Abstract: Provided is a dispersion liquid of silica particles, comprising silica particles having an average particle diameter of 5 to 300 nm determined from an electron micrograph and a density of 1.20 g/cm3 or more determined from a specific surface area determined by a BET method using nitrogen adsorption, wherein the dispersion liquid has a pH of less than 8, a silica concentration of 12 to 40% by mass, and a viscosity in terms of a silica concentration of 20% by mass of 40 mPa·s or less. When this silica particle is used as an abrasive, it is possible to realize a sufficient polishing speed and a smooth polished surface on which occurrence of scratches is suppressed.

Abstract: A method for producing a dispersion liquid of silica particles, by simultaneously adding a liquid A containing silane alkoxide and a liquid B containing an alkali catalyst and water to a liquid I containing silica seed particles to cause the particles to grow, so as to produce silica particles; wherein the variation rate of the mole ratio of the alkali catalyst to silica components in the reaction system during a period from the start to the end of the addition relative to the initial mole ratio is 0.90 to 1.10; and the variation rate of the mole ratio of water to the silica components in the reaction system during a period from the start to the end of the addition relative to the initial mole ratio is 0.90 to 1.10.

Abstract: A method for producing a liquid dispersion containing irregular-shaped silica particles in which two or more primary particles are linked together, by simultaneously adding a liquid A containing silane alkoxide and a liquid B containing an alkali catalyst and water to a liquid I consisting substantially of an organic solvent to cause hydrolysis and polycondensation of the silane alkoxide, wherein the period from the start of the addition until the silica concentration of the reaction system at the end of the addition reaches 70% is 20% or less of the full reaction time period.

Abstract: Provided is a dispersion liquid of silica particles, comprising silica particles having an average particle diameter of 5 to 300 nm determined from an electron micrograph and a density of 1.20 g/cm3 or more determined from a specific surface area determined by a BET method using nitrogen adsorption, wherein the dispersion liquid has a pH of less than 8, a silica concentration of 12 to 40% by mass, and a viscosity in terms of a silica concentration of 20% by mass of 40 mPa·s or less. When this silica particle is used as an abrasive, it is possible to realize a sufficient polishing speed and a smooth polished surface on which occurrence of scratches is suppressed.

Abstract: A method for producing a dispersion liquid of silica particles, by simultaneously adding a liquid A containing silane alkoxide and a liquid B containing an alkali catalyst and water to a liquid I containing silica seed particles to cause the particles to grow, so as to produce silica particles; wherein the variation rate of the mole ratio of the alkali catalyst to silica components in the reaction system during a period from the start to the end of the addition relative to the initial mole ratio is 0.90 to 1.10; and the variation rate of the mole ratio of water to the silica components in the reaction system during a period from the start to the end of the addition relative to the initial mole ratio is 0.90 to 1.10.

Abstract: A method for producing a liquid dispersion containing irregular-shaped silica particles in which two or more primary particles are linked together, by simultaneously adding a liquid A containing silane alkoxide and a liquid B containing an alkali catalyst and water to a liquid I consisting substantially of an organic solvent to cause hydrolysis and polycondensation of the silane alkoxide, wherein the period from the start of the addition until the silica concentration of the reaction system at the end of the addition reaches 70% is 20% or less of the full reaction time period.

Abstract: Producing a silica particle by inhibiting the generation of incompletely reacted materials such as oligomers which have not been grown to the silica particles having the intended particle size. A dispersion liquid of a silica particle is produced by simultaneously adding, to a liquid substantially consisting of an organic solvent, a liquid containing silane alkoxide and a liquid containing an alkali catalyst and water to cause hydrolysis and polycondensations to produce a silica particle. The variation rate of the mole ratio of the alkali catalyst to silane alkoxide in the reaction system for a period from the start to the end of the reaction relative to the initial mole ratio is 0.90 to 1.10; and the variation rate of the mole ratio of water to silane alkoxide for a period from the start to the end of the reaction relative to the initial mole ratio is 0.90 to 1.10.

Abstract: Provided is a silica-based polishing particle which can polish and flatten the surface of a substrate at a sufficient polishing rate with generation of scratches prevented, and successfully prevents generation of particle residues on a substrate after polishing. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of 1.00 or more and 1.20 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.

Abstract: Provided is a silica-based polishing particle, particularly suitable for primary polishing, which provides a high polishing rate on the surface of a substrate and which prevents particle residues on the substrate after polishing, and an abrasive including the silica-based polishing particle. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of more than 1.20 and 5.00 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.

Abstract: Producing a silica particle by inhibiting the generation of incompletely reacted materials such as oligomers which have not been grown to the silica particles having the intended particle size. A dispersion liquid of a silica particle is produced by simultaneously adding, to a liquid substantially consisting of an organic solvent, a liquid containing silane alkoxide and a liquid containing an alkali catalyst and water to cause hydrolysis and polycondensations to produce a silica particle. The variation rate of the mole ratio of the alkali catalyst to silane alkoxide in the reaction system for a period from the start to the end of the reaction relative to the initial mole ratio is 0.90 to 1.10; and the variation rate of the mole ratio of water to silane alkoxide for a period from the start to the end of the reaction relative to the initial mole ratio is 0.90 to 1.10.

Abstract: Provided is a silica-based polishing particle, particularly suitable for primary polishing, which provides a high polishing rate on the surface of a substrate and which prevents particle residues on the substrate after polishing, and an abrasive including the silica-based polishing particle. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of more than 1.20 and 5.00 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.

Abstract: Provided is a silica-based polishing particle which can polish and flatten the surface of a substrate at a sufficient polishing rate with generation of scratches prevented, and successfully prevents generation of particle residues on a substrate after polishing. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of 1.00 or more and 1.20 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.