Abstract: An object of the present invention is to provide a heat storage composition excellent in slow flame retardance and a heat storage member excellent in the slow flame retardance. Another object of the present invention is to provide an electronic device including a heat storage member, and a manufacturing method of a heat storage member. The heat storage composition according to an embodiment of the present invention contains a heat storage material and a flame retardant, in which a specific condition A is satisfied. The heat storage member according to an embodiment of the present invention contains a heat storage material and a flame retardant, in which a specific condition C is satisfied.

Abstract: An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure a neutron ray from a neutron ray source which is generated in the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a plurality of measurement values measured by the plurality of neutron ray measuring instruments.

Abstract: Provided is a substrate cleaning device, an abnormality determination method of a substrate cleaning device, and an abnormality determination program of a substrate cleaning device for determining whether there is an abnormality in a roll cleaning member that is attached. A substrate cleaning device includes: a holder to which a roll cleaning member for cleaning a substrate is attached in a detachable manner; a rotation device which makes the roll cleaning member attached to the holder rotate; a sensor which measures information concerning a vibration of the roll cleaning member during rotation; and a control device which determines, based on a measurement result of the sensor, whether there is an abnormality in the roll cleaning member attached to the holder.

Abstract: An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure a neutron ray from a neutron ray source which is generated in the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a plurality of measurement values measured by the plurality of neutron ray measuring instruments.

Abstract: An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure neutron rays which are generated at a plurality of locations of the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a measurement value in at least one of the plurality of neutron ray measuring instruments.

Abstract: There is provided a wearable device including: a display that displays time; and a processor, in which the processor includes an acquisition unit that acquires moving object information related to a moving object which moves to a destination place and a time difference of the destination place with respect to standard time, and a correction unit that corrects the time to be displayed on the display unit based on the time difference when it is determined that a predetermined condition related to arrival of the moving object to the destination place is satisfied based on the moving object information.

Abstract: An ion implanter includes: a main body which includes a plurality of units which are disposed along a beamline along which an ion beam is transported, and a substrate transferring/processing unit which is disposed farthest downstream of the beamline, and has a neutron ray source in which a neutron ray is generated due to collision of a ultrahigh energy ion beam; an enclosure which at least partially encloses the main body; and a neutron ray scattering member which is disposed at a position where a neutron ray which is emitted from the neutron ray source is incident in a direction in which a distance from the neutron ray source to the enclosure is equal to or less than a predetermined value.

Abstract: An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure neutron rays which are generated at a plurality of locations of the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a measurement value in at least one of the plurality of neutron ray measuring instruments.

Abstract: An ion implanter includes: a main body which includes a plurality of units which are disposed along a beamline along which an ion beam is transported, and a substrate transferring/processing unit which is disposed farthest downstream of the beamline, and has a neutron ray source in which a neutron ray is generated due to collision of a ultrahigh energy ion beam; an enclosure which at least partially encloses the main body; and a neutron ray scattering member which is disposed at a position where a neutron ray which is emitted from the neutron ray source is incident in a direction in which a distance from the neutron ray source to the enclosure is equal to or less than a predetermined value.

Abstract: An ion implanter includes a measuring device that measures an angle distribution of an ion beam with which a wafer is irradiated. The measuring device includes: a slit into which the ion beam is incident; a central electrode body having a beam measurement surface disposed on a central plane extending from the slit to a beam traveling direction; a plurality of side electrode bodies disposed between the slit and the central electrode body and disposed away from the central plane in a slit width direction, in which each of the plurality of side electrode bodies has a beam measurement surface; and a magnet device that applies a magnetic field bending around an axis extending along a slit length direction to at least one of the beam measurement surfaces of the plurality of side electrode bodies.

Abstract: Technology to display images with presence on a display device while reducing data communication volume. An information processing device includes: a communicator; a multiple viewpoint image generator configured to, based on a three-dimensional model of a subject the communicator receives from an external device, generate a display image including a viewpoint image corresponding to the perspective of multiple viewpoints; and a display controller configured to display the display image on a multiple viewpoint display device that displays images corresponding to multiple viewpoints.

