Patents by Inventor Hiroshi Uehara

Hiroshi Uehara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8329848
    Abstract: An object of the present invention is to provide a novel ethylene-?-olefin copolymer excellent in crosslinking properties; a foamed molded article having a low specific gravity and a low compression set (CS) and a composition capable of producing the foamed molded article, footwear parts composed of a foamed molded article; an ethylenic copolymer composition excellent in balance between weather resistance and mechanical strength, and an electric wire coating material and an electric wire sheath using the ethylenic copolymer composition; and a thermoplastic elastomer capable of producing a molded article excellent in balance between mechanical strength and toughness. The ethylenic copolymer (A) of the present invention is a copolymer composed of only ethylene and an ?-olefin having 3 to 20 carbon atoms, and is characterized in that vinyl-group content (a) per 1000 carbon atoms as measured by infrared absorption spectroscopy, MFR10/MFR2.16 (b), and the specific gravity (c) are within a specific range.
    Type: Grant
    Filed: June 2, 2008
    Date of Patent: December 11, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Takayuki Kajihara, Hiroshi Uehara, Shigenobu Ikenaga, Kiminori Noda, Masayoshi Yamaguchi
  • Patent number: 8278195
    Abstract: In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber 104 with a power source 113, a vacuum exhausting means 118, and a reaction gas introduction pipe 114, plasma 115 is generated in a space surrounded by an electrode 111, a substrate holder 112, and an insulator 120.
    Type: Grant
    Filed: November 2, 2011
    Date of Patent: October 2, 2012
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Toru Takayama, Mitsunori Sakama, Hisashi Abe, Hiroshi Uehara, Mika Ishiwata
  • Patent number: 8167728
    Abstract: To accomplish a superior characteristic for absorbing and damping torsional vibrations in a damper disk assembly and a flywheel assembly. A damper disk assembly includes a pair of plates 11 and 12, a flange 20, coil springs 16 and 17, and friction plates 58 and 59. The pair of plates 11 and 12 is fixed to each other. The flange 20 is disposed between the pair of plates 11 and 12 in the axial direction. The coil springs 16 and 17 elastically couple the pair of plates 11, 12 and flange 20 in the rotational direction. The friction plates 58 and 59 are disposed to operate in parallel with the coil springs 16 and 17 between the pair of plates 11, 12 and the flange 20 in the rotational direction, frictionally engage with the pair of plates 11 and 12, and engage with the flange 20 to be relatively rotatable in only range of the small torsional angle.
    Type: Grant
    Filed: May 29, 2006
    Date of Patent: May 1, 2012
    Assignee: EXEDY Corporation
    Inventors: Michimoto Masaki, Takashi Harada, Hiroshi Uehara
  • Patent number: 8122708
    Abstract: An exhaust gas purification device having a DPF provided in an exhaust system of an internal combustion engine. The device has one or more sound pressure measurement means for measuring exhaust sound pressure and calculation means for calculating the amount of PM accumulation based on the exhaust sound pressure measured. On the upstream side of the DPF are arranged exhaust gas temperature measurement means and exhaust gas temperature raising means. The exhaust gas temperature raising means is activated when the amount of PM accumulation calculated by the calculation means is higher than a preset default and at the same time when the exhaust gas temperature measured by the exhaust temperature measurement means is lower than a lower limit of a temperature region in which the DPF can be regenerated.
    Type: Grant
    Filed: October 19, 2006
    Date of Patent: February 28, 2012
    Assignee: Yanmar Co., Ltd.
    Inventors: Shusuke Okada, Masato Kitazaki, Hiroshi Uehara, Osamu Kawatate
  • Publication number: 20120045593
    Abstract: In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber 104 with a power source 113, a vacuum exhausting means 118, and a reaction gas introduction pipe 114, plasma 115 is generated in a space surrounded by an electrode 111, a substrate holder 112, and an insulator 120.
