Abstract: A polishing pad including a polyurethane sheet as a polishing layer, wherein the polyurethane sheet has a ratio (E?B40/E?T40) of a storage elastic modulus E?B40 at 40° C. in dynamic viscoelasticity measurement performed under a bending mode condition with a frequency of 1.6 Hz to a storage elastic modulus E?T40 at 40° C. in dynamic viscoelasticity measurement performed under a tension mode condition with a frequency of 1.6 Hz of 0.60 to 1.60.

Abstract: Provided is a polishing pad comprising a polishing layer made of a polyurethane resin foam containing an isocyanate-terminated prepolymer, and a curing agent, wherein the ratio (NC80/NC40) of a weight proportion (NC80) of an amorphous phase content in the polishing layer measured at 80° C. by a pulsed NMR method to a weight proportion (NC40) of the amorphous phase content in the polishing layer measured at 40° C. by the pulsed NMR method is between 1.5 and 2.5.

Abstract: A polishing pad comprising a polishing layer that has a polishing surface for performing a polishing process on an item to be polished, wherein the polishing layer includes hollow microspheres that form hollow bodies within the polishing layer, a cross-section of the polishing layer has an average pore diameter of 10-14 ?m, and in a histogram of pore diameters in a cross-section of the polishing layer where the bin width is 1 ?m, the sum of pores that are 25 ?m or greater is 5% or less with respect to the total number of pores in the cross-section, and the sum of the areas of the pores in each bin that is 25 ?m or greater is 20% or less with respect to the total area of the pores in the cross-section.

Abstract: This polishing pad has a polishing layer that comprises a polyurethane resin foam derived from an isocyanate-terminated prepolymer and a curing agent, wherein: the distance between hard segments in the polishing layer as measured by small-angle X-ray scattering is 9.5 nm or less; or the ratio (NC80/CC80) of the content proportion by weight (NC80) of an amorphous phase in the polishing layer as measured by pulse NMR at 80° C. to the content proportion by weight (CC80) of a crystalline phase in the polishing layer as measured by pulse NMR at 80° C. is 2.6-3.1, and the ratio (NC40/CC40) of the content proportion by weight (NC40) of an amorphous phase in the polishing layer as measured by pulse NMR at 40° C. to the content proportion by weight (CC40) of a crystalline phase in the polishing layer as measured by pulse NMR at 40° C. is 0.5-0.9.

Abstract: A virtual object display device comprises a display and a display control device configured to perform display control of the display. The display control device includes: a coordinate system calculation unit configured to detect movement and rotation of the virtual object display device in a real world, and use an inertial coordinate system in which a coordinate origin thereof follows the movement of the virtual object display device and an effective field of view of the display is rotated therein in accordance with the rotation of the virtual object display device so as to define an arrangement position of an inertial coordinate system virtual object; and a display control unit configured to, when the inertial coordinate system virtual object is included in the effective field of view of the display, display the inertial coordinate system virtual object within the effective field of view.

Abstract: A drawing apparatus 1 has a drawing furnace 11, a heating furnace 21, and a resin curing section 31. The drawing furnace 11 has a muffle tube 13 to which an He gas supply passage 15 from an He gas supply section 14 is connected so as to supply He gas. The optical fiber 3 drawn upon heating by the drawing furnace 11 is fed to the heating furnace 21, whereby a predetermined part of the optical fiber 3 is annealed at a predetermined cooling rate. The heating furnace 21 has a muffle tube 23 to which an N2 gas supply passage 25 from an N2 gas supply section 24 is connected so as to supply N2 gas. Thereafter, the optical fiber 3 is coated with a UV resin 39 by a coating die 38, and the UV resin 39 is cured in the resin curing section 31, whereby a coated optical fiber 4 is formed.

Abstract: A drawing apparatus 1 has a drawing furnace 11, a heating furnace 21, and a resin curing section 31. The drawing furnace 11 has a muffle tube 13 to which an He gas supply passage 15 from an He gas supply section 14 is connected so as to supply He gas. The optical fiber 3 drawn upon heating by the drawing furnace 11 is fed to the heating furnace 21, whereby a predetermined part of the optical fiber 3 is annealed at a predetermined cooling rate. The heating furnace 21 has a muffle tube 23 to which an N2 gas supply passage 25 from an N2 gas supply section 24 is connected so as to supply N2 gas. Thereafter, the optical fiber 3 is coated with a UV resin 39 by a coating die 38, and the UV resin 39 is cured in the resin curing section 31, whereby a coated optical fiber 4 is formed.

Abstract: When drawing an optical fiber from a preform, positive and negative dispersion sections of an optical fiber are provided, respectively, with target glass diameters different from each other, whereby the positive and negative dispersion sections attain their respective desirable values of chromatic dispersion. Also, the positive and negative dispersion sections and a transient section therebetween are provided, respectively, with values of control constant different from each other, which are used to converge the measured glass diameter to said target diameter, for adjusting the drawing speed, whereby the transient section is shortened. Alternatively, the positive and negative dispersion sections of the optical fiber are provided with respective target drawing speeds different from each other, whereby the transient section is shortened.

Abstract: Disclosed is an apparatus for producing an original plate for optical discs, which is allowed to produce original plates for a plurality of kinds of optical discs satisfying various standards. The apparatus includes a laser light generator for generating laser light; a diaphragm mechanism for limiting laser light generated by the laser light generator; and an objective lens for refracting the laser light limited by the diaphragm mechanism in such a manner that the laser light is focussed on a photosensitive layer or a surface layer formed on the original plate; wherein a spot diameter of a beam of the laser light is changed by varying a diaphragm diameter of the diaphragm mechanism.