Patents by Inventor Hiroshi Osuda
Hiroshi Osuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7863195Abstract: An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.Type: GrantFiled: March 14, 2008Date of Patent: January 4, 2011Assignee: Fujitsu Semiconductor LimitedInventors: Naoki Hiraoka, Hiroshi Osuda, Hotaka Yamamoto
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Publication number: 20080214005Abstract: An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.Type: ApplicationFiled: March 14, 2008Publication date: September 4, 2008Applicant: FUJITSU LIMITEDInventors: Naoki Hiraoka, Hiroshi Osuda, Hotaka Yamamoto
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Patent number: 7419946Abstract: An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.Type: GrantFiled: September 16, 2003Date of Patent: September 2, 2008Assignee: Fujitsu LimitedInventors: Naoki Hiraoka, Hiroshi Osuda, Hotaka Yamamoto
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Patent number: 7232504Abstract: A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid.Type: GrantFiled: November 22, 2002Date of Patent: June 19, 2007Assignee: Fujitsu LimitedInventors: Hiroshi Osuda, Toru Matoba, Daisuke Adachi, Masataka Fukuizumi
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Patent number: 7183117Abstract: A supply apparatus for preparing a mixed chemical solution of a predetermined mixing ratio at a low cost and for supplying the mixed chemical solution stably. The supply apparatus includes a measuring apparatus located on an intermediate portion of a flow channel through which the chemical solution flows upward for measuring properties of the mixed chemical solution. In the lower portion of the measuring apparatus, disposed is a nozzle for spouting the chemical solution upward.Type: GrantFiled: October 22, 2002Date of Patent: February 27, 2007Assignee: Fujitsu LimitedInventors: Masataka Fukuizumi, Hiroshi Osuda, Toru Matoba, Takeshi Nakamura
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Patent number: 7144552Abstract: A chemical solution preparation apparatus for preparing a chemical solution from chemical gas of an industrial chemical grade. A dissolution unit dissolves the chemical gas in pure water, which is contained in a tank. A gas discharge control unit controls the amount of chemical gas discharged from the dissolution unit. A liquid discharge discharges a predetermined amount of the chemical solution from the tank. At least one of the gas discharge control unit and the liquid discharge control unit are operated at substantially the same time as the dissolution unit.Type: GrantFiled: July 19, 2000Date of Patent: December 5, 2006Assignee: Fujitsu LimitedInventors: Masataka Fukuizumi, Toru Matoba, Hiroshi Osuda
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Patent number: 7052599Abstract: An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized circulation. The slurry effluent is then regenerated and reused.Type: GrantFiled: October 2, 2003Date of Patent: May 30, 2006Assignee: Fujitsu LimitedInventors: Hiroshi Osuda, Toru Matoba, Masataka Fukuizumi
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Publication number: 20040069878Abstract: An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized circulation. The slurry effluent is then regenerated and reused.Type: ApplicationFiled: October 2, 2003Publication date: April 15, 2004Applicant: FUJITSU LIMITEDInventors: Hiroshi Osuda, Toru Matoba, Masataka Fukuizumi
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Publication number: 20040052154Abstract: An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.Type: ApplicationFiled: September 16, 2003Publication date: March 18, 2004Applicant: FUJITSU VLSI LIMITEDInventors: Naoki Hiraoka, Hiroshi Osuda, Hotaka Yamamoto
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Patent number: 6659634Abstract: An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.Type: GrantFiled: October 29, 2002Date of Patent: December 9, 2003Assignee: Fujitsu VLSI LimitedInventors: Naoki Hiraoka, Hiroshi Osuda, Hotaka Yamamoto
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Patent number: 6656359Abstract: An apparatus and method recycles the abrasive fluid or slurry effluent used in the polishing step in the manufacture of semiconductors. Agglomerations of abrasive grains built up in the slurry effluent are crushed using a mill, ultrasonic oscillation, or pressurized circulation. The slurry effluent is then regenerated and reused.Type: GrantFiled: July 21, 1999Date of Patent: December 2, 2003Assignee: Fujitsu LimitedInventors: Hiroshi Osuda, Toru Matoba, Masataka Fukuizumi