    Type: Application
    Filed: November 2, 2011
    Publication date: February 23, 2012
    Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventors: Shunpei YAMAZAKI, Toru TAKAYAMA, Mitsunori SAKAMA, Hisashi ABE, Hiroshi UEHARA, Mika ISHIWATA
  • Patent number: 8110965
    Abstract: An exemplary piezoelectric vibrating device has a lid plate, a chip plate including a tuning-fork type vibrating piece surrounded by an outer frame, and a package base arranged where the chip plate is sandwiched between the lid plate and package base, and the three layers are bonded together. The tuning-fork type piezoelectric vibrating piece is connected to the outer frame by supporting arms. A base-movement buffer having a predetermined height in the X-direction extends from the inner edge surface of the outer frame toward a side edge of the base. The base-movement buffer has a height in the X-direction that is proportional to the length from the base-movement buffer to a point at which the tuning-fork type piezoelectric vibrating piece is coupled to the outer frame.
    Type: Grant
    Filed: September 22, 2009
    Date of Patent: February 7, 2012
    Assignee: Nihon Dempa Kogyo Co., Ltd.
    Inventors: Hiroki Iwai, Yu Iwai, Hiroshi Uehara
  • Patent number: 8097672
    Abstract: The crosslinked material of the present invention is obtainable by crosslinking a propylene resin composition through irradiation with an ionizing radiation wherein the propylene resin composition comprises 100 parts by mass of a propylene resin comprising 15 to 99% by mass of a propylene polymer (A) having a melting point, as measured by a differential scanning calorimeter (DSC), of 120 to 170° C., and 1 to 85% by mass of a propylene polymer (B) having a melting point, as measured by a differential scanning calorimeter (DSC), of below 120° C. or not observed (provided that the total of the components (A) and (B) is 100% by mass), and 0.1 to 5 parts by mass of a crosslinking assistant (C). The production process of the crosslinked material of the present invention comprises a step of molding the propylene resin composition into a molded form, and a step of crosslinking the molded form through irradiation with an ionizing radiation.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: January 17, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Hiroshi Uehara, Kiminori Noda, Masayoshi Yamaguchi
  • Patent number: 8066574
    Abstract: A damper mechanism 4 has a clutch plate 21 and a retaining plate 22 disposed aligned in the axial direction, a hub flange 6 disposed relatively rotatably in the axial direction between the plates 21 and 22, and a second coil spring 8 for elastically linking the plates 21 and 22 to the hub flange 6 in the rotational direction. The plates 21 and 22 have a pair of first main body components 28, and a plurality of linking components 31 that are disposed in the rotational direction between first protrusions 49 and second protrusions 57 and that link the pair of first main body components 28. The plurality of linking components 31 is disposed such that adjacent pitches are different.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: November 29, 2011
    Assignee: EXEDY Corporation
    Inventors: Tomoki Hada, Hiroshi Uehara
  • Patent number: 8053338
    Abstract: In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber 104 with a power source 113, a vacuum exhausting means 118, and a reaction gas introduction pipe 114, plasma 115 is generated in a space surrounded by an electrode 111, a substrate holder 112, and an insulator 120.
