Patents by Inventor Hiroshi Mataki

Hiroshi Mataki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210291551
    Abstract: Provided are a manufacturing method of a printed article and a printing device which obtain a back printed article with a high image quality. A first treatment liquid which contains an aggregating agent that aggregates a color ink and a white ink is added to an impermeable medium, the color ink is applied to the impermeable medium to which the first treatment liquid is added to print an image, and the white ink is applied to the impermeable medium to which the color ink is applied. In a case in which a total amount of an applied amount of the color ink and an applied amount of the white ink exceeds a threshold value, a second treatment liquid which contains at least the aggregating agent that aggregates the white ink is added to the impermeable medium after the color ink is applied and before the white ink is applied.
    Type: Application
    Filed: June 7, 2021
    Publication date: September 23, 2021
    Applicant: FUJIFILM Corporation
    Inventor: Hiroshi MATAKI
  • Patent number: 11104141
    Abstract: Provided are a liquid jetting device, a liquid jetting head cleaning device, and a liquid jetting head cleaning method, in which an increase in the number of jetting failures is suppressed in a case where a nozzle surface of a liquid jetting head is cleaned by causing a napped wiping member to abut against the nozzle surface.
    Type: Grant
    Filed: March 22, 2020
    Date of Patent: August 31, 2021
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Mataki
  • Publication number: 20200215821
    Abstract: Provided are a liquid jetting device, a liquid jetting head cleaning device, and a liquid jetting head cleaning method, in which an increase in the number of jetting failures is suppressed in a case where a nozzle surface of a liquid jetting head is cleaned by causing a napped wiping member to abut against the nozzle surface.
    Type: Application
    Filed: March 22, 2020
    Publication date: July 9, 2020
    Applicant: FUJIFILM Corporation
    Inventor: Hiroshi MATAKI
  • Patent number: 10155400
    Abstract: A printing apparatus and a printing method that can reduce a difference in glossiness in an in-plane direction of a printed matter to which aqueous varnish has been applied. The apparatus and method satisfy a relationship of “Tp?(40/6)×tw?a” when the temperature of a recording surface at the time of application of aqueous varnish containing water is denoted by Tp, coating formation time of the aqueous varnish is denoted by tw, and a constant determined according to an allowable value of a gloss difference, which is a difference between glossiness of the recording surface of a printed matter of which applied aqueous varnish has been dried in a first direction and glossiness of the recording surface in a direction orthogonal to the first direction, is denoted by a. Here, the unit of the temperature Tp is ° C. and the unit of the coating formation time tw is minute.
    Type: Grant
    Filed: July 24, 2017
    Date of Patent: December 18, 2018
    Assignee: FUJIFIRM Corporation
    Inventor: Hiroshi Mataki
  • Patent number: 9919531
    Abstract: Provided are a nozzle wiping sheet, a nozzle wiping unit, and an image forming apparatus capable of preventing occurrence of streaks during printing immediately after maintenance. A wiping member (120) wipes a nozzle surface (57K) of a jetting head (56K) provided with a nozzle through which liquid droplets are jetted, in which a shape of the liquid droplet added dropwise to the wiping member (120) after a cleaning liquid (108) is added to the wiping member (120) satisfies the following condition when an aspect ratio of the liquid droplet after 40 seconds after the addition of the cleaning liquid (108) is assumed to be R, and the R is 1.3 or more.
    Type: Grant
    Filed: February 14, 2017
    Date of Patent: March 20, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Hiroshi Mataki, Jun Yamanobe, Hiroshi Inoue
  • Publication number: 20180029385
    Abstract: A printing apparatus and a printing method that can reduce a difference in glossiness in an in-plane direction of a printed matter to which aqueous varnish has been applied. The apparatus and method satisfy a relationship of “Tp?(40/6)×tw?a” when the temperature of a recording surface at the time of application of aqueous varnish containing water is denoted by Tp, coating formation time of the aqueous varnish is denoted by tw, and a constant determined according to an allowable value of a gloss difference, which is a difference between glossiness of the recording surface of a printed matter of which applied aqueous varnish has been dried in a first direction and glossiness of the recording surface in a direction orthogonal to the first direction, is denoted by a. Here, the unit of the temperature Tp is ° C. and the unit of the coating formation time tw is minute.
    Type: Application
    Filed: July 24, 2017
    Publication date: February 1, 2018
    Applicant: FUJIFILM Corporation
    Inventor: Hiroshi MATAKI
  • Patent number: 9776387
    Abstract: A transparent adhesive sheet for optics, which is capable of satisfying both adhesion and rework property, in view of the above problems of prior art. A production method of a silicone-based transparent adhesive sheet for optics for assembling the optical components, includes a step of forming a surface activation treated surface, in which peel strength after laminating onto an adherend increases with time, as compared with peel strength before lamination. The surface activation treatment is performed by using UV-ray irradiation on at least a part or the entire surface of an adhesive face contacting with the adherend of said transparent adhesive sheet for optics.
