Patents by Inventor Hiroshi Otomo
Hiroshi Otomo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250226180Abstract: A plasma processing apparatus, comprising: a processing chamber; a gas supply part; a first electrode and a second electrode facing each other; first and second high-frequency power supply for supplying high-frequency powers to the first and second electrodes; a sensor part for measuring a state of plasma in the processing chamber; and a controller, wherein the first electrode applies a high-frequency voltage to generate the plasma from the processing gas, the second high-frequency power supply is a broadband power supply that is capable of setting a frequency of the high-frequency power supplied to the second electrode, the controller obtains an ion plasma frequency for a specific type of ion based on the measurement result, and the controller applies a high-frequency voltage of the ion plasma frequency to the plasma by setting the frequency of the high-frequency power supplied from the second high-frequency power supply as the ion plasma frequency.Type: ApplicationFiled: March 28, 2025Publication date: July 10, 2025Inventor: Hiroshi OTOMO
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Publication number: 20240256735Abstract: A method analyzes physical transport in a proton exchange membrane fuel cell (PEMFC) having three adjacent layers L1, L2, L3, each with a distinct porous structure. A first small scale multiphase simulation S1 of a first portion of the L1/L2 interface is used to characterize the L1/L2 interface. The S1 results are statistically extended to a larger second portion of the L1/L2 interface. The statistically extended L1/L2 interface is used as a boundary condition for a second multiphase simulation S2 to characterize the L2/L3 interface. S1 is repeated using the characterized L2/L3 interface as a boundary condition. S1 and S2 respectively simulate of one or more of momentum, energy, species, and charge transport across the L1/L2 and L2/L3 interface.Type: ApplicationFiled: February 1, 2023Publication date: August 1, 2024Inventors: Ashraful Islam, Hiroshi Otomo, Rafael Salazar-Tio, Bernd Crouse, Raoyang Zhang, Hudong Chen
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Patent number: 11907625Abstract: Disclosed are computer implemented techniques for conducting a fluid simulation of a porous medium. These techniques involve retrieving a representation of a three dimensional porous medium, the representation including pore space corresponding to the porous medium, with the representation including at least one portion of under-resolved pore structure in the porous medium, defining a representative flow model that includes the under-resolved pore structure in the representation, and constructing by the computer system fluid force curves that correspond to fluid forces in the under-resolved pore structure in the representation.Type: GrantFiled: December 29, 2020Date of Patent: February 20, 2024Assignee: Dassault Systemes Americas Corp.Inventors: Hiroshi Otomo, Rafael Salazar Tio, Hudong Chen, Raoyang Zhang, Andrew Fager, Ganapathi Raman Balasubramanian, Bernd Crouse, Hongli Fan, Jingjing Yang
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Publication number: 20230178338Abstract: There is provided a plasma processing apparatus comprising: a chamber; a lower electrode provided in the chamber and included in a substrate support; an upper electrode provided in the chamber and disposed to face the lower electrode; a gas supply configured to supply a processing gas; a high-frequency power supply electrically connected to the upper electrode and configured to generate a plasma of the processing gas by applying a high-frequency voltage to the upper electrode; a first meter configured to measure a potential waveform of the upper electrode; a second meter configured to measure a potential waveform of the lower electrode; a detector configured to detect a voltage waveform; an impedance adjusting device configured to adjust an impedance of the lower electrode; and a controller configured to control the impedance adjusting device to adjust the impedance of the lower electrode based on the voltage waveform detected by the detector.Type: ApplicationFiled: December 1, 2022Publication date: June 8, 2023Inventor: Hiroshi OTOMO
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Publication number: 20230013551Abstract: There is provided a plasma processing apparatus comprising: a processing container; a lower electrode provided inside the processing container; an upper electrode disposed to face the lower electrode; a gas supply configured to supply a processing gas between the upper electrode and the lower electrode; a high frequency power source configured to generate plasma of the processing gas by applying a high frequency voltage to the upper electrode; and a voltage waveform shaping part provided between the high frequency power source and the upper electrode and configured to shape a voltage waveform of a high frequency voltage output from the high frequency power source by converting a positive voltage component into a negative voltage component.Type: ApplicationFiled: July 7, 2022Publication date: January 19, 2023Inventors: Hiroshi OTOMO, Takahiro SHINDO
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Publication number: 20220207219Abstract: Disclosed are computer implemented techniques for conducting a fluid simulation of a porous medium. These techniques involve retrieving a representation of a three dimensional porous medium, the representation including pore space corresponding to the porous medium, with the representation including at least one portion of under-resolved pore structure in the porous medium, defining a representative flow model that includes the under-resolved pore structure in the representation, and constructing by the computer system fluid force curves that correspond to fluid forces in the under-resolved pore structure in the representation.Type: ApplicationFiled: December 29, 2020Publication date: June 30, 2022Inventors: Hiroshi Otomo, Rafael Salazar Tio, Hudong Chen, Raoyang Zhang, Andrew Fager, Ganapathi Raman Balasubramanian, Bernd Crouse, Hongli Fan, Jingjing Yang
