Patents by Inventor Hirota OHTAKE

Hirota OHTAKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • HIGHLY SELECTIVE SPACER ETCH PROCESS WITH REDUCED SIDEWALL SPACER SLIMMING
    Publication number: 20140120728
    Abstract: A method for performing a spacer etch process is described. The method includes conformally applying a spacer material over a gate structure on a substrate, and performing a spacer etch process sequence to partially remove the spacer material from a capping region of the gate structure and a substrate region on the substrate adjacent a base of the gate structure, while retaining a spacer sidewall positioned along a sidewall of the gate structure.
    Type: Application
    Filed: January 8, 2014
    Publication date: May 1, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Angelique Denise RALEY, Takuya MORI, Hirota OHTAKE