Abstract: A semiconductor device includes a conductive film containing molybdenum and a metal element. The metal element has a melting point lower than the melting point of molybdenum and forms a complete solid solution with molybdenum. The metal element as a material for composing the conductive film is at least one selected from the group consisting of, for example, titanium, vanadium, and niobium.

Abstract: A pressure sensor has a stem in which a pressure introduction hole into which a pressure medium is introduced and a diaphragm deformable according to the pressure of the pressure medium are formed, and a strain detecting element which is arranged on the diaphragm via an insulating film and being configured to output a detection signal according to the deformation of the diaphragm. The strain detecting element is configured to have a portion made of polysilicon. A low doping layer having a higher electrical resistivity than polysilicon and a higher crystallinity than the insulating film is arranged between the insulating film and the strain detecting element.

Abstract: Provided is a driving support device (1) including: an operation sensor configured to acquire operation information that is information on an operation on a driving operation device included in an own vehicle; a periphery sensor configured to acquire peripheral information that is information on a target object existing in a periphery of the own vehicle; and a control device configured to execute deceleration support control of supporting a driving operation executed by a driver to decelerate the own vehicle when existence of a target object in front of the own vehicle is detected based on the peripheral information and a predetermined precondition relating to the target object and the own vehicle is satisfied.

Abstract: A semiconductor device includes a plurality of insulating layers, a plurality of conductive layers that are formed alternately with the plurality of insulating layers, an interlayer film, and a channel. The interlayer film is different from the conductive layer, has a crystal structure of a hexagonal crystal system, and is formed between at least one of the insulating layers and at least one of the conductive layers. The channel penetrates through the plurality of conductive layers, the interlayer film, and the plurality of insulating layers.

Abstract: According to one embodiment, a film forming method includes alternately performing a first process including at least two times of a first sequence and a second process including at least one time of a second sequence. The first sequence includes supplying a film forming gas into a film forming chamber, supplying a first purge gas into the film forming chamber, supplying a first reduction gas into the film forming chamber, and supplying a second purge gas into the film forming chamber, in order, and the second sequence includes supplying a second reduction gas into the film forming chamber, and supplying a third purge gas into the film forming chamber, in order.

Abstract: A driving support apparatus includes a surrounding information acquisition device which acquires surrounding information, a steering information acquisition device which acquires steering information, a control unit which executes driving support control including at least one of pre-right/left-turn deceleration assist control or pre-right/left-turn warning control when a predetermined first execution condition is satisfied. When a precondition which is satisfied in a case in which an intersection is detected based on the surrounding information and steering operation is being performed by a driver based on the steering information is satisfied, the control unit determines whether or not the first execution condition is satisfied based on the steering operation being performed and traveling lane arrow information which is road arrow information of a traveling lane or adjacent lane arrow information which is road arrow information of an adjacent lane, both of which being stored in a storage device.

Abstract: According to at least one embodiment, a semiconductor device includes a plurality of insulating films adjacent to each other. A conductive film is provided between the plurality of insulating films. The conductive film includes molybdenum having a grain diameter substantially the same as a distance from an upper surface to a lower surface of the conductive film.

Abstract: Provided are a film having an excellent balance between heat seal strength and opening strength, a method of producing the film, and a bag obtained by heat-sealing the film. According to the present invention, there is provided a film containing a resin, wherein a resin density of the film is 860 kg/m3 or more and less than 900 kg/m3, and on at least one surface of the film, an arithmetic mean height Sa satisfies the following Expression [1]: 0.10 ?m?Sa?0.50 ?m??[1], and a minimum autocorrelation length Sal satisfies the following Expression [2]: 0.2 ?m?Sal?10.4 ?m??[2].

Abstract: A semiconductor device that can have an improved data retention characteristic is provided. A semiconductor device includes a stacked body and a memory pillar formed in a memory hole of the stacked body. The memory pillar has a structure in which a semiconductor portion 61b, a tunnel insulating film 62a, and a charge storage layer 62b are sequentially stacked. A block insulating film 53 is provided between the charge storage layer 62b and a conductive layer 52. The conductive layer 52 contains molybdenum. The block insulating film 53 includes a silicon oxide film 53a and an aluminum oxide film 53b. A region from the conductive layer 52 to the aluminum oxide film 53b contains chlorine, which prevents OH diffusion. The concentration of chlorine at a second portion closer to the aluminum oxide film 53b than a first portion in the conductive layer 52 is higher than the concentration of impurities at the first portion in the conductive layer.

