Patents by Inventor Hiroshi Someya

Hiroshi Someya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10413247
    Abstract: A signal detection device includes: multiple electrodes that are arranged to come into contact with a subject that generates a signal; an electrode signal selection unit that alternatively selects one signal from signals on the multiple electrodes based on a selection signal; an amplification unit that amplifies the signal that is selected by the electrode signal selection unit; and a flexible substrate on which the multiple electrodes, the selection unit, and the amplification unit are formed, in which the amplification unit is formed on the substrate to form a laminated structure together with the multiple electrodes and the selection unit.
    Type: Grant
    Filed: February 14, 2014
    Date of Patent: September 17, 2019
    Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCY
    Inventors: Hiroshi Fuketa, Makoto Takamiya, Takayasu Sakurai, Tsuyoshi Sekitani, Takao Someya
  • Publication number: 20190021159
    Abstract: An extreme ultraviolet light sensor unit according to one aspect of the present disclosure includes a mirror configured to reflect extreme ultraviolet light, a filter configured to transmit the extreme ultraviolet light reflected by the mirror, an optical sensor configured to detect the extreme ultraviolet light having passed through the filter, a purge gas supply unit disposed to supply purge gas to a space between the mirror and the filter, and a pipe part configured to allow plasma light including the extreme ultraviolet light entering from an opening to pass therethrough toward the mirror and allow the purge gas flowing to the space between the mirror and the filter to flow out of the opening.
    Type: Application
    Filed: September 4, 2018
    Publication date: January 17, 2019
    Applicant: GIGAPHOTON INC.
    Inventors: Hisashi NARA, Hiroshi SOMEYA, Takuya ISHII
  • Publication number: 20180341077
    Abstract: An optical unit and an optical path tube are easily connected. A structure of connection between a side surface (1a) of the optical unit and the optical path tube includes: an extensible tube (72) constituting at least a part of the optical path tube, the extensible tube being extensible in a tube axis direction; a flange (26) attached to one end of the optical path tube; a flange receiving part (20) provided on the optical unit, the flange receiving part (20) receiving a front surface (26a) of the flange (26), the front surface (26a) of the flange (26) being an end surface on an open side; and a biasing part (23, 72) configured to bias at least a part of the optical path tube in a direction in which the extensible tube (72) extends.
    Type: Application
    Filed: August 6, 2018
    Publication date: November 29, 2018
    Applicant: Gigaphoton Inc.
    Inventors: Yukio WATANABE, Hiroshi SOMEYA, Yuki KAWASHIMA, Yuto TANAKA
  • Patent number: 9253866
    Abstract: A gas lock device may include a chamber having a passage section and a connection hole that connects a surface to the passage section, an optical element that is attached to the chamber and seals the passage section, a gas supply apparatus, and a pipe that is attached at one end to the gas supply apparatus and attached at the other end to the chamber, and may define a flow channel communicating with the connection hole.
    Type: Grant
    Filed: February 4, 2014
    Date of Patent: February 2, 2016
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Someya, Hideto Saito
  • Patent number: 9233782
    Abstract: A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: January 12, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Takanobu Ishihara, Toshihiro Nishisaka, Hiroshi Someya, Osamu Wakabayashi
  • Patent number: 9229192
    Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: January 5, 2016
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Someya, Yukio Watanabe, Katsuhiko Wakana, Osamu Wakabayashi
  • Publication number: 20150226935
    Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
    Type: Application
    Filed: April 27, 2015
    Publication date: August 13, 2015
    Inventors: Hiroshi SOMEYA, Yukio WATANABE, Katsuhiko WAKANA, Osamu WAKABAYASHI
  • Patent number: 9046651
    Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: June 2, 2015
    Assignee: GIGAPHOTON INC.
    Inventors: Hiroshi Someya, Yukio Watanabe, Katsuhiko Wakana, Osamu Wakabayashi
  • Patent number: 8804902
    Abstract: A collector mirror exchanging apparatus capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: August 12, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Someya, Tamotsu Abe, Takashi Suganuma, Hideo Hoshino, Akira Sumitani
  • Publication number: 20140216576
    Abstract: A gas lock device may include a chamber having a passage section and a connection hole that connects a surface to the passage section, an optical element that is attached to the chamber and seals the passage section, a gas supply apparatus, and a pipe that is attached at one end to the gas supply apparatus and attached at the other end to the chamber, and may define a flow channel communicating with the connection hole.
    Type: Application
    Filed: February 4, 2014
    Publication date: August 7, 2014
    Applicant: GIGAPHOTON INC.
    Inventors: Hiroshi SOMEYA, Hideto SAITO
  • Patent number: 8779402
    Abstract: A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.
    Type: Grant
    Filed: November 13, 2012
    Date of Patent: July 15, 2014
    Assignee: Gigaphoton Inc.
    Inventors: Takayuki Yabu, Yukio Watanabe, Toshihiro Nishisaka, Hiroshi Someya, Osamu Wakabayashi
  • Publication number: 20140166046
    Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
    Type: Application
    Filed: August 12, 2013
    Publication date: June 19, 2014
    Applicant: GIGAPHOTON INC.
    Inventors: Takeshi Asayama, Hiroshi Someya, Masato Moriya, Hideo Hoshino, Tamotsu Abe
  • Publication number: 20130240645
    Abstract: A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.
    Type: Application
    Filed: December 14, 2012
    Publication date: September 19, 2013
    Applicant: GIGAPHOTON INC
    Inventors: Takanobu Ishihara, Toshihiro Nishisaka, Hiroshi Someya, Osamu Wakabayashi
  • Patent number: 8536550
    Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: September 17, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Takeshi Asayama, Hiroshi Someya, Masato Moriya, Hideo Hoshino, Tamotsu Abe
  • Patent number: 8477412
    Abstract: A collector mirror exchanging apparatus is capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
    Type: Grant
    Filed: November 5, 2007
    Date of Patent: July 2, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Someya, Tamotsu Abe, Takashi Suganuma, Hideo Hoshino, Akira Sumitani
  • Patent number: 8450706
    Abstract: An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: May 28, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Tamotsu Abe, Hiroshi Someya, Takashi Suganuma, Takayuki Yabu
  • Patent number: 8445877
    Abstract: A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: May 21, 2013
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Someya, Tamotsu Abe, Hideo Hoshino
  • Publication number: 20130050862
    Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.
    Type: Application
    Filed: December 29, 2011
    Publication date: February 28, 2013
    Applicant: GIGAPHOTON INC
    Inventors: Hiroshi Someya, Yukio Watanabe, Katsuhiko Wakana, Osamu Wakabayashi
  • Patent number: 8294129
    Abstract: An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
    Type: Grant
    Filed: April 7, 2011
    Date of Patent: October 23, 2012
    Assignee: Gigaphoton Inc.
    Inventors: Masato Moriya, Tamotsu Abe, Takashi Suganuma, Hiroshi Someya, Takayuki Yabu, Akira Sumitani, Osamu Wakabayashi
  • Publication number: 20120228527
    Abstract: An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
    Type: Application
    Filed: May 22, 2012
    Publication date: September 13, 2012
    Applicant: Komatsu Ltd./Gigaphoton, Inc.
    Inventors: Tamotsu ABE, Toshihiro Nishisaka, Hiroshi Someya, Masato Moriya, Takeshi Asayama, Hideo Hoshino, Hakaru Mizoguchi