Patents by Inventor Hiroshi Nishizuka
Hiroshi Nishizuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5279992Abstract: A wafer having chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer such as an orientation flatness. The chipping of the wafer can be prevented, and in coating the wafer with a photoresist, forming an epitaxially grown layer on the wafer, etc., films having desired characteristics can be provided on the surface of the wafer.Type: GrantFiled: March 25, 1992Date of Patent: January 18, 1994Assignee: Hitachi, Ltd.Inventors: Hisashi Maejima, Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira
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Patent number: 5230747Abstract: A wafer having chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer such as an orientation flatness. The chipping of the wafer can be prevented, and in coating the wafer with a photoresist, forming an epitaxially grown layer on the wafer, etc., films having desired characteristics can be provided on the surface of the wafer.Type: GrantFiled: October 29, 1991Date of Patent: July 27, 1993Assignee: Hitachi, Ltd.Inventors: Hisashi Maejima, Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira
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Patent number: 5025284Abstract: The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pattern can be reproduced precisely. Concretely, the apparatus comprises a detector to detect at least one of the tube temperature of the optical projecting system, humidity or atmospheric pressure near the optical system, and a control unit which controls optical characteristics based upon the signals detected by the detector. Namely, the control unit adjusts the optical characteristics depending upon the environmental conditions thereby to adjust variation in the projecting magnification and/or variation in the focal position. Thus, variation in the optical characteristics is adjusted to transfer the pattern maintaining high precision.Type: GrantFiled: September 5, 1990Date of Patent: June 18, 1991Assignee: Hitachi, Ltd.Inventors: Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima
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Patent number: 4974018Abstract: The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pattern can be reproduced precisely. Concretely, the apparatus comprises a detector to detect at least one of the tube temperature of the optical projecting system, humidity or atmospheric pressure near the optical system, and a control unit which controls optical characteristics based upon the signals detected by the detector. Namely, the control unit adjusts the optical characteristics depending upon the environmental conditions thereby to adjust variation in the projecting magnification and/or variation in the focal position. Thus, variation in the optical characteristics is adjusted to transfer the pattern maintaining high precision.Type: GrantFiled: December 23, 1988Date of Patent: November 27, 1990Assignee: Hitachi, Ltd.Inventors: Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima
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Patent number: 4783225Abstract: A wafer having chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer such as an orientation flatness. The chipping of the wafer can be prevented, and in coating the wafer with a photoresist, forming an epitaxially grown layer on the wafer, etc., films having desired characteristics can be provided on the surface of the wafer.Type: GrantFiled: February 19, 1986Date of Patent: November 8, 1988Assignee: Hitachi, Ltd.Inventors: Hisashi Maejima, Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira
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Patent number: 4780606Abstract: A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.Type: GrantFiled: September 23, 1987Date of Patent: October 25, 1988Assignees: Hitachi, Ltd, Hitachi Ome Electronic Co., Inc.Inventors: Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa
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Patent number: 4701608Abstract: A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.Type: GrantFiled: January 29, 1986Date of Patent: October 20, 1987Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.Inventors: Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa
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Patent number: 4699505Abstract: The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pattern can be reproduced precisely. Concretely, the apparatus comprises a detector to detect at least one of the tube temperature of the optical projecting system, humidity or atmospheric pressure near the optical system, and a control unit which controls optical characteristics based upon the signals detected by the detector. Namely, the control unit adjusts the optical characteristics depending upon the environmental conditions thereby to adjust variation in the projecting magnification and/or variation in the focal position. Thus, variation in the optical characteristics is adjusted to transfer the pattern maintaining high precision.Type: GrantFiled: June 10, 1985Date of Patent: October 13, 1987Assignee: Hitachi, Ltd.Inventors: Susumu Komoriya, Hiroshi Nishizuka, Shinya Nakagawa, Hisashi Maejima
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Patent number: 4598197Abstract: A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.Type: GrantFiled: August 2, 1983Date of Patent: July 1, 1986Assignees: Hitachi, Ltd., Hitachi Ome Electronic Co., Ltd.Inventors: Koyo Morita, Keizo Nomura, Hiroshi Nishizuka, Tai Hoshi, Yoichiro Tamiya, Terushige Asakawa
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Patent number: 4298273Abstract: A wafer projection aligner comprises an optical system for projecting a radiation pattern onto a surface of a semiconductor wafer and a wafer position setting apparatus for positioning the wafer at a position within a focal depth of the optical system for allowing printing of a fine pattern on the wafer.Type: GrantFiled: October 22, 1979Date of Patent: November 3, 1981Assignee: Hitachi, Ltd.Inventors: Hiroshi Nishizuka, Susumu Komoriya, Koyo Morita, Takayoshi Osakaya
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Patent number: 4218136Abstract: A method of making a mask and a wafer intimately contact each other by means of such a mask aligning apparatus comprising a base having a chamber, a piston apparatus movable up and down in the chamber, a wafer chuck provided at one end of the piston apparatus and adapted to fix the wafer, means for fixing the mask to the upper surface of the wafer in a superposed relationship, drive means adapted to impart a driving force to the piston, so as to move the wafer toward the mask, and means for biasing the piston apparatus in the direction to move the wafer away from the mask.Type: GrantFiled: September 19, 1978Date of Patent: August 19, 1980Assignee: Hitachi, Ltd.Inventors: Susumu Komoriya, Koyo Morita, Hiroshi Nishizuka, Hisashi Maejima
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Patent number: RE40139Abstract: A wafer having chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer such as an orientation flatness. The chipping of the wafer can be prevented, and in coating the wafer with a photoresist, forming an epiaxially grown layer on the wafer, etc., films having desired characteristics can be provided on the surface of the wafer.Type: GrantFiled: November 3, 2000Date of Patent: March 4, 2008Assignee: Renesas Technology Corp.Inventors: Hisashi Maejima, Hiroshi Nishizuka, Susumu Komoriya, Etuo Egashira