    Type: Grant
    Filed: April 2, 2009
    Date of Patent: November 8, 2011
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Toru Takayama, Mitsunori Sakama, Hisashi Abe, Hiroshi Uehara, Mika Ishiwata
  • Patent number: 8033918
    Abstract: A damper mechanism 4 has an input rotary member 2, a hub flange 6, a large coil spring 8 and a friction generating mechanism 5. In a state in which the input rotary member 2 is twisted to one side in the rotational direction with respect to the hub flange 6, the friction member is pressed in the rotational direction against the hub flange 6 in a state in which at least part of the friction member has been elastically deformed in the relational direction, so that the friction member and the hub flange 6 function as an integral member in the rotational direction. In a state in which the input rotary member 2 is twisted to one side in the rotational direction with respect to the hub flange 6, the friction member is capable of relative rotation with respect to the hub flange.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: October 11, 2011
    Assignee: Exedy Corporation
    Inventors: Yoshinari Yoshimura, Hiroshi Uehara
  • Patent number: 7942749
    Abstract: A damper mechanism (4) includes a first flywheel (2), an intermediate rotating body (44) arranged to be rotatable with respect to the first flywheel (2), a second flywheel (3) arranged to be rotatable with respect to the intermediate rotating body (44), a first damper (8) having a plurality of first coil springs (41) elastically coupling the first flywheel (2) and the intermediate rotating body (44) in a rotation direction, and a second damper (9) elastically coupling the intermediate rotating body (44) and the second flywheel (3) in the rotation direction and that begins operating at a torque that is lower than the minimum operating torque of the first damper (8). The first coil springs (41) are accommodated between the first flywheel (2) and the second flywheel (3) in a state of having been compressed in the rotation direction.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: May 17, 2011
    Assignee: Exedy Corporation
    Inventors: Hiroshi Uehara, Hiroyoshi Tsuruta, Hirotaka Fukushima, Masakazu Kamiya, Masaru Ebata
  • Patent number: 7851540
    Abstract: A resin composition having excellent moldability and a sufficiently high surface hardness, which is excellent in preventing oil bleed-out problems, is provided. The present invention provides a resin composition comprising 100 parts by weight of an ethylene/1-butene random copolymer (a), 10 to 500 parts by weight of at least one styrene block copolymer (b), 10 to 140 parts by weight of an oil (c) relative to 100 parts by weight of the total amount of (a) and (b), and 0 to 500 parts by weight of a polypropylene resin (d) relative to 100 parts by weight of the total amount of (a) and (b), and a molded body made from the resin composition.
    Type: Grant
    Filed: February 17, 2005
    Date of Patent: December 14, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Hiroshi Uehara, Masayoshi Yamaguchi
  • Publication number: 20100206681
    Abstract: A clutch cover assembly (1) comprises a clutch cover (2), a pressure plate (3), a diaphragm spring (4), a cone spring (30), a support plate (20), and stud pins (10). The cone spring (30) is disposed on the flywheel side of the diaphragm spring and generates a load against the biasing force of the diaphragm spring. The support plate (20) is disposed on the flywheel side of the cone spring (30) and supports the cone spring (30) and the diaphragm spring (4). The stud pins (10) connect the support plate (20) to the clutch cover (2). Each stud pin (10) has a first fixture part (16) fixed to the clutch cover (2) and a second fixture part (17) holding the support plate (20) in the axial direction.
    Type: Application
    Filed: October 24, 2007
    Publication date: August 19, 2010
    Applicant: EXEDY CORPORATION
    Inventors: Hajime Komori, Hiroshi Uehara
  • Publication number: 20100178991
    Abstract: A damper mechanism 4 has a clutch plate 21 and a retaining plate 22 disposed aligned in the axial direction, a hub flange 6 disposed relatively rotatably in the axial direction between the plates 21 and 22, and a second coil spring 8 for elastically linking the plates 21 and 22 to the hub flange 6 in the rotational direction. The plates 21 and 22 have a pair of first main body components 28, and a plurality of linking components 31 that are disposed in the rotational direction between first protrusions 49 and second protrusions 57 and that link the pair of first main body components 28. The plurality of linking components 31 is disposed such that adjacent pitches are different.
    Type: Application
    Filed: September 28, 2007
    Publication date: July 15, 2010
    Applicant: EXEDY CORPORATION
    Inventors: Tomoki Hada, Hiroshi Uehara
  • Publication number: 20100130662
    Abstract: The crosslinked material of the present invention is obtainable by crosslinking a propylene resin composition through irradiation with an ionizing radiation wherein the propylene resin composition comprises 100 parts by mass of a propylene resin comprising 15 to 99% by mass of a propylene polymer (A) having a melting point, as measured by a differential scanning calorimeter (DSC), of 120 to 170° C., and 1 to 85% by mass of propylene polymer (B) having a melting point, as measured by a differential scanning calorimeter (DSC), of below 120° C. or not observed (provided that the total of the components (A) and (B) is 100% by mass), and 0.1 to 5 parts by mass of a crosslinking assistant (C). The production process of the crosslinked material of the present invention comprises a step of molding the propylene resin composition into a molded form, and a step of crosslinking the molded form through irradiation with an ionizing radiation.