    Type: Grant
    Filed: January 7, 2013
    Date of Patent: October 3, 2017
    Assignee: TAICA CORPORATION
    Inventors: Yosuke Ono, Tatsuya Nunokawa, Masanori Natsuka, Hiroshi Mataki
  • Patent number: 9724924
    Abstract: Provided are a wiping mechanism, a liquid droplet jetting apparatus, and a wiping method capable of securing an absorption capacity of a wiping member which absorbs a liquid adhered to a nozzle surface while preventing infiltration of bubbles into a nozzle when the nozzle surface is wiped by the wiping member. The nozzle surface is wiped by the wiping member which has one surface 200A that comes into contact with the nozzle surface in which a plurality of nozzles through which liquid droplets are jetted are formed, and has a plurality of voids M that form capillaries from the one surface 200A side to the other surface 200B side, the voids M being greater in size on the other surface 200B side than on the one surface side 200A among the plurality of voids M.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: August 8, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Jun Yamanobe, Hiroshi Mataki, Hiroshi Inoue
  • Publication number: 20170151790
    Abstract: Provided are a nozzle wiping sheet, a nozzle wiping unit, and an image forming apparatus capable of preventing occurrence of streaks during printing immediately after maintenance. A wiping member (120) wipes a nozzle surface (57K) of a jetting head (56K) provided with a nozzle through which liquid droplets are jetted, in which a shape of the liquid droplet added dropwise to the wiping member (120) after a cleaning liquid (108) is added to the wiping member (120) satisfies the following condition when an aspect ratio of the liquid droplet after 40 seconds after the addition of the cleaning liquid (108) is assumed to be R, and the R is 1.3 or more.
    Type: Application
    Filed: February 14, 2017
    Publication date: June 1, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Hiroshi MATAKI, Jun YAMANOBE, Hiroshi INOUE
  • Publication number: 20170120600
    Abstract: Provided are a wiping mechanism, a liquid droplet jetting apparatus, and a wiping method capable of securing an absorption capacity of a wiping member which absorbs a liquid adhered to a nozzle surface while preventing infiltration of bubbles into a nozzle when the nozzle surface is wiped by the wiping member. The nozzle surface is wiped by the wiping member which has one surface 200A that comes into contact with the nozzle surface in which a plurality of nozzles through which liquid droplets are jetted are formed, and has a plurality of voids M that form capillaries from the one surface 200A side to the other surface 200B side, the voids M being greater in size on the other surface 200B side than on the one surface side 200A among the plurality of voids M.
    Type: Application
    Filed: January 17, 2017
    Publication date: May 4, 2017
    Applicant: FUJIFILM Corporation
    Inventors: Jun YAMANOBE, Hiroshi MATAKI, Hiroshi INOUE
  • Patent number: 9176376
    Abstract: A method of performing pattern transfer includes the steps of: applying liquid to a substrate, while performing relative movement of the substrate and a liquid ejection head having a plurality of nozzles, by performing ejection and deposition of a plurality of droplets of the liquid from the nozzles onto the substrate in a state where a shape of each of the droplets upon the deposition is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate; and curing the liquid that has been applied to the substrate in the applying step while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: November 3, 2015
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Mataki
  • Patent number: 9017573
    Abstract: Luminescent compositions are described comprising lanthanide-containing nanoclusters comprising lanthanide atoms bonded to at least one semimetal or transition metal via an oxygen or sulfur atom. Novel compositions include an antenna ligand complexed with the nanoclusters. The rare earth-metal nanoclusters are in the size range of 1 to 100 nm. Articles, such as solar cells, are described in which the nanoclusters (with or without antenna ligands) are dispersed in a polymer matrix. Novel methods of making luminescent films are also described.
    Type: Grant
    Filed: August 19, 2009
    Date of Patent: April 28, 2015
    Assignee: Batlelle Japan Corporation
    Inventors: Steven M. Risser, Vincent McGinniss, David W. Nippa, Paul Edward Burrows, Asanga B. Padmaperuma, Sambhu N. Kundu, Hiroshi Mataki
  • Publication number: 20150002924
    Abstract: The present invention discloses a transparent adhesive sheet for optics, which is capable of satisfying both adhesion and rework property, in view of the above problems of prior art. A production method of a silicone-based transparent adhesive sheet for optics for assembling the optical components, characterized by forming a surface activation treated surface, in which peel strength after laminating onto an adherend increases with time, as compared with peel strength before lamination, by performing surface activation treatment using UV-ray irradiation on at least a part or the entire surface of an adhesive face contacting with the adherend of said transparent adhesive sheet for optics, and a transparent adhesive sheet for optics obtained from the production method thereof, and the like.