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Publication number: 20220020568Abstract: A plasma processing apparatus is provided to perform plasma processing on a substrate. The plasma processing apparatus includes a processing chamber, a substrate support disposed in the processing chamber to place thereon the substrate, a grounded lower electrode provided in the substrate support, an upper electrode disposed to face the lower electrode, a gas supply unit to supply a processing gas to a space between the upper electrode and the substrate support, and a radio frequency power supply to apply RF power to the upper electrode to generate plasma of the processing gas. The plasma processing apparatus further includes a voltage waveform shaping unit provided between the RF power supply and the upper electrode to shape a voltage waveform of the RF power supply to suppress a positive voltage of the RF voltage applied to the upper electrode.Type: ApplicationFiled: July 13, 2021Publication date: January 20, 2022Inventors: Takahiro SHINDO, Seiichi OKAMOTO, Hiroshi OTOMO, Takamichi KIKUCHI, Tatsuo MATSUDO, Yasushi MORITA, Takashi SAKUMA
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Patent number: 11118449Abstract: This description relates to computer simulation of physical processes, such as computer simulation of multi-species flow through porous media including the determination/estimation of relative permeabilities for the multi-species flow through the porous media.Type: GrantFiled: July 15, 2019Date of Patent: September 14, 2021Assignee: Dassault Systemes Simulia Corp.Inventors: Bernd Crouse, Xiaobo Nie, Raoyang Zhang, Yong Li, Hiroshi Otomo, Hudong Chen, Andrew Fager
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Patent number: 10550690Abstract: This description relates to computer simulation of physical processes, such as computer simulation of multi-species flow through porous media including the determination/estimation of relative permeabilities for the multi-species flow through the porous media.Type: GrantFiled: May 15, 2014Date of Patent: February 4, 2020Assignee: Dassault Systemes Simulia Corp.Inventors: Bernd Crouse, Xiaobo Nie, Raoyang Zhang, Yong Li, Hiroshi Otomo, Hudong Chen, Andrew Fager, David M. Feed
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Publication number: 20190368344Abstract: This description relates to computer simulation of physical processes, such as computer simulation of multi-species flow through porous media including the determination/estimation of relative permeabilities for the multi-species flow through the porous media.Type: ApplicationFiled: July 15, 2019Publication date: December 5, 2019Inventors: Bernd Crouse, Xiaobo Nie, Raoyang Zhang, Yong Li, Hiroshi Otomo, Hudong Chen, Andrew Fager
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Publication number: 20140343858Abstract: This description relates to computer simulation of physical processes, such as computer simulation of multi-species flow through porous media including the determination/estimation of relative permeabilities for the multi-species flow through the porous media.Type: ApplicationFiled: May 15, 2014Publication date: November 20, 2014Applicant: Exa CorporationInventors: Bernd Crouse, Xiaobo Nie, Raoyang Zhang, Yong Li, Hiroshi Otomo, Hudong Chen, Andrew Fager
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Patent number: 7426987Abstract: A coin denomination discriminating device for improving coin dispensing devices which incorporates components formed of non-magnetic material including a non-magnetic rotor having a coin receiving portion and a non-magnetic reference guide to guide coins from a storage coin holding bowl to a coin conveying device capable of selectively releasing coins of various denominations. Magnetic sensor units can be positioned along the coin movement path to provide characteristic signals representative of the coins independent of influence of metallic components in the transporting path. The non-magnetic members can be formed from wear resistant plastic material and relatively inexpensive magnetic sensors with coil and ferrite coils can be utilized adjacent the rotor.Type: GrantFiled: June 12, 2006Date of Patent: September 23, 2008Assignee: Asahi Seiko Kabushiki KaishaInventors: Masayoshi Umeda, Minoru Enomoto, Hiroshi Otomo
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Publication number: 20060278495Abstract: A coin denomination discriminating device for improving coin dispensing devices which incorporates components formed of non-magnetic material including a non-magnetic rotor having a coin receiving portion and a non-magnetic reference guide to guide coins from a storage coin holding bowl to a coin conveying device capable of selectively releasing coins of various denominations. Magnetic sensor units can be positioned along the coin movement path to provide characteristic signals representative of the coins independent of influence of metallic components in the transporting path. The non-magnetic members can be formed from wear resistant plastic material and relatively inexpensive magnetic sensors with coil and ferrite coils can be utilized adjacent the rotor.Type: ApplicationFiled: June 12, 2006Publication date: December 14, 2006Inventors: Masayoshi Umeda, Minoru Enomoto, Hiroshi Otomo
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Publication number: 20040238321Abstract: The first purpose is to provide a coin selector which can be easily set up the standard data without putting coins into the coin selector. The second purpose of this invention is to provide both a coin selector and a outside setting unit which are not easily changed in the standard data. A coin selector comprises of; plural standard data memory for memorizing standard data, a selecting means which can be effective a selected standard data memory based on a direction from an outside setting unit, a distinguishing means which compares the memorized data of said selected standard data memory and the outputting data of a coin sensor and outputs an authenticity signal, a gate controlling means which controls a gate based on an output from the distinguishing means.Type: ApplicationFiled: May 19, 2004Publication date: December 2, 2004Inventor: Hiroshi Otomo
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Patent number: 6125987Abstract: A coin selector is provided which is adapted to electronically sample coins and compare the sampling data to stored data for genuine coins. The stored data can be preset or can be acquired and stored in memory by using a key coin. Data stored determines if a key coin is authentic and if it is, places the selector processor in a condition to accept and store new or modified data for determining the authenticity of other coins.Type: GrantFiled: October 9, 1998Date of Patent: October 3, 2000Assignee: Asahi Seiko Co., Ltd.Inventors: Hiroshi Abe, Hiroshi Otomo