Patents by Inventor Hiroshi Kawashima
Hiroshi Kawashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6870979Abstract: An optical circuit device includes: a substrate and an optical waveguide layer having a core and a cladding formed on the substrate; an optical waveguide circuit of the core having an optical splitter for splitting light, an optical coupler for coupling light, a first connecting optical waveguide and a second connecting optical waveguide for connecting the optical splitter and the optical coupler, and the first and second connecting optical waveguides respectively having first and second phase adjustment means capable of varying the phases of a propagating light, the optical circuit device being formed such that the rate of change of the polarization difference of phases in the first phase adjustment means and the rate of change of the polarization difference of phases in the second phase adjustment means are different from each other with respect to the phase adjustment amounts when the first and second phase adjustment means perform phase adjustment.Type: GrantFiled: October 7, 2003Date of Patent: March 22, 2005Assignee: The Furukawa Electric Co., LtdInventors: Hiroshi Kawashima, Kazutaka Nara
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Patent number: 6841459Abstract: A thermal process for activating respective impurities in a polysilicon film to be a gate electrode and a resistance element is performed with the polysilicon film to be the gate electrode and the resistance element being coated with an oxide film, after the respective impurities are implanted into the polysilicon film to be the gate electrode and the resistance element. Here, concentrations of the respective impurities in the polysilicon film to be the gate electrode and the resistance element are adjusted by controlling the thickness of the oxide film. The degree of impurity activation is thereby adjusted.Type: GrantFiled: November 6, 2002Date of Patent: January 11, 2005Assignee: Renesas Technology Corp.Inventors: Hiroshi Kawashima, Motoshige Igarashi, Keiichi Higashitani
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Publication number: 20040266874Abstract: The object of the present invention is to provide a composition that has preventive or ameliorative action on symptoms or diseases caused by decreased brain function. This composition contains, as its active ingredient, arachidonic acid and/or a compound having arachidonic acid as a constituent fatty acid and, particularly, an alcohol ester of arachidonic acid or a triglyceride, phospholipid or glycolipid in which all or a portion of the constituent fatty acids are arachidonic acid.Type: ApplicationFiled: August 10, 2004Publication date: December 30, 2004Inventors: Kengo Akimoto, Hiroshi Kawashima, Yoshiko Ono, Hiroshige Okaichi, Youko Okaichi
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Publication number: 20040264836Abstract: An optical circuit device includes: a substrate and an optical waveguide layer having a core and a cladding formed on the substrate; an optical waveguide circuit of the core having an optical splitter for splitting light, an optical coupler for coupling light, a first connecting optical waveguide and a second connecting optical waveguide for connecting the optical splitter and the optical coupler, and the first and second connecting optical waveguides respectively having first and second phase adjustment means capable of varying the phases of a propagating light, the optical circuit device being formed such that the rate of change of the polarization difference of phases in the first phase adjustment means and the rate of change of the polarization difference of phases in the second phase adjustment means are different from each other with respect to the phase adjustment amounts when the first and second phase adjustment means perform phase adjustment.Type: ApplicationFiled: October 7, 2003Publication date: December 30, 2004Applicant: The Furukawa Electric Co., Ltd.Inventors: Hiroshi Kawashima, Kazutaka Nara
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Patent number: 6812020Abstract: The present invention discloses a process for producing lipid containing omega-9 highly unsaturated fatty acid by culturing in a medium a mutant strain obtained by mutation on a microorganism having the ability to produce arachidonic acid belonging to the genus Mortierella and so forth, in which &Dgr;12 desaturation activity is decreased or lost, but at least one of &Dgr;5 desaturation activity, &Dgr;6 desaturation activity and chain length elongation activity is elevated. Moreover, the present invention also discloses a process for producing omega-9 highly unsaturated fatty acid by collecting omega-9 highly unsaturated fatty acid from the culture or lipid described above.Type: GrantFiled: August 8, 2000Date of Patent: November 2, 2004Assignee: Suntory LimitedInventors: Kengo Akimoto, Hiroshi Kawashima, Sakayu Shimizu