    Type: Application
    Filed: January 7, 2013
    Publication date: January 1, 2015
    Applicant: TAICA CORPORATION
    Inventors: Yosuke Ono, Tatsuya Nunokawa, Masanori Natsuka, Hiroshi Mataki
  • Patent number: 8778227
    Abstract: The present invention provides an organic/inorganic composite containing an inorganic phase dispersed in an organic polymer, the inorganic phase comprises one or more metal atoms that are coordinated to at least one rare earth metal atom via oxygen. The composite contains at least 5 mass % of rare earth metal. This rare earth metal is dispersed in the inorganic phase.
    Type: Grant
    Filed: April 9, 2012
    Date of Patent: July 15, 2014
    Assignee: KRI, Inc.
    Inventors: Hiroshi Mataki, Toshimi Fukui
  • Patent number: 8733917
    Abstract: A line image forming method includes the steps of: ejecting a plurality of droplets of liquid sequentially from an inkjet head, the liquid containing a functional component; and depositing the droplets of the liquid onto a non-permeable medium, the deposited droplets becoming joined together on the non-permeable medium to form a line pattern of the liquid, wherein a receding contact angle of the liquid with respect to the non-permeable medium being not larger than 10°.
    Type: Grant
    Filed: July 14, 2011
    Date of Patent: May 27, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Mataki
  • Publication number: 20140083753
    Abstract: Provided are a method of forming copper wiring, a method of manufacturing a wiring board, and a wiring board, which are capable of improving conductivity and suppressing deterioration over a period of time of copper wiring. The method of forming copper wiring includes: a wiring pattern formation step of depositing a suspension onto a substrate to form a wiring pattern of the suspension on the substrate, the suspension including dispersed copper particles having an average particle diameter that is not smaller than 100 nm; a drying step of drying the copper particles at a temperature lower than 150° C.; a pressure application step of applying pressure to the copper particles in the wiring pattern; a heat application step of applying heat to the copper particles in the wiring pattern; and a reducing treatment step of subjecting the copper particles to a reducing treatment.
    Type: Application
    Filed: September 20, 2013
    Publication date: March 27, 2014
    Applicant: FUJIFILM CORPORATION
    Inventor: Hiroshi MATAKI
  • Publication number: 20140020938
    Abstract: A method of forming copper wiring includes: a wiring pattern formation step of depositing a first suspension onto a substrate to form a wiring pattern of the first suspension on the substrate, the first suspension including dispersed first copper particles having an average particle diameter that is not smaller than 100 nm; a drying step of drying the first copper particles at a temperature lower than 150° C.; a second suspension deposition step of depositing a second suspension onto the wiring pattern, the second suspension including dispersed second copper particles having an average particle diameter that is smaller than the average particle diameter of the first copper particles; a compaction step of reducing voids between the first and second copper particles; a heat application step of applying heat to the first and second copper particles; and a reducing treatment step of subjecting the first and second copper particles to a reducing treatment.
    Type: Application
    Filed: September 20, 2013
    Publication date: January 23, 2014
    Applicant: Fujifilm Corporation
    Inventor: Hiroshi MATAKI
  • Patent number: 8609006
    Abstract: The pattern transfer apparatus includes: a liquid ejection device having liquid ejection ports through which droplets of liquid are ejected and deposited onto a substrate surface while the liquid ejection device relatively moves to scan the substrate surface in a relative scanning direction; and a stamp having a stamp surface on which a pattern is formed, the stamp surface being applied to the droplets of the liquid on the substrate surface in a stamp application direction while the stamp is relatively moved with respect to the substrate, wherein when defining, on the substrate surface, strips which are straight and parallel to the stamp application direction and have widths substantially equal to diameters of the droplets deposited on the substrate surface, at least one of the strips includes the droplets which are ejected respectively from at least different two of the liquid ejection ports of the liquid ejection device.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: December 17, 2013
    Assignee: Fujifilm Corporation
    Inventor: Hiroshi Mataki
  • Publication number: 20130004669
    Abstract: A method of performing pattern transfer includes the steps of: applying liquid to a substrate, while performing relative movement of the substrate and a liquid ejection head having a plurality of nozzles, by performing ejection and deposition of a plurality of droplets of the liquid from the nozzles onto the substrate in a state where a shape of each of the droplets upon the deposition is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate; and curing the liquid that has been applied to the substrate in the applying step while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid.
    Type: Application
    Filed: March 2, 2011
    Publication date: January 3, 2013
    Inventor: Hiroshi Mataki
  • Publication number: 20120286202
    Abstract: The present invention provides an organic/inorganic composite containing an inorganic phase dispersed in an organic polymer, the inorganic phase comprises one or more metal atoms that are coordinated to at least one rare earth metal atom via oxygen. The composite contains at least 5 mass % of rare earth metal. This rare earth metal is dispersed in the inorganic phase.
    Type: Application
    Filed: April 9, 2012
    Publication date: November 15, 2012
    Inventors: Hiroshi Mataki, Toshimi Fukui