Patents by Inventor Hiroshi Mabuchi

Hiroshi Mabuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100234481
    Abstract: A method of manufacturing porous ceramics, for example, thin film used for gas separation is disclosed. In this method, a silicon based mixture polymeric material which is the ceramics precursor is applied on a ceramics substrate, crosslinked by using ionizing radiation under oxygen free conditions; and pyrolyzed under an inert gas after that.
    Type: Application
    Filed: March 11, 2010
    Publication date: September 16, 2010
    Applicants: JAPAN ATOMIC ENERGY AGENCY, OSAKA PREFECTURE UNIVERSITY PUBLIC CORPORATION
    Inventors: Masaki SUGIMOTO, Masahito YOSHIKAWA, Akinori TAKEYAMA, Ken'ichiro KITA, Masaki NARISAWA, Hiroshi Mabuchi
  • Publication number: 20090239839
    Abstract: An agent for modulating the function of an RFRP receptor, characterized by containing either a compound represented by the formula (I) [wherein ring A represents an optionally substituted aromatic ring; ring B represents an optionally substituted benzene ring; X represents oxygen, S(O)n (n is an integer of 0 to 2), or NR3 (R3 represents hydrogen, an optionally substituted hydrocarbon group, or an optionally substituted heterocyclic group); and R1 and R2 each represents hydrogen, an optionally substituted hydrocarbon group, or an optionally substituted heterocyclic group] or a salt of the compound.
    Type: Application
    Filed: February 24, 2009
    Publication date: September 24, 2009
    Applicant: TAKEDA PHARMACEUTICAL COMPANY LIMITED
    Inventors: Fumio ITOH, Shuji Hinuma, Naoyuki Kanzaki, Hiroshi Mabuchi, Hiromi Yoshida, Hirokazu Matsumoto, Takeshi Wakabayashi
  • Publication number: 20070129348
    Abstract: An agent for modulating the function of an RFRP receptor, characterized by containing either a compound represented by the formula (I) [wherein ring A represents an optionally substituted aromatic ring; ring B represents an optionally substituted benzene ring; X represents oxygen, S(O)n (n is an integer of 0 to 2), or NR3 (R3 represents hydrogen, an optionally substituted hydrocarbon group, or an optionally substituted heterocyclic group); and R1 and R2 each represents hydrogen, an optionally substituted hydrocarbon group, or an optionally substituted heterocyclic group] or a salt of the compound.
    Type: Application
    Filed: April 15, 2004
    Publication date: June 7, 2007
    Inventors: Fumio Itoh, Shuji Hinuma, Naoyuki Kanzaki, Hiroshi Mabuchi, Hiromi Yoshida, Hirokazu Matsumoto, Takeshi Wakabayashi
  • Patent number: 6911468
    Abstract: A compound of the formula (I): wherein X1 and X2 are the same or different and each is a bond or a spacer having 1 to 20 atom(s) in the main chain; one of R1 and R2 is a cycle group having substituent(s) selected from 1) an optionally substituted carboxy-C1-6 alkoxy group and 2) an optionally substituted carboxy-C1-6 aliphatic hydrocarbon group, wherein the cycle group optionally has additional substituent(s), and the other is an optionally substituted cycle group or a hydrogen atom; and R3, R4 and R5 are the same or different and each is a hydrogen atom or a substituent, or R4 may link together with R3 or R5 to form an optionally substituted ring; provided that when R3 is a hydrogen atom, R4 is a hydrogen atom and R5 is methyl, X2—R2 is not 4-cyclohexylphenyl; when R3 is 4-methoxyphenyl, R4 is a hydrogen atom and R5 is methyl, X2—R2 is not 4-methoxyphenyl; and when R1 or R2 is a hydrogen atom, the adjacent X1 or X2 is not a C1-7 alkylene; or a salt thereof exhibits a protein tyrosine phosphatase inhibi
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: June 28, 2005
    Assignee: Takeda Chemical Industries, Ltd.