Abstract: There is provided a wearable device including: a display that displays time; and a processor, in which the processor includes an acquisition unit that acquires moving object information related to a moving object which moves to a destination place and a time difference of the destination place with respect to standard time, and a correction unit that corrects the time to be displayed on the display unit based on the time difference when it is determined that a predetermined condition related to arrival of the moving object to the destination place is satisfied based on the moving object information.

Abstract: An ion implanter includes an ion source configured to generate an ion beam including an ion of a first nonradioactive nuclide, a beamline configured to support an ion beam irradiated target formed of a solid material including a second nonradioactive nuclide different from the first nonradioactive nuclide, and a controller configured to calculate at least one of an estimated radiation dosage of a radioactive ray and an estimated generation amount of a radioactive nuclide generated by a nuclear reaction between the first nonradioactive nuclide and the second nonradioactive nuclide.

Abstract: An ion implanter includes an ion source configured to generate an ion beam including an ion of a nonradioactive nuclide, a beamline configured to support an ion beam irradiated target, and a controller configured to calculate an estimated radiation dosage of a radioactive ray generated by a nuclear reaction between the ion of the nonradioactive nuclide incident into the ion beam irradiated target and the nonradioactive nuclide accumulated in the ion beam irradiated target as a result of ion beam irradiation performed previously.

Abstract: Technology to display images with presence on a display device while reducing data communication volume. An information processing device includes: a communicator; a multiple viewpoint image generator configured to, based on a three-dimensional model of a subject the communicator receives from an external device, generate a display image including a viewpoint image corresponding to the perspective of multiple viewpoints; and a display controller configured to display the display image on a multiple viewpoint display device that displays images corresponding to multiple viewpoints.

Abstract: An ion implanter includes an ion source configured to generate an ion beam including an ion of a first nonradioactive nuclide, a beamline configured to support an ion beam irradiated target formed of a solid material including a second nonradioactive nuclide different from the first nonradioactive nuclide, and a controller configured to calculate at least one of an estimated radiation dosage of a radioactive ray and an estimated generation amount of a radioactive nuclide generated by a nuclear reaction between the first nonradioactive nuclide and the second nonradioactive nuclide.

Abstract: An ion implanter includes an ion source configured to generate an ion beam including an ion of a nonradioactive nuclide, a beamline configured to support an ion beam irradiated target, and a controller configured to calculate an estimated radiation dosage of a radioactive ray generated by a nuclear reaction between the ion of the nonradioactive nuclide incident into the ion beam irradiated target and the nonradioactive nuclide accumulated in the ion beam irradiated target as a result of ion beam irradiation performed previously.

Abstract: Provided is a three-dimensional image processing system that includes a sensor portion that is attached to a measurement target and detects a three-dimensional motion thereof as measurement data; a moving image data generation portion that generates moving image data in which the sensor potion is imaged together with the measurement target; and a control portion that causes the moving image data and the measurement data to be synchronized with each other on a time axis by comparing a change pattern relating to the motion of the sensor portion and being based on the moving image data with a change pattern relating to the motion of the sensor portion and being based on the measurement data.

Abstract: According to one embodiment, in an abnormality portent detection system, a collection unit time-sequentially collects plural kinds of parameters related to a state of an apparatus. A calculation unit calculates, while temporally changing a boundary between a first period and a second period in a time-sequential variation characteristic of each of plural kinds of parameters, a contribution rate of each of the plural kinds of parameters with respect to a transition from a first state of the apparatus before the boundary to a second state of the apparatus after the boundary. An extraction unit extracts, among the plural kinds of parameters, a parameter showing a change in which the contribution rate has a maximum value at a timing before an abnormality occurrence timing of the apparatus with respect to a time of the boundary, based on a result of the calculation.

Abstract: Provided is a highly versatile casting mold in which weight and manufacturing cost can be reduced, and whereby flash can be suppressed. A plate-shaped base part having a flat attachment face to which a back face of a fixed-cavity mold is attached is provided to a fixed mold constituting a casting mold. A portion of the base part in contact with the back face of the fixed-cavity mold has an attachment part body for supporting the fixed-cavity mold, and a pressure increasing means for increasing the pressure imparted to the fixed-cavity mold via the attachment part body in a state in which the mold is closed.