Patents by Inventor Hiroshi Tsumura
Hiroshi Tsumura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7055345Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.Type: GrantFiled: February 24, 2003Date of Patent: June 6, 2006Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
-
Patent number: 6698240Abstract: An apparatus for manufacturing a glass base material which is an parent material of an optical fiber, comprising: a tank which contains a raw material of the glass base material to vaporize the raw material to generate a raw material in gas phase; a temperature control unit which controls a temperature of the raw material; and a pressure control unit which controls the pressure of the raw material in gas phase.Type: GrantFiled: June 2, 2000Date of Patent: March 2, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshi Tsumura, Hiroyuki Koide, Yuuji Tobisaka, Kazuhisa Hatayama, Go Ogino, Tadakatsu Shimada, Hideo Hirasawa
-
Patent number: 6672112Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.Type: GrantFiled: February 26, 2003Date of Patent: January 6, 2004Assignee: Shin-Etsu Chemical Co.Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
-
Publication number: 20030126893Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.Type: ApplicationFiled: February 26, 2003Publication date: July 10, 2003Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
-
Publication number: 20030121290Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.Type: ApplicationFiled: February 24, 2003Publication date: July 3, 2003Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
-
Patent number: 6546759Abstract: An apparatus for manufacturing a glass base material, which is a base material of an optical fiber, comprising: a base rod, around and along which said glass base material is formed; a burner that hydrolyzes and accumulates a gas material, which is a base material of said glass base material, around and along said base rod; a first burner-moving-unit that moves said burner in a direction parallel with a longitudinal direction of said base rod; and a second burner-moving-unit that moves said first burner-moving-unit in a same moving direction of said first burner-moving-unit.Type: GrantFiled: July 3, 2000Date of Patent: April 15, 2003Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yuuji Tobisaka, Tadakatsu Shimada, Hiroshi Machida, Masataka Watanabe, Hiroshi Tsumura, Hideo Hirasawa
-
Patent number: 6442978Abstract: Apparatus (700) for sintering a glass base material (2) which is a base material for an optical fiber. The sintering apparatus (700) includes: a control unit which varies a condition for sintering the glass base material; and a furnace (12) which sinters the glass base material by heating the glass base material in an atmosphere of dehydration gas and inert gas. The control unit includes a drive source (3) which supplies the glass base material to the furnace at various speeds. The control unit includes a temperature control unit which controls the temperature of a heating source provided in the furnace.Type: GrantFiled: March 8, 2000Date of Patent: September 3, 2002Assignee: Shin-Etsu Chemical Co. Ltd.Inventors: Takeshi Kamio, Hiroyuki Koide, Hiroshi Tsumura, Tadakatsu Shimada, Hideo Hirasawa
-
Patent number: 5783721Abstract: An (alkylhalo)silane is prepared by charging a reactor with a contact mass comprising metallic silicon powder and a copper catalyst and feeding a gas containing an alkyl halide into the reactor whereby the silane is formed by direct synthesis. The contact mass in the reactor during reaction consists of particles having a mean particle size of 5-150 .mu.m and containing 10-80% by weight of particles having a particle size of up to 30 .mu.m and 10-90% by weight of particles having a particle size of at least 90 .mu.m. The contact mass is well fluidized to ensure rapid and uniform reaction whereby the (alkylhalo)silane is prepared at high selectivity with a minimized elutriating loss of contact mass.Type: GrantFiled: January 10, 1997Date of Patent: July 21, 1998Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshi Tsumura, Tetsuo Nakanishi, Hiroshi Nakayama, Yukinori Satoh
-
Patent number: 5712405Abstract: An (alkylhalo)silane is prepared by using a fluidized bed reactor equipped with a feed line for reactant gas and a delivery line for product gas, charging the reactor with a contact mass comprising metallic silicon powder and a copper catalyst, and feeding a reactant gas containing an alkyl halide through the feed line into the reactor whereby the silane is formed by direct synthesis. A dust collector is connected to the delivery line for collecting the contact mass carried over with the product gas, which is fed back to the reactor. The feed of the reactant gas is controlled such that a linear velocity multiplied by a density may range from 0.2-2 kg/m.sup.2 .multidot.sec.Type: GrantFiled: January 10, 1997Date of Patent: January 27, 1998Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshi Nakayama, Hiroshi Tsumura, Tetsuo Nakanishi, Yukinori Satoh
-
