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
  • Publication number: 20020151674
    Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization.
    Type: Application
    Filed: February 26, 2002
    Publication date: October 17, 2002
    Applicant: Kao Corporation
    Inventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
  • Patent number: 6417323
    Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization. That is, a polyether is obtained by a process which comprises ring-opening-polymerizing at least one substituted epoxide, except for propylene oxide and epihalohydrin, in the presence of a rare earth metal compound represented by the formula (I) and a reducing compound: Wherein M represents a rare earth element selected from Sc, Y and lanthanide, and L1, L2 and L3 are same as or different from each other and each of them represents an oxygen-binding ligand.
    Type: Grant
    Filed: September 13, 2000
    Date of Patent: July 9, 2002
    Assignee: Kao Corporation
    Inventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
  • Patent number: 5853611
    Abstract: The present invention relates to a polyether polymer having structural units represented by general formula (1), wherein R.sup.1 and R.sup.2 mean individually an alkyl group of 1-20 carbon atoms, which may have at least one hydroxyl group, and Y denotes an alkylene group of 1-10 carbon atoms, which may have a hydroxyl group, a preparation process thereof, and a moisturizer, a cosmetic composition and a detergent composition comprising this polymer. The cosmetic composition and detergent composition are excellent in moisture retention, keep up the moisturizing effect over a long period of time and give users a pleasant feeling.
    Type: Grant
    Filed: September 11, 1997
    Date of Patent: December 29, 1998
    Assignee: Kao Corporation
    Inventors: Hiroshi Kawamukai, Katsuhiko Rindo, Takashi Oda, Masaaki Moriyama, Hideyuki Hanazawa, Yasushi Kajihara
  • Patent number: 5534322
    Abstract: A recording medium, showing sufficient resistance to contamination and having excellent reproducing characteristics, comprises a film provided on a surface thereof and this film comprises a copolymer formed by polymerizing a composition which comprises a compound A having a (meth)acryloyl group and a reactive antistatic agent B having a quaternary ammonium salt group, an alkylene glycol chain, a hydrocarbon group of which carbon number is four or more and a copolymerizable group.
    Type: Grant
    Filed: April 25, 1994
    Date of Patent: July 9, 1996
    Assignee: Kao Corporation
    Inventors: Kenichi Ueyama, Hiroshi Kawamukai