    Inventors: Takahiro Matsumoto, Nozomi Katayama, Hiroshi Mabuchi
  • Publication number: 20030144338
    Abstract: A compound of the formula (I): 1
    Type: Application
    Filed: November 15, 2002
    Publication date: July 31, 2003
    Inventors: Takahiro Matsumoto, Nozomi Katayama, Hiroshi Mabuchi
  • Patent number: 6352982
    Abstract: The present invention provides a compound of the formula: wherein ring A is an optionally substituted aromatic hydrocarbon ring or aromatic heterocyclic ring; ring B is an optionally substituted aromatic hydrocarbon ring or aromatic heterocyclic ring; Z is an optionally substituted cyclic group or linear hydrocarbon group; R1 is a hydrogen atom, an optionally substituted hydrocarbon group or heterocyclic ring; R2 is an optionally substituted amino group; D is a bond or an optionally substituted divalent hydrocarbon group; E is a bond, —CON(Ra)—, —N(Ra)CO—, —N(Rb)CON(Rc)—, —N(Rd)COO—, —N(Re)SO2—, —COO—, —N(Rf)—, —O—, —S— —SO—, —SO2—, (in which Ra, Rb, Rc, Rd, Re and Rf are respectively a hydrogen atom or an optionally substituted hydrocarbon group); G is a bond or an optionally divalent substituted hydrocarbon group; L is a divalent group; ring
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: March 5, 2002
    Assignee: Takeda Chemical Industries, Ltd.
    Inventors: Hiroshi Mabuchi, Nobuhiro Suzuki, Takashi Miki
  • Patent number: 6252351
    Abstract: A contact layer having a low resistance in an LED is extended from an inside edge of a light take-out region in a light emitting dot to a central position thereof, whereby an input current in the light take-out region expands, while an electrode is extended from an inside edge of the light take-out region to the center of the light take-out region so as to shape like substantially a letter T with a length which is not over the center, whereby increase in an electrode covering ratio in the light take-out region can be suppressed. As a result, a uniform light output in the light take-out region can be attained, so that a light output can be remarkably improved.
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: June 26, 2001
    Assignees: Hitachi Cable Ltd, Fujitsu Limited
    Inventors: Genta Koizumi, Katsuhiko Sakai, Hiroshi Mabuchi, Mitsuru Yamazaki, Seiichi Kurihara, Yuji Abe
  • Patent number: 6225912
    Abstract: It is an object of the invention to provide a LED array, in which faults of all the diodes can be instantaneously detected, even when an optical printer is operating, and various kinds of faults of the LEDs can be discriminated. In the LED array comprising plural LEDs arranged along a lone, each LED is provided with a comparator, which compares a terminal voltage of the LED with a variable reference voltage. The kind of fault of the LED can be discriminated on the basis of a relation between the reference voltage applied to the comparator and an output voltage thereof.
    Type: Grant
    Filed: June 24, 1999
    Date of Patent: May 1, 2001
    Assignees: Hitachi Cable, Ltd., Fujitsu Limited
    Inventors: Hideo Tanaka, Hiroshi Mabuchi, Tamotsu Nishiura
  • Patent number: 6092486
    Abstract: The plasma processing apparatus and plasma processing method of the present invention are suitable for the application of plasma processing to etching, ashing, CVD, etc. in the manufacturing of large scale integrated circuits (LSIs) and liquid crystal display panels (LCDs), and useful for the manufacturing of LSIs and LCDs. The apparatus is characterized in that the reaction chamber has its side wall separated into an inner side wall which faces to the interior of the reaction chamber and an outer side wall which faces to the exterior of the reaction chamber, with the inner side wall being isolated electrically from other portions of the reaction chamber and not grounded electrically. This structure improves the repeatability of plasma processing. The apparatus is also characterized in that the inner side wall of reaction chamber is isolated thermally from other portions of the reaction chamber and equipped with temperature control means.
    Type: Grant
    Filed: January 26, 1998
    Date of Patent: July 25, 2000
    Assignee: Sumimoto Metal Indsutries, Ltd.
    Inventors: Hiroshi Mabuchi, Toshihiro Hayami, Shigeki Honda
  • Patent number: 6091045
    Abstract: A plasma processing apparatus and a plasma processing method used in etching, ashing, CVD, etc. in the manufacturing, etc. of large-scale integrated circuits (LSIs) and liquid crystal display panels (LCDs). The plasma processing apparatus includes a dielectric plate used for the passage of a microwave, a microwave window disposed to confront the dielectric plate, and a reaction chamber in which a sample stage is disposed to confront the microwave window. The apparatus is characterized in that the microwave window has a recess in the area confronting the sample stage. The plasma processing method is characterized by implementing a plasma process for a sample with the plasma processing apparatus. The method and apparatus are capable of raising the plasma density in the area confronting the sample, improving the plasma processing rate, improving the etch-through performance for fine hole patterns, and improving the yield of semiconductor devices.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: July 18, 2000
    Assignee: Sumitomo Metal Industries, Inc.
