Patents by Inventor Hirosi NISIHATA

Hirosi NISIHATA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate cleaning apparatus, substrate cleaning method and non-transitory storage medium
    Patent number: 9805958
    Abstract: A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning liquid nozzle set at a position deviated from a movement locus of the first cleaning liquid nozzle. Both of the nozzles are moved toward the peripheral edge side of the substrate while discharging the cleaning liquid and discharging the gas so that a difference between a distance from the discharge position of the second cleaning liquid nozzle to the central portion of the substrate and a distance from the discharge position of the gas nozzle to the central portion of the substrate gradually decreases.
    Type: Grant
    Filed: May 18, 2017
    Date of Patent: October 31, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Atsushi Ookouchi, Kousuke Yoshihara, Hiroshi Ichinomiya, Hirosi Nisihata, Ryouichirou Naitou
  • SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD AND NON-TRANSITORY STORAGE MEDIUM
    Publication number: 20170256427
    Abstract: A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning liquid nozzle set at a position deviated from a movement locus of the first cleaning liquid nozzle. Both of the nozzles are moved toward the peripheral edge side of the substrate while discharging the cleaning liquid and discharging the gas so that a difference between a distance from the discharge position of the second cleaning liquid nozzle to the central portion of the substrate and a distance from the discharge position of the gas nozzle to the central portion of the substrate gradually decreases.
    Type: Application
    Filed: May 18, 2017
    Publication date: September 7, 2017
    Inventors: Atsushi OOKOUCHI, Kousuke YOSHIHARA, Hiroshi ICHINOMIYA, Hirosi NISIHATA, Ryouichirou NAITOU
  • Substrate cleaning apparatus, substrate cleaning method and non-transitory storage medium
    Patent number: 9704730
    Abstract: A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning liquid nozzle set at a position deviated from a movement locus of the first cleaning liquid nozzle. Both of the nozzles are moved toward the peripheral edge side of the substrate while discharging the cleaning liquid and discharging the gas so that a difference between a distance from the discharge position of the second cleaning liquid nozzle to the central portion of the substrate and a distance from the discharge position of the gas nozzle to the central portion of the substrate gradually decreases.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: July 11, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Atsushi Ookouchi, Kousuke Yoshihara, Hiroshi Ichinomiya, Hirosi Nisihata
  • SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD AND NON-TRANSITORY STORAGE MEDIUM
    Publication number: 20140352737
    Abstract: A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning liquid nozzle set at a position deviated from a movement locus of the first cleaning liquid nozzle. Both of the nozzles are moved toward the peripheral edge side of the substrate while discharging the cleaning liquid and discharging the gas so that a difference between a distance from the discharge position of the second cleaning liquid nozzle to the central portion of the substrate and a distance from the discharge position of the gas nozzle to the central portion of the substrate gradually decreases.
    Type: Application
    Filed: May 21, 2014
    Publication date: December 4, 2014
    Applicant: Tokyo Electron Limited
    Inventors: Atsushi OOKOUCHI, Kousuke YOSHIHARA, Hiroshi ICHINOMIYA, Hirosi NISIHATA, Ryouichirou NAITOU