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Publication number: 20030119198Abstract: A supply apparatus for preparing a mixed chemical solution of a predetermined mixing ratio at a low cost and for supplying the mixed chemical solution stably. The supply apparatus includes a measuring apparatus located on an intermediate portion of a flow channel through which the chemical solution flows upward for measuring properties of the mixed chemical solution. In the lower portion of the measuring apparatus, disposed is a nozzle for spouting the chemical solution upward.Type: ApplicationFiled: October 22, 2002Publication date: June 26, 2003Applicant: FUJITSU LIMITEDInventors: Masataka Fukuizumi, Hiroshi Osuda, Toru Matoba, Takeshi Nakamura
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Publication number: 20030104959Abstract: An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.Type: ApplicationFiled: October 29, 2002Publication date: June 5, 2003Applicant: FUJITSU VLSI LIMITEDInventors: Naoki Hiraoka, Hiroshi Osuda, Hotaka Yamamoto
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Publication number: 20030079981Abstract: A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid.Type: ApplicationFiled: November 22, 2002Publication date: May 1, 2003Applicant: FUJITSU LIMITEDInventors: Hiroshi Osuda, Toru Matoba, Daisuke Adachi, Masataka Fukuizumi
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Patent number: 6508915Abstract: A distilling apparatus and method use a two step distillation and purification process for processing a waste liquid, such as an impure sulfuric acid solution, to form a highly concentrated sulfuric acid solution. First, the waste liquid is stored in a concentrating column, where it is heated. A condenser, which uses the waste liquid as a cooling medium, condenses the vapor generated by the heater. The condensed vapor is passed through a filter, which separates impurities out of the waste liquid, prior to feeding the waste liquid back into the concentrating column. Water is then removed from the waste liquid via a distilling process. The resulting concentrated liquid is then fed to a purifying column, where it is again heated, to remove residue, and condensed, resulting in a highly pure waste liquid.Type: GrantFiled: December 17, 1997Date of Patent: January 21, 2003Assignee: Fujitsu LimitedInventors: Hiroshi Osuda, Toru Matoba, Daisuke Adachi, Masataka Fukuizumi
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Patent number: 6477323Abstract: A heating vessel for concentration is formed in an elongated one, and a baffle plate is arranged to increase sulfuric acid liquid concentration at an outlet to a high level. The heating vessel for concentration and a heating vessel for distillation are installed so that the respective heating vessels have substantially the same waste sulfuric acid liquid level therein, forming continuous flow of the sulfuric acid liquid without presence of a valve or an intermediate tank in a connecting pipe. The heating vessel for distillation is formed in an elongated one with a baffle plate arranged therein to increase the impurity concentration included in concentrated sulfuric acid liquid at an outlet to a high level.Type: GrantFiled: March 30, 1998Date of Patent: November 5, 2002Assignee: Asahi Techno Glass CorporationInventors: Kiyohito Koizumi, Hiroshi Osuda, Toru Matoba, Masataka Fukuizumi, Takayuki Sadakata
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Publication number: 20010003555Abstract: A heating vessel for concentration is formed in an elongated one, and a baffle plate is arranged to increase sulfuric acid liquid concentration at an outlet to a high level. The heating vessel for concentration and a heating vessel for distillation are installed so that the respective heating vessels have substantially the same waste sulfuric acid liquid level therein, forming continuous flow of the sulfuric acid liquid without presence of a valve or an intermediate tank in a connecting pipe. The heating vessel for distillation is formed in an elongated one with a baffle plate arranged therein to increase the impurity concentration included in concentrated sulfuric acid liquid at an outlet to a high level.Type: ApplicationFiled: March 30, 1998Publication date: June 14, 2001Inventors: KIYOHITO KOIZUMI, HIROSHI OSUDA, TORU MATOBA, MASATAKA FUKUIZUMI, TAKAYUKI SADAKATA