    Type: Application
    Filed: April 23, 2008
    Publication date: May 27, 2010
    Inventors: Hiroshi Uehara, Kiminori Noda, Masayoshi Yamaguchi
  • Publication number: 20100130289
    Abstract: A damper mechanism 4 has an input rotary body 2, a hub flange 6, a splined hub 3, a third friction washer 60, a bushing 70, and an output plate 90. The third friction washer 60 is non-rotatably mounted on the hub flange 6 with respect to the hub flange 6, and has a friction member that contacts the input rotary body 2 in the axial direction. The bushing 70 is axially disposed between the hub flange 6 and the third friction washer 60, and is mounted on the hub flange 6 and the third friction washer 60 to be incapable of rotation with respect to the third friction washer 60. The output plate 90 is disposed between the third friction washer 60 and the bushing 70 in the axial direction, and is supported by the splined hub 3 to be capable of rotating integrally with the splined hub 3.
    Type: Application
    Filed: May 28, 2008
    Publication date: May 27, 2010
    Applicant: EXEDY CORPORATION
    Inventors: Hiroshi Uehara, Yasuyuki Hashimoto, Hideki Hashimoto, Yoshinari Yoshimura
  • Publication number: 20100130716
    Abstract: The present invention provides a crosslinked material of a propylene polymer (A) obtainable by crosslinking the propylene polymer (A) comprising a constitutional unit derived from propylene in an amount of not less than 50 mol %, and having a Shore D hardness of not more than 57 as measured in accordance with ASTM D 2240, and a thermal deformation of not more than 10% as measured at 180° C. under a load of 1.1 Kg in accordance with JIS C3005. The crosslinked material of the propylene polymer (A) having the above composition and physical properties has high flexibility, and excellent heat resistance and excellent scratch resistance.
    Type: Application
    Filed: April 21, 2008
    Publication date: May 27, 2010
    Inventor: Hiroshi Uehara
  • Patent number: 7723218
    Abstract: In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber 104 with a power source 113, a vacuum exhausting means 118, and a reaction gas introduction pipe 114, plasma 115 is generated in a space surrounded by an electrode 111, a substrate holder 112, and an insulator 120.
    Type: Grant
    Filed: April 11, 2005
    Date of Patent: May 25, 2010
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Toru Takayama, Mitsunori Sakama, Hisashi Abe, Hiroshi Uehara, Mika Ishiwata
  • Publication number: 20100079040
    Abstract: An exemplary piezoelectric vibrating device has a lid plate, a chip plate including a tuning-fork type vibrating piece surrounded by an outer frame, and a package base arranged where the chip plate is sandwiched between the lid plate and package base, and the three layers are bonded together. The tuning-fork type piezoelectric vibrating piece is connected to the outer frame by supporting arms. A base-movement buffer having a predetermined height in the X-direction extends from the inner edge surface of the outer frame toward a side edge of the base. The base-movement buffer has a height in the X-direction that is proportional to the length from the base-movement buffer to a point at which the tuning-fork type piezoelectric vibrating piece is coupled to the outer frame.
    Type: Application
    Filed: September 22, 2009
    Publication date: April 1, 2010
    Inventors: Hiroki IWAI, Yu IWAI, Hiroshi UEHARA
  • Publication number: 20100075763
    Abstract: A damper mechanism 4 has an input rotary member 2, a hub flange 6, a large coil spring 8 and a friction generating mechanism 5. In a state in which the input rotary member 2 is twisted to one side in the rotational direction with respect to the hub flange 6, the friction member is pressed in the rotational direction against tile hub flange 6 in a state in which at least part of the friction member has been elastically deformed in the rotational direction, so that the friction member and the hub flange 6 function as an integral member in the rotational direction. In a state in which the input rotary member 2 is twisted to one side in the rotational direction with respect to the hub flange 6, the friction member is capable of relative rotation with respect to the hub flange 6.
    Type: Application
    Filed: October 24, 2007
    Publication date: March 25, 2010
    Applicant: EXEDY CORPORATION
    Inventors: Yoshinari Yoshimura, Hiroshi Uehara