Patents by Inventor Hiroshi Otouma

Hiroshi Otouma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4780356
    Abstract: A recording sheet comprising a sheet of paper and porous particles provided on the paper surface, said porous particles having an average pore size of from 10 to 5000 .ANG., a pore volume of from 0.05 to 3.0 cc/g and an average particle size of from 0.1 to 50 .mu.m.
    Type: Grant
    Filed: September 24, 1986
    Date of Patent: October 25, 1988
    Assignee: Asahi Glass Company Ltd.
    Inventors: Hiroshi Otouma, Hitoshi Kijimuta, Katsutoshi Misuda, Nobuyuki Yokota
  • Patent number: 4536259
    Abstract: A cathode having high durability and low hydrogen overvoltage comprising an electrode substrate and an alloy layer formed thereon, characterized in that said alloy layer is made of an alloy comprising Component X selected from the group consisting of nickel, cobalt and a mixture thereof, Component Y selected from the group consisting of aluminum, zinc, magnesium and silicon, and Component Z selected from the group consisting of a noble metal and rhenium, and having a composition of Components X, Y and Z falling within the range defined by the following points A, B, C and D with reference to the diagram of FIG. 1:A: X=99.6 wt. %, Y=0 wt. %, Z=0.4 wt. %B: X=79.6 wt. %, Y=20 wt. %, Z=0.4 wt. %C: X=10 wt. %, Y=20 wt. %, Z=70 wt. %D: X=12.5 wt. %, Y=0 wt. %, Z=87.5 wt. %.
    Type: Grant
    Filed: July 8, 1983
    Date of Patent: August 20, 1985
    Assignee: Asahi Glass Company Ltd.
    Inventors: Yoshio Oda, Hiroshi Otouma, Eiji Endoh
  • Patent number: 4498962
    Abstract: A cell for the electrolysis of water comprising an anode and a cathode wherein said anode comprises an electrode substrate and a coating layer formed on the substrate, said coating layer being made of an electrochemically active material comprising Component X selected from the group consisting of nickel, cobalt and mixture thereof, Component Y selected from the group consisting of aluminum, zinc, magnesium and silicon and Component Z selected from the group consisting of a noble metal and rhenium.
    Type: Grant
    Filed: October 7, 1983
    Date of Patent: February 12, 1985
    Assignee: Agency of Industrial Science and Technology
    Inventors: Yoshio Oda, Hiroshi Otouma, Eiji Endoh
  • Patent number: 4486278
    Abstract: A gas evolution cathode comprises a rough surface layer on a liquid non-permeable substrate and a fine electron non-conductive material which is discontinuously, uniformly distributed on said rough, surface layer.
    Type: Grant
    Filed: July 8, 1983
    Date of Patent: December 4, 1984
    Assignee: Asahi Glass Company Ltd.
    Inventors: Yoshio Oda, Hiroshi Otouma, Eiji Endoh
  • Patent number: 4470893
    Abstract: A method for water electrolysis in an electrolytic cell provided with an anode and a cathode, and cation exchange membrane disposed therebetween. The anode comprises a metal layer formed on an electrode substrate and composed of at least one metal selected from nickel, cobalt and silver, and said metal layer contains partially exposed particles composed essentially of at least one metal selected from nickel, cobalt and silver.
    Type: Grant
    Filed: May 27, 1982
    Date of Patent: September 11, 1984
    Assignee: Asahi Glass Company Ltd.
    Inventors: Yoshio Oda, Hiroshi Otouma, Eiji Endoh
  • Patent number: 4444641
    Abstract: An electrode comprises a thin net type sheet having 50 to 3 mesh and a wire diameter of 0.15 to 2 mm and an elastic deformation factor of up to 1 mm under load of 1 Kg/cm.sup.2 which is covered with an electrode active material and a foraminous planner electrode support with which said thin net is closely brought into contact.
    Type: Grant
    Filed: July 2, 1981
    Date of Patent: April 24, 1984
    Assignee: Asahi Glass Company Ltd.
    Inventors: Yoshio Oda, Hiroshi Otouma, Eiji Endoh
  • Patent number: 4372938
    Abstract: A process for producing sulfur tetrafluoride comprises reacting in the absence or presence of a solvent an amine/hydrogen fluoride complex having the formula:Am . (HF).sub.nwherein Am represents an amine selected from the group consisting of nitrogen-containing heterocyclic aromatic amines and derivatives thereof, and n represents 2-4, with sulfur dichloride, sulfur monochloride or a combination of chlorine and sulfur at a temperature of 0.degree. to 60.degree. C., the molar ratio of said amine/hydrogen fluoride complex to said sulfur dichloride, sulfur monochloride or sulfur being represented by the formula: ##EQU1## wherein n is as defined above, A represents moles of sulfur in said sulfur dichloride, sulfur monochloride or sulfur, and B represents moles of said amine/hydrogen complex.
    Type: Grant
    Filed: April 22, 1982
    Date of Patent: February 8, 1983
    Assignee: Asahi Glass Company Ltd.
    Inventors: Yoshio Oda, Hiroshi Otouma, Keiichi Uchida, Shinsuke Morikawa, Masaaki Ikemura
  • Patent number: 4302322
    Abstract: This invention presents low hydrogen overvoltage electrode which comprises a plated metal layer of nickel or cobalt which contains partially exposed particles made of nickel or cobalt on an electrode substrate, the surface of which particles does not contain oxygen, which concentration is more than 150 ppm, and process for preparing such electrode, which comprises codepositing electrically and electrophoretically nickel or cobalt particles with nickel or cobalt from a dispersed solution which contains Cl.sup.- of the concentration of not less than 30 gCl.sup.- /l solution.
    Type: Grant
    Filed: April 21, 1980
    Date of Patent: November 24, 1981
    Assignee: Asahi Glass Company, Ltd.
    Inventors: Yoshio Oda, Hiroshi Otouma, Eiji Endoh
  • Patent number: 4290859
    Abstract: An electrode is prepared by plating on an electrode substrate in a dispersion coating method to form a metal layer partially exposed porous particles of Ag on the electrode substrate, and, if desired, a middle layer is formed between the electrode substrate and the metal layer. The porous particles can be formed by etching an alloy of the particles.
    Type: Grant
    Filed: May 16, 1980
    Date of Patent: September 22, 1981
    Assignee: Asahi Glass Company, Ltd.
    Inventors: Yoshio Oda, Hiroshi Otouma, Eiji Endoh
  • Patent number: 4255247
    Abstract: An electrode is prepared by etching an alloy substrate comprising a first metallic component selected from the group consisting of chromium, manganese, tantalum, niobium, vanadium, titanium, silicon, zirconium, germanium, scandium, yttrium and lanthanum and a second metallic component selected from the group consisting of iron, nickel, tungsten, copper, silver, cobalt and molybdenum to remove at least part of the first metallic component.
    Type: Grant
    Filed: February 21, 1978
    Date of Patent: March 10, 1981
    Assignee: Asahi Glass Company, Limited
    Inventors: Yoshio Oda, Hiroshi Otouma, Eiji Endoh