Abstract: Provided is a water-based ink which has high dispersibility of a pigment and imparts high smoothness and glossiness to a coating film obtainable from the water-based ink. Water-based ink of the present invention is a water-based ink containing a pigment, a vehicle, and water, in which the vehicle contains an alkali-soluble resin (I) and a composite resin (II), and the composite resin (II) is a composite resin of a urethane polymer (e) and an acrylic polymer (f).

Abstract: An imprinting apparatus includes a substrate holding unit having a first region configured to receive a substrate, and a second region positioned outside a periphery of a first region, the substrate holding unit including a resist removing mechanism including at least one of an exhaust mechanism and an air supply mechanism disposed in the second region. The apparatus further includes a template holding unit configured to hold a template defining recess patterns such that the recess patterns face the substrate holding unit, and such that the template can come into contact with a resist deposited onto the substrate, and one or more nozzles configured to discharge the resist onto the substrate.

Abstract: According to an embodiment, a photosensitive composition is provided. The photosensitive composition contains a photosensitive material. The photosensitive composition, when a whole amount of the composition is 100 pts. mass, a sum total of values each obtained by multiplying a SP value, which is a solubility parameter, by a mass percentage of a photopolymerizable monomer contained in the composition is any value within a range of 17 to 20 [(J/cm3)1/2].

Abstract: According to an embodiment, a photosensitive composition is provided. The photosensitive composition contains a photosensitive material. The photosensitive composition, when a whole amount of the composition is 100 pts. mass, a sum total of values each obtained by multiplying a SP value, which is a solubility parameter, by a mass percentage of a photopolymerizable monomer contained in the composition is any value within a range of 17 to 20 [(J/cm3)1/2].

Abstract: According to one embodiment, a template is provided which comprises a template pattern having protrusion pattern feature and recess pattern feature. High contact-angle portion whose contact angle is higher than side surface of the template pattern is placed in the template. The high contact-angle portion is placed in at least either top surface of the protrusion pattern feature or bottom surface of the recess pattern feature from among surfaces of the template pattern.

Abstract: According to one embodiment, a semiconductor manufacturing apparatus includes a substrate stage, a transfer unit, and a control unit. A substrate is settable on the substrate stage. The transfer unit is configured to transfer a pattern having an uneven configuration onto a major surface of the substrate by attachably and removably holding a template. The pattern is provided in the transfer surface. The control unit is configured to acquire information relating to a number of foreign objects on the major surface prior to the transferring of the pattern. The control unit adds the number for a plurality of the substrates including the pattern transferred by the transfer unit. The control unit causes the transfer unit not to implement the transferring of the pattern in the case where the sum has reached the upper limit.

Abstract: According to one embodiment, a semiconductor manufacturing apparatus includes a substrate stage, a transfer unit, and a control unit. A substrate is settable on the substrate stage. The transfer unit is configured to transfer a pattern having an uneven configuration onto a major surface of the substrate by attachably and removably holding a template. The pattern is provided in the transfer surface. The control unit is configured to acquire information relating to a number of foreign objects on the major surface prior to the transferring of the pattern. The control unit adds the number for a plurality of the substrates including the pattern transferred by the transfer unit. The control unit causes the transfer unit not to implement the transferring of the pattern in the case where the sum has reached the upper limit.

Abstract: A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template based on data of a design pattern of the template, the data of the dummy template pattern being generated so that a third surface area ratio showing a ratio of a surface area of the third area to an area of the third area is set smaller than a first surface area ratio showing a ratio of a surface area of the first area to an area of the first area and larger than a second surface area ratio showing a ratio of a surface area of the second area to an area of the second area.

Abstract: An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.

Abstract: According to one embodiment, a template for imprinting includes a concave-convex pattern on one surface thereof. The template includes a base material having light transmission characteristics, and a resin layer provided on the base material and becoming convex portions of the concave-convex pattern. The resin layer contracts and reduces its volume by irradiation of light having a first wavelength and expands and increases its volume by irradiation of light having a second wavelength, which is different from the first wavelength.

Abstract: A patterning method according to an embodiment of the present invention comprises: acquiring information about a surface state of an underlying film formed on a substrate; determining, based on the surface state, whether irregularity/foreign matter is present in each shot region in which a pattern is to be formed; and solidifying a resist agent while a first template, when it is determined that no irregularity/foreign matter is present in the shot region, or a second template that is different from the first template, when it is determined that irregularity/foreign matter is present in the shot region, is brought close to the underlying film on the shot region at a certain distance with the resist agent therebetween.

Abstract: A method for forming an imprint pattern includes: contacting a template having a first pattern with a curable material on a substrate to be treated and curing the curable material; releasing the template from the curable material after curing to form a second pattern made of the curable material such that the first pattern is transferred and formed as the second pattern for the substrate; measuring at least one of a load or time requiring for separation of the template when the template is separated from the curable material after transferring and forming; and comparing the load or time measured with a predetermined threshold value and determining whether the load or time measured is beyond the predetermined threshold value or not.

Abstract: According to one embodiment, an imprint material includes a resin and a plurality of fine particles. The resin is cured from a liquid state by receiving energy while being in contact with a protrusion-depression pattern of a template. The plurality of fine particles are contained in a solid state in the resin and are different from the resin in volume shrinkage ratio upon receiving the energy.

Abstract: According to one embodiment, a template is provided. The template includes an unevenness provided on a first major surface. A side wall of the unevenness has a trench aligned in a depth direction of the unevenness.

Abstract: A method for forming an imprint pattern includes: contacting a template having a first pattern with a curable material on a substrate to be treated and curing the curable material; releasing the template from the curable material after curing to form a second pattern made of the curable material such that the first pattern is transferred and formed as the second pattern for the substrate; measuring at least one of a load or time requiring for separation of the template when the template is separated from the curable material after transferring and forming; and comparing the load or time measured with a predetermined threshold value and determining whether the load or time measured is beyond the predetermined threshold value or not.

Abstract: An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.

Abstract: A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template based on data of a design pattern of the template, the data of the dummy template pattern being generated so that a third surface area ratio showing a ratio of a surface area of the third area to an area of the third area is set smaller than a first surface area ratio showing a ratio of a surface area of the first area to an area of the first area and larger than a second surface area ratio showing a ratio of a surface area of the second area to an area of the second area.

Abstract: An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.

Abstract: An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.

Abstract: A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template based on data of a design pattern of the template, the data of the dummy template pattern being generated so that a third surface area ratio showing a ratio of a surface area of the third area to an area of the third area is set smaller than a first surface area ratio showing a ratio of a surface area of the first area to an area of the first area and larger than a second surface area ratio showing a ratio of a surface area of the second area to an area of the second area.