Patent number: 5302685Abstract: Organopolysiloxane powder is prepared from an organopolysiloxane solution by admitting the organopolysiloxane solution into a planetary-screw mixer and agitating the solution at a sufficient temperature to allow a low-boiling liquid component to evaporate from the solution, thereby separating the low-boiling liquid component from the solution.Type: GrantFiled: June 17, 1993Date of Patent: April 12, 1994Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshi Tsumura, Nobuhiko Kodana, Hidehiko Aonuma, Kenichi Isobe
-
Patent number: 5241095Abstract: An efficient and safe method is proposed for the preparation of an oximesilane compound having a group of the general formula --O--N.dbd.CR.sup.2 R.sup.3, in which R.sup.2 and R.sup.3 are each a hydrogen atom or a monovalent hydrocarbon group, bonded to the silicon atom. The method consists of successive steps of which the first is for the reaction of a chlorosilane compound with ammonia and the second is for the reaction of the reaction mixture coming from the first step with an oxime compound to introduce the oxime groups as bonded to the silicon atom. Different from conventional methods in which formation of an explosive compound such as hydrochloride of an organic base or oxime compound is unavoidable, the inventive method does not involve formation of such an explosive by-product so that the desired oximesilane compound can be obtained without the danger of explosion.Type: GrantFiled: November 13, 1992Date of Patent: August 31, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Isao Watanuki, Hiroshi Tsumura, Kazushi Satoh, Nobuhiko Kodana
-
Patent number: 5241033Abstract: A novel and efficient method is disclosed for decreasing the content of residual alkoxy groups in an organopolysiloxane such as so-called MQ resins, usually and unavoidably, having a considerable amount of residual alkoxy groups bonded to the silicon atoms to be very detrimental against practical application of the organopolysiloxane. The method comprises admixing the alkoxy-containing organopolysiloxane with a strongly alkaline compound such as alkali metal hydroxides as a catalyst, an aprotic polar solvent such as N,N-dimethyl formamide, dimethyl sulfoxide and the like and water each in a specified amount and heating the mixture, for example, under reflux so that the alkoxy groups are rapidly hydrolyzed and can be removed in the form of an alcohol.Type: GrantFiled: December 13, 1991Date of Patent: August 31, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshi Tsumura, Kiyoyuki Mutoh, Kazushi Satoh, Ken-ichi Isobe
-
Patent number: 5210250Abstract: A simple but very effective and reliable method is proposed for the decolorizing purification of a halogenated silane compound, e.g., methyl trichlorosilane, colored by containing a very small amount of heavy metal impurities such as iron. The method comprises: contacting the halogenated silane compound with a small amount of a cationic surface active agent which is solid and insoluble in the silane such as a quaternary ammonium salt, e.g., trimethyl octadecyl ammonium chloride, for 2 to 240 minutes; and then separating the silane compound from the cationic surface active agent.Type: GrantFiled: August 27, 1992Date of Patent: May 11, 1993Assignee: Shin-Etsu Chemical Co. Ltd.Inventors: Isao Watanuki, Hiroshi Tsumura, Nobuhiko Kodana, Kazushi Satoh, Masanori Fukuhira, Hidehiko Aonuma
-
Patent number: 5171872Abstract: An improvement is proposed for minimizing coloration of an oximesilane synthesized by the reaction of a chlorosilane such as vinyl trichlorosilane and an oxime compound such as methyl ethyl ketone oxime in the presence of a nitrogen-containing basic compound as an acceptor of the hydrogen chloride followed by the removal of the precipitates of the hydrogen chloride salt of the base and distillation. The improvement comprises conducting the distillation of the filtrate after removal of the precipitates of salt is performed in the presence of a nitrogen-containing basic compound such as ammonia in the filtrate, for example, by blowing ammonia gas into the liquid under distillation. An already colored oximesilane product also can be decolorized by blowing ammonia gas thereinto.Type: GrantFiled: October 22, 1991Date of Patent: December 15, 1992Assignee: Shin-Etsu Chemical Company, LimitedInventors: Isao Watanuki, Hiroshi Tsumura, Kazushi Satoh, Nobuhiko Kodana
-
Patent number: 5070175Abstract: An efficient and economically advantageous method is proposed for the preparation of an organopolysiloxane comprising tetrafunctional siloxane units, i.e. Q units, and, typically, monofunctional siloxy units, i.e. M units, and useful as a reinforcing agent in silicone rubbers. The method comprises the steps of: mixing the reactants for providing the Q and M units, such as ethyl orthosilicate and trimethyl methoxy silane, in a desired molar ratio; and heating the mixture at a temperature higher by at least 10.degree. C. than the boiling point of the mixture under normal pressure in a closed vessel in the presence of water and a catalyst such as a sulfonic acid group-containing compound.Type: GrantFiled: May 28, 1991Date of Patent: December 3, 1991Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroshi Tsumura, Kiyoyuki Mutoh, Kazushi Satoh, Ken-ichi Isobe