Abstract: An operating apparatus including a main body, a movable member, a drive unit having a drive source, and a control unit controlling the drive source to control the position of the movable member relative to the main body. The control unit including a position control system and an acceleration control system. The position control system including a position command portion, a first feedforward compensator outputting a first operation command to the drive source, a second feedforward compensator, a positional-information acquiring device obtaining information related to the position of the movable member, and a first feedback compensator outputting a second operation command to the drive source. The acceleration control system including an acceleration-information acquiring device obtaining information related to an acceleration of the main body, a third feedforward compensator, a second feedback compensator outputting a third operation command to the drive source.

Abstract: An apparatus for processing and observing a sample has a sample stage for supporting a sample at a preselected location thereof, a focused ion beam irradiation system for irradiating the sample with a focused ion beam along an optical axis to cut out a portion from the sample, and a side entry stage disposed over the sample stage and extending slantingly with respect to the optical axis of the focused ion beam irradiated by the focused ion beam irradiation system. The side entry stage has a microscope sample holder for picking up the cut-out sample portion directly from the preselected location of the sample and for supporting the sample portion. The microscope sample holder is configured to be removed from the side entry stage while supporting the sample portion and to be connected to an entry stage of a microscope device for observing the sample portion.

Abstract: A sample manufacturing device comprises a sample stage to which an original sample is fixed, a focused ion beam irradiation system for irradiating a focused ion beam from a vertical direction to a specified place on the original sample, and a side entry stage, arranged diagonally above the sample stage, for inserting a sample stage for specified observation in a diagonal direction with respect to the vertical direction, and supporting the inserted sample holder for observation so as to be capable of movement in the diagonal direction. A test piece taken out from a specified place of the original sample is fixed to a tip section of the sample holder for specified observation supported on the side entry stage.

Abstract: When ions are implanted into desired locations on a material surface using a focused ion beam system, it is necessary to incline the direction of the implantation at about 7.degree. to a line normal to the material surface. The system according to the present invention uses a deflector consisting of deflecting elements of two stages to deflect an ion beam, for effecting such an inclination. The beam is deflected in a given direction by the deflecting element of the first stage, and then it is deflected in the opposite direction by the deflecting element of the second stage. Since chromatic aberrations of the beam caused by the deflecting elements of the two stages cancel each other, defocusing of the beam on the material due to energy dispersion is suppressed.