    Inventors: Hiroshi Mabuchi, Junya Tsuyuguchi, Katsuo Katayama, Toshihiro Hayami, Hideo Ida, Tomomi Murakami, Naohiko Takeda
  • Patent number: 5951887
    Abstract: A plasma processing apparatus and plasma processing method are provided to be used for etching, ashing, CVD, etc. in the manufacturing, etc. of large-scale integrated circuits (LSIs) and liquid crystal display panels (LCDs). The plasma processing apparatus generates plasma by using a microwave introduced through a microwave window, while controlling the ions in the plasma by varying the RF voltage applied to the sample stage. The apparatus is characterized to include a counter electrode (grounded electrode) which is located at the rim section of the microwave window against the sample stage. The plasma processing method implements a plasma process for a sample with the plasma processing apparatus. The method and apparatus are capable of alleviating the sticking of particles to the sample and metallic contamination, and also capable of improving the yield of semiconductor devices, etc.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: September 14, 1999
    Assignee: Sumitomo Metal Industries, Ltd.
    Inventors: Hiroshi Mabuchi, Toshihiro Hayami, Hideo Ida, Tomomi Murakami, Naohiko Takeda, Junya Tsuyuguchi, Katsuo Katayama
  • Patent number: 5788798
    Abstract: A plasma processing apparatus carries out plasma processings such as etching, ashing and CVD on large substrates such as semiconductor device substrates and glass substrates for liquid crystal display panels, etc. The plasma processing apparatus having microwave generator 26, a microwave guide path 23, a microwave window 4 and a reaction room 2, etc., has a dielectric sheet 21 disposed to confront the microwave window 4 through a hollow area 20. The dielectric sheet is divided into multiple dielectric sheets 21a, 21b, and the microwave guide path 23a, 23b are connected to the divided dielectric sheets 21a, 21b. This simple structure enables the stable and uniform plasma processing on large substrates such as glass substrates for liquid crystal display panels.
    Type: Grant
    Filed: May 31, 1996
    Date of Patent: August 4, 1998
    Assignee: Sumitomo Metal Industries, Ltd.
    Inventors: Hiroshi Mabuchi, Takahiro Yoshiki, Naoki Matsumoto, Kyoichi Komachi, Shuta Kanayama, Toshiki Ebata
  • Patent number: 5645644
    Abstract: A plasma processing apparatus comprises means of supplying the microwave, a reaction chamber having a microwave lead-in opening, a microwave window for introducing the microwave provided by the microwave supply means into the reaction chamber through the microwave lead-in opening, and a supporting member having beams for supporting the microwave window. The apparatus has its microwave window divided in correspondence to areas of the supporting member divided by the beams. The apparatus can have a larger microwave window which is reinforced by the beams against the pressure at plasma generation, and is capable of processing large semiconductor substrates and glass substrates for liquid crystal display panels stably and uniformly.
    Type: Grant
    Filed: October 20, 1995
    Date of Patent: July 8, 1997
    Assignee: Sumitomo Metal Industries, Ltd.
    Inventors: Hiroshi Mabuchi, Takahiro Yoshiki, Kyoichi Komachi, Tadashi Miyamura
  • Patent number: 5545258
    Abstract: A microwave plasma processing system, wherein a conductor disposed for controlling the anisotropy and the acceleration energy of ions in a plasma has inside a flow path for reactant gasses and a plurality of holes through which the gasses are to be blown toward a sample holder.A microwave plasma processing system, wherein the ratio of the total area of microwave transmission holes to the area of a conductor is set to be in a range of 0.25 to 0.65.A microwave plasma processing system, wherein each microwave transmission hole formed in a conductor has a dimension in the microwave traveling direction greater than that in a direction perpendicular to the traveling direction.
    Type: Grant
    Filed: June 13, 1995
    Date of Patent: August 13, 1996
    Assignees: Sumitomo Metal Industries, Ltd., NEC Corporation
    Inventors: Katsuo Katayama, Kyoichi Komachi, Hiroshi Mabuchi, Takeshi Akimoto
  • Patent number: 5529632
    Abstract: A microwave plasma processing system has heating means for heating the wall of a reaction chamber, and an adhesion preventing member in which a cylinder disposed so as to be in contact with the inner face of a wall of the reaction chamber and a microwave reflecting plate having a gas discharge hole are integrally formed.A microwave plasma processing system has heating means for heating the wall of a reaction chamber, and a microwave reflecting plate which is attached to the inner face of a wall of the reaction chamber and which has a gas discharge hole.
