Patents by Inventor Hiroshi Kawamukai
Hiroshi Kawamukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210251875Abstract: A cosmetic material containing a component (A): ionic polymer particles containing structural units derived from (a) one or more hydrophobic monomers selected from the group consisting of styrene and a derivative thereof, a vinyl ester, and a hydrophobic acrylic monomer, and (b) an ionic hydrophilic monomer or a salt thereof, wherein the ratio by mass of (a) to (b), (a)/(b) is 99.5/0.5 to 80/20, and the tetrahydrofuran-insoluble fraction therein is 10% or more and 100% or less, and a component (B): UV protective agent, wherein the ratio by mass of the component (A) to the component (B) is 5/95 to 30/70.Type: ApplicationFiled: September 30, 2019Publication date: August 19, 2021Applicant: KAO CORPORATIONInventors: Chihiro OHBA, Shingo HIRONO, Tomokazu ISEKI, Hiroshi KAWAMUKAI, Takashi KODATE
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Patent number: 6906167Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization. That is, a polyether is obtained by a process which comprises ring-opening-polymerizing at least one substituted epoxide, except for propylene oxide and epihalohydrin, in the presence of a rare earth metal compound represented by the formula (I) and a reducing compound: Wherein M represents a rare earth element selected from Sc, Y and lanthanide, and L1, L2 and L3 are same as or different from each other and each of them represents an oxygen-binding ligand.Type: GrantFiled: July 6, 2004Date of Patent: June 14, 2005Assignee: Kao CorporationInventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
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Publication number: 20050004344Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization. That is, a polyether is obtained by a process which comprises ring-opening-polymerizing at least one substituted epoxide, except for propylene oxide and epihalohydrin, in the presence of a rare earth metal compound represented by the formula (I) and a reducing compound: Wherein M represents a rare earth element selected from Sc, Y and lanthanide, and L1, L2 and L3 are same as or different from each other and each of them represents an oxygen-binding ligand.Type: ApplicationFiled: July 6, 2004Publication date: January 6, 2005Applicant: Kao CorporationInventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
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Patent number: 6800723Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization. That is, a polyether is obtained by a process which comprises ring-opening-polymerizing at least one substituted epoxide, except for propylene oxide and epihalohydrin, in the presence of a rare earth metal compound represented by the formula (I) and a reducing compound: Wherein M represents a rare earth element selected from Sc, Y and lanthanide, and L1, L2 and L3 are same as or different from each other and each of them represents an oxygen-binding ligand.Type: GrantFiled: February 26, 2002Date of Patent: October 5, 2004Assignee: Kao CorporationInventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
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Publication number: 20020151674Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization.Type: ApplicationFiled: February 26, 2002Publication date: October 17, 2002Applicant: Kao CorporationInventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
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Patent number: 6417323Abstract: The present invention provides a process for efficiently obtaining polyethers having its high degree of polymerization by easily polymerizing substituted epoxides which could hardly or could not be made so far to provide a high degree of polymerization. That is, a polyether is obtained by a process which comprises ring-opening-polymerizing at least one substituted epoxide, except for propylene oxide and epihalohydrin, in the presence of a rare earth metal compound represented by the formula (I) and a reducing compound: Wherein M represents a rare earth element selected from Sc, Y and lanthanide, and L1, L2 and L3 are same as or different from each other and each of them represents an oxygen-binding ligand.Type: GrantFiled: September 13, 2000Date of Patent: July 9, 2002Assignee: Kao CorporationInventors: Seiichi Miyanaga, Hiroshi Kawamukai, Takashi Oda
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Patent number: 5853611Abstract: The present invention relates to a polyether polymer having structural units represented by general formula (1), wherein R.sup.1 and R.sup.2 mean individually an alkyl group of 1-20 carbon atoms, which may have at least one hydroxyl group, and Y denotes an alkylene group of 1-10 carbon atoms, which may have a hydroxyl group, a preparation process thereof, and a moisturizer, a cosmetic composition and a detergent composition comprising this polymer. The cosmetic composition and detergent composition are excellent in moisture retention, keep up the moisturizing effect over a long period of time and give users a pleasant feeling.Type: GrantFiled: September 11, 1997Date of Patent: December 29, 1998Assignee: Kao CorporationInventors: Hiroshi Kawamukai, Katsuhiko Rindo, Takashi Oda, Masaaki Moriyama, Hideyuki Hanazawa, Yasushi Kajihara
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Patent number: 5534322Abstract: A recording medium, showing sufficient resistance to contamination and having excellent reproducing characteristics, comprises a film provided on a surface thereof and this film comprises a copolymer formed by polymerizing a composition which comprises a compound A having a (meth)acryloyl group and a reactive antistatic agent B having a quaternary ammonium salt group, an alkylene glycol chain, a hydrocarbon group of which carbon number is four or more and a copolymerizable group.Type: GrantFiled: April 25, 1994Date of Patent: July 9, 1996Assignee: Kao CorporationInventors: Kenichi Ueyama, Hiroshi Kawamukai