Patents by Inventor Hirosi Nozue

Hirosi Nozue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Beam exposure system having improved mask unit
    Patent number: 5731591
    Abstract: In a beam exposure system, a beam is irradiated onto a mask unit, and the beam passed through the mask unit is deflected and is irradiated onto a target. The mask unit includes a polygonal hollowed holder and a plurality of masks. The holder is formed by mask mounting plates each having apertures for mounting the masks, and frames each having an aperture for passing the beam therethough.
    Type: Grant
    Filed: January 17, 1997
    Date of Patent: March 24, 1998
    Assignee: NEC Corporation
    Inventors: Yasuhisa Yamada, Hirosi Nozue