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Publication number: 20040208093Abstract: A disk recorder/player (1) including a skew adjusting means of a thin design is provided which includes a base (101), a disk rotation driving mechanism (102) for an optical disk (4), an optical pickup (103), first and second guide shafts (105, 106) to support the optical pickup (103) at opposite ends of the latter, an optical pickup moving means (104) guided by the first and second guide shafts (105, 106) in moving the optical pickup (103) radially of the optical disk (4), an elastic member (126) put in contact with the first and second guide shafts (105, 106) to force the first and second guide shafts (105, 106) in a direction generally perpendicular to the main side of the optical disk (4), an adjusting screw (127) put into contact with the first and second guide shafts (105, 106) from the opposite side of the elastic member (126) to move the first and second guide shafts (105, 106) in a direction opposite to the direction of forcing by the elastic member (126), and a skew adjusting means (109) which adjustType: ApplicationFiled: January 22, 2004Publication date: October 21, 2004Applicant: Sony CorporationInventors: Kiyoshi Omori, Hidehiko Yamamoto, Masazumi Shiozawa, Hitoshi Taniguchi, Kazuya Sunami, Hiroshi Kawashima
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Publication number: 20040180268Abstract: First, a correction is made for correcting the mask pattern configuration of a photomask (3) used for exposure in accordance with the space between a mask pattern and an adjacent mask pattern thereto and a desired configuration to be transferred from the mask pattern. Second, a correction is made for dividing the photomask (3) into a plurality of mesh regions (M) to correct the pattern configuration of the photomask (3) in accordance with the occupation rate (R) of the mask pattern in each of the mesh regions (M).Type: ApplicationFiled: August 7, 2003Publication date: September 16, 2004Applicant: Renesas Technology Corp.Inventors: Hiroshi Kawashima, Yoshitaka Yamada
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Patent number: 6753246Abstract: The semiconductor device includes a semiconductor substrate and, in an element isolating region in the semiconductor substrate, a first active area A/A dummy pattern and a second A/A dummy pattern having a pitch smaller than that of the first A/A dummy pattern. Placement of the first A/A dummy pattern and placement of the second A/A dummy pattern are carried out in separate steps. The semiconductor substrate may be divided into a plurality of mesh regions, and a dummy pattern may be placed in each mesh region according to an area of the mesh region being occupied by an element pattern located therein.Type: GrantFiled: April 22, 2003Date of Patent: June 22, 2004Assignee: Renesas Technology Corp.Inventors: Hiroshi Kawashima, Masakazu Okada, Takeshi Kitani, Motoshige Igarashi
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Patent number: 6713480Abstract: Methods of using a compound, its pharmaceutically acceptable salts, and/or its pro-drug esters, in isolated form, to treat cancer, and methods for isolating, for formulating, and for administering the compound, salt, and/or pro-drug ester as an antitumor agent, wherein the compound, salt, or pro-drug ester has the following generic structure: wherein R1, R2, R3, R4, R5, R6, R7, R8, X1 and X2 are selected from specified residues, as described, and the dashed bond represents either a carbon-carbon single bond or a carbon-carbon double bond.Type: GrantFiled: November 27, 2001Date of Patent: March 30, 2004Assignee: Nereus Pharmaceuticals Inc.Inventors: Kenji Fukumoto, Shinkichi Kohno, Kaneo Kanoh, Tohru Asari, Hiroshi Kawashima, Hirokatsu Sekiya, Kazunori Ohmizo, Takeo Harada
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Publication number: 20030216015Abstract: A thermal process for activating respective impurities in a polysilicon film to be a gate electrode and a resistance element is performed with the polysilicon film to be the gate electrode and the resistance element being coated with an oxide film, after the respective impurities are implanted into the polysilicon film to be the gate electrode and the resistance element. Here, concentrations of the respective impurities in the polysilicon film to be the gate electrode and the resistance element are adjusted by controlling the thickness of the oxide film. The degree of impurity activation is thereby adjusted.Type: ApplicationFiled: November 6, 2002Publication date: November 20, 2003Applicant: MITSUBISHI DENKI KABUSHIKI KAISHAInventors: Hiroshi Kawashima, Motoshige Igarashi, Keiichi Higashitani