Abstract: A method of manufacturing a semiconductor device includes placing a substrate in a housing, supplying first gas containing molybdenum to the housing to form a film that contains molybdenum, on the substrate, removing the substrate with the formed film from the hosing, and then supplying second gas containing chlorine to the housing to remove molybdenum deposited on a surface of the housing.

Abstract: A method of manufacturing a semiconductor device includes placing a substrate in a housing, supplying first gas containing molybdenum to the housing to form a film that contains molybdenum, on the substrate, removing the substrate with the formed film from the hosing, and then supplying second gas containing chlorine to the housing to remove molybdenum deposited on a surface of the housing.

Abstract: According to one embodiment, a method for manufacturing a semiconductor device includes: (a) supplying an adsorbing material over an insulating film, wherein the adsorbing material is selected from the group consisting of H2O, HF, NO, NO2, NF3, and combinations thereof; (b) supplying a Mo material over the insulating film; (c) supplying a reducing agent over the insulating film; and (d) repeating the steps (a) to (c).

Abstract: A semiconductor device includes a conductive film containing molybdenum and a metal element. The metal element has a melting point lower than the melting point of molybdenum and forms a complete solid solution with molybdenum. The metal element as a material for composing the conductive film is at least one selected from the group consisting of, for example, titanium, vanadium, and niobium.

Abstract: Provided are a film having an excellent balance between heat seal strength and opening strength, a method of producing the film, and a bag obtained by heat-sealing the film. According to the present invention, there is provided a film containing a resin, wherein a resin density of the film is 860 kg/m3 or more and less than 900 kg/m3, and on at least one surface of the film, an arithmetic mean height Sa satisfies the following Expression [1]: 0.10 ?m?Sa?0.50 ?m??[1], and a minimum autocorrelation length Sal satisfies the following Expression [2]: 0.2 ?m?Sal?10.4 ?m??[2].

Abstract: According to at least one embodiment, a semiconductor device includes a plurality of insulating films adjacent to each other. A conductive film is provided between the plurality of insulating films. The conductive film includes molybdenum having a grain diameter substantially the same as a distance from an upper surface to a lower surface of the conductive film.

Abstract: A method of manufacturing a semiconductor device includes placing a substrate in a housing, supplying first gas containing molybdenum to the housing to form a film that contains molybdenum, on the substrate, removing the substrate with the formed film from the hosing, and then supplying second gas containing chlorine to the housing to remove molybdenum deposited on a surface of the housing.

Abstract: A semiconductor memory device according to an embodiment comprises a stacked body, a semiconductor layer, a charge accumulation layer, and a slit portion. The stacked body includes a plurality of control gate electrodes stacked above a substrate. The semiconductor layer has one end thereof connected to the substrate, and faces the plurality of control gate electrodes. The charge accumulation layer is positioned between the control gate electrode and the semiconductor layer. The slit portion extends in a direction of the substrate from a surface of the stacked body, wherein the slit portion has its longitudinal direction in a direction intersecting the first direction.

Abstract: A semiconductor manufacturing apparatus according to an embodiment includes a container that stores a processing liquid for plating processing of a substrate. A holder can hold the substrate. A cooler cools the substrate to a temperature lower than a temperature of the processing liquid before the holder immerses the substrate in the processing liquid in the container.

Abstract: A semiconductor memory device according to an embodiment comprises a stacked body, a semiconductor layer, a charge accumulation layer, and a slit portion. The stacked body includes a plurality of control gate electrodes stacked above a substrate. The semiconductor layer has one end thereof connected to the substrate, and faces the plurality of control gate electrodes. The charge accumulation layer is positioned between the control gate electrode and the semiconductor layer. The slit portion extends in a direction of the substrate from a surface of the stacked body, wherein the slit portion has its longitudinal direction in a direction intersecting the first direction.

Abstract: A semiconductor device according to the present embodiment includes a first wiring part located above a substrate and made of a first metal material. A second wiring part is provided as being superimposed on the first wiring part and having a width substantially equal to that of the first wiring part. A first resistivity of the first wiring part is lower than a second resistivity of the second wiring part when the first and second wiring parts have a first width. The second resistivity is lower than the first resistivity when the first and second wiring parts have a second width larger than the first width. The semiconductor device includes both of an area in which the first and second wiring parts have the first width and an area in which the first and second wiring parts have the second width.