    Type: Grant
    Filed: June 13, 1995
    Date of Patent: June 25, 1996
    Assignees: Sumitomo Metal Industries, Ltd., NEC Corporation
    Inventors: Katsuo Katayama, Kyoichi Komachi, Hiroshi Mabuchi, Takeshi Akimoto
  • Patent number: 5414739
    Abstract: A transmission system which includes a plurality of reproduction nodes connected to each other in a cascade connection via a communication line. Each node includes a timing extraction circuit for extracting a timing signal from a signal received via the communication line, a discriminating circuit for converting the received signal into a digital signal according to the timing signal, and a processing circuit for processing, based on the timing signal, the digital signal outputted from the discriminating circuit and outputting the processed digital signal to the communication line. The timing extraction circuit includes a signal delay unit for supplying the timing signal with a signal delay time greater than a delay time occurring in the processing circuit.
    Type: Grant
    Filed: November 12, 1992
    Date of Patent: May 9, 1995
    Assignees: Hitachi, Ltd., Hitachi Cable, Ltd.
    Inventors: Naoya Kobayashi, Yoshitaka Takasaki, Sadao Mizokawa, Hisayuki Maruyama, Hiroshi Mabuchi, Eiichi Amada
  • Patent number: 5299078
    Abstract: A shutter locking mechanism for a FDD capable of securely keeping the shutter in opened state against any external impact. This mechanism comprises a pivot secured to the carrier for axially and rotatably supporting the shutter opening lever, and a projecting portion formed at the distal end of the shutter opening lever and fit to an aperture existing at the shutter opening lever contact side of the shutter in the loading position. The projecting portion enters the aperture at the right corner of the shutter in the loaded position while at the left corner claw portions of the stopper hold the shutter for preventing the distal end of the shutter opening lever from separating from the shutter.
    Type: Grant
    Filed: February 5, 1992
    Date of Patent: March 29, 1994
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Hiroshi Mabuchi, Maki Wakita
  • Patent number: 4750063
    Abstract: The present invention provides a floppy disk drive which can removably receive a cartridge containing a floppy disk and which can travel a READ/WRITE head to the desired track on the floppy disk while rotating the floppy disk at a constant speed for effecting the desired read/write action under an electric-magnetic conversion. The drive is of a top-up type which includes a frame portion and a carrier which can be popped up from the frame portion. The frame portion includes a spindle motor for directly driving the floppy disk, a plurality of positioning pins for positioning the disk cartridge relative to the spindle motor, and a carriage carrying the READ/WRITE head for travelling the head to the desired track on the disk. The carrier is pivotably supported by the frame portion and adapted to receive the disk cartridge. The cartridge can be loaded into the lower portion of the carrier upon popping-up of the carrier.
    Type: Grant
    Filed: May 22, 1984
    Date of Patent: June 7, 1988
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Kazunari Kume, Churyo Seki, Kunio Suganuma, Hiroshi Kurafuji, Hiroshi Mabuchi, Hisao Wakabayashi, Yoshiyuki Ohishi, Takayasu Machida
  • Patent number: 4622608
    Abstract: A carriage traveling mechanism for a floppy disc drive which includes an .alpha. belt, two ends of which are fixed on the carriage and a part of which is wound around a drive shaft, a tension cam supported by the carriage to provide close contact with the .alpha. belt in the vicinity of its fixed end, and a tension spring fixed to the carriage to press and urge the tension cam toward the .alpha. belt, whereby the requested tension force is regularly provided to both ends of the .alpha. belt which are fixed to the carriage.
    Type: Grant
    Filed: June 22, 1984
    Date of Patent: November 11, 1986
    Assignee: Citizen Watch Co., Ltd.
    Inventor: Hiroshi Mabuchi
  • Patent number: 4213293
    Abstract: A receiving unit for timepieces, especially an improved receiving unit for a self-winding mechanism of self-winding timepieces. The receiving unit comprises guide portions and springs which are formed together as a unitary structure using resin.
    Type: Grant
    Filed: October 10, 1978
    Date of Patent: July 22, 1980
    Assignee: Citizen Watch Co., Ltd.
    Inventors: Hiroshi Mabuchi, Isao Yabe