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Patent number: 6631235Abstract: The present invention provides a planar lightwave circuit platform and its method for manufacturing by which the characteristics of the planar lightwave circuit become stable. In a planar lightwave circuit platform comprising quartz-based lower cladding layer (2), height adjusting layer (3), core layer (4), and upper cladding layer (5) formed in order on substrate (1), wherein the glass softening temperature of the height adjusting layer (3) is set to be higher than the glass softening temperatures and the temperatures for transparent-vitrification of the core layer (4) and upper cladding layer (5).Type: GrantFiled: June 16, 2000Date of Patent: October 7, 2003Assignee: The Furukawa Electric Co., Ltd.Inventors: Hiroshi Kawashima, Kazutaka Nara, Shiro Nakamura, Kazunori Watanabe
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Publication number: 20030178647Abstract: The semiconductor device includes a semiconductor substrate and, in an element isolating region in the semiconductor substrate, a first active area A/A dummy pattern and a second A/A dummy pattern having a pitch smaller than that of the first A/A dummy pattern. Placement of the first A/A dummy pattern and placement of the second A/A dummy pattern are carried out in separate steps. The semiconductor substrate may be divided into a plurality of mesh regions, and a dummy pattern may be placed in each mesh region according to an area of the mesh region being occupied by an element pattern located therein.Type: ApplicationFiled: April 22, 2003Publication date: September 25, 2003Applicant: MITSUBISHI DENKI KABUSHIKI KAISHAInventors: Hiroshi Kawashima, Masakazu Okada, Takeshi Kitani, Motoshige Igarashi
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Patent number: 6617218Abstract: A region around the gate of a PMOSFET that does not, at a minimum, affect the transistor characteristics is covered with a resist and a diagonal ion implantation for drain engineering is carried out in a P well region beneath gate electrode. Ions of a first conductive type are implanted in a portion wherein a well contact layer is formed so as to form well contact layer. The above described diagonal ion implantation and the ion implantation for forming the above described well contact layer are carried out so that when the depth is plotted along the longitudinal axis and the impurity concentration is plotted along the lateral axis in the impurity profile of well contact larger, impurity profile or the first conductive type that forms well contact layer covers profile of the impurities that form the impurity diffusion layer.Type: GrantFiled: July 11, 2002Date of Patent: September 9, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventor: Hiroshi Kawashima
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Patent number: 6602690Abstract: A process for the production of dihomo-&ggr;-linolenic acid comprising the steps of culturing a microorganism having an ability to produce araquidonic acid and having a reduced or lost &Dgr;5 desaturase activity to produce dihomo-&ggr;-linolenic acid or a lipid containing dihomo-&ggr;-linolenic acid, and recovering the dihomo-&ggr;-linolenic acid.Type: GrantFiled: January 18, 2001Date of Patent: August 5, 2003Assignee: Suntory, Ltd.Inventors: Hiroshi Kawashima, Kengo Akimoto, Hideaki Yamada, Sakayu Shimizu
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Publication number: 20030112637Abstract: A method of designing a reflective surface of a reflector used in a vehicle lamp includes a first base curve generating step of generating a first base curve Q; a second base curve generating step of generating a plurality of second base curves R; and a surface shape generating step of generating a surface shape of the reflective surface RS, based on the first base curve and the plurality of second base curves, wherein the first base curve generating step includes repeating a step of generating one partial curve Qi and thereafter generating a subsequent partial curve Qi+1 so as to be connected to the partial curve, thereby generating one first base curve Q consisting of a plurality of partial curves Qi connected to each other, and wherein each partial curve Q1 is generated based on a shape parameter according thereto.Type: ApplicationFiled: December 14, 2001Publication date: June 19, 2003Applicant: KOITO MANUFACTURING CO., LTD.Inventors: Hiroshi Kawashima, Masashi Tatsukawa
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Patent number: 6578996Abstract: A method of designing a reflective surface of a reflector used in a vehicle lamp includes a first base curve generating step of generating a first base curve Q; a second base curve generating step of generating a plurality of second base curves R; and a surface shape generating step of generating a surface shape of the reflective surface RS, based on the first base curve and the plurality of second base curves, wherein the first base curve generating step includes repeating a step of generating one partial curve Qi and thereafter generating a subsequent partial curve Qi+1 so as to be connected to the partial curve, thereby generating one first base curve Q consisting of a plurality of partial curves Qi connected to each other, and wherein each partial curve Qi is generated based on a shape parameter according thereto.Type: GrantFiled: December 14, 2001Date of Patent: June 17, 2003Assignee: Koito Manufacturing Co., Ltd.Inventors: Hiroshi Kawashima, Masashi Tatsukawa
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Publication number: 20030100161Abstract: A region around the gate of a PMOSFET that does not, at a minimum, affect the transistor characteristics is covered with a resist and a diagonal ion implantation for drain engineering is carried out in a P well region beneath a gate electrode. Ions of a first conductive type are implanted in a portion wherein a well contact layer is formed so as to form well contact layer. The above described diagonal ion implantation and the ion implantation for forming the above described well contact layer are carried out so that when the depth is plotted along the longitudinal axis and the impurity concentration is plotted along the lateral axis in the impurity profile of well contact larger, impurity profile or the first conductive type that forms well contact layer covers profile of the impurities that form the impurity diffusion layer.Type: ApplicationFiled: July 11, 2002Publication date: May 29, 2003Applicant: Mitsubishi Denki Kabushiki KaishaInventor: Hiroshi Kawashima
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Patent number: 6565250Abstract: A designing method of a reflective surface RS according to the present invention has a step of generating an XY curve Q on an XY plane including the X-axis (optical axis) and Y-axis; a step of, at each of a plurality of base points P existing on the XY curve Q, generating an XZ curve R on a plane (UZ plane) including the base point P and being parallel to a reflection direction of light at the base point P and normal to the XY plane; and a step of generating a surface shape of the reflective surface RS, based on the XY curve Q and the plurality of XZ curves R. This substantiates a method of designing a reflective surface of a reflector in a vehicle lamp with improved controllability of a light distribution pattern and with improved efficiency of a designing work.Type: GrantFiled: December 13, 2001Date of Patent: May 20, 2003Assignee: Koito Manufacturing Co., Ltd.Inventors: Hiroshi Kawashima, Masashi Tatsukawa
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Patent number: 6563148Abstract: The semiconductor device includes a semiconductor substrate and, in an element isolating region in the semiconductor substrate, a first active area A/A dummy pattern and a second A/A dummy pattern having a pitch smaller than that of the first A/A dummy pattern. Placement of the first A/A dummy pattern and placement of the second A/A dummy pattern are carried out in separate steps. The semiconductor substrate may be divided into a plurality of mesh regions, and a dummy pattern may be placed in each mesh region according to an area of the mesh region being occupied by an element pattern located therein.Type: GrantFiled: April 10, 2001Date of Patent: May 13, 2003Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Hiroshi Kawashima, Masakazu Okada, Takeshi Kitani, Motoshige Igarashi
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Patent number: 6561687Abstract: The shape of a horizontal cross section Sho including a reference axis Ax on a reflective surface 14a is set to a curved shape for focusing and reflecting light from a light source 12a closer to the reference axis Ax within the horizontal cross section Sho. The shape of a vertical cross section including the axis in the direction of emitting reflected light at each of the points on the horizontal cross section including the reference axis Ax on the reflective surface 14a is set to a curved shape for reflecting the light from the light source in substantially parallel to the axis in the direction of emitting the reflected light in a central reflective area near the lateral reference axis Ax. The shapes of peripheral reflective areas 14a2 on both sides of the central reflective area are respectively set to curved shapes for focusing and reflecting the light from the light source 12a closer to the axis in the direction of emitting the reflected light.Type: GrantFiled: December 23, 1999Date of Patent: May 13, 2003Assignee: Koito Manufacturing Co., Ltd.Inventors: Hideaki Satsukawa, Yasuyuki Amano, Hiroshi Kawashima