Abstract: The thin-film magnetic head comprises a lower magnetic pole layer, an upper magnetic pole layer and a first thin-film coil. A resist film made of an organic insulating material is interposed between turns adjacent to each other in the lead constituting the first thin-film coil. The first thin-film coil has a minimum width part and a maximum width part. The minimum width part is arranged closer to an air bearing surface than is a second upper magnetic pole part, while the whole upper face of the minimum width part is covered with the resist film. The maximum width part is arranged on the side farther from the air bearing surface than is the second upper magnetic pole part, while the upper face of the maximum width part is formed with a resist-uncoated area free of the resist film.

Abstract: A magnetic head includes: a coil; a pole layer; a shield having an end face located in a medium facing surface forward of an end face of the pole layer along a direction of travel of a recording medium; a gap layer between the shield and the pole layer; and a substrate on which the foregoing elements are stacked. The top surface of the pole layer includes: first and second portions with a difference in height therebetween; and a third portion connecting the first and second portions to each other. The first portion has an edge located in the medium facing surface, and the second portion is located farther from the medium facing surface and from the substrate than the first portion. The magnetic head further includes a nonmagnetic layer disposed between the second portion and the gap layer. The nonmagnetic layer has a surface touching the second portion, the surface having an edge located at the boundary between the second and third portions.

Abstract: A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W1; forming a second frame layer having end surfaces facing each other across a space having a width W2 that is larger than the width W1, the space having the width W2 being located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3 that is smaller than the width W1 so as to fill at least a part of the spaces having the width W1 and the width W2 respectively; and forming a pattern film so as to fill at least a part of the trench.

Abstract: A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a transparent film over the formed predetermined pattern film or predetermined elements, a step of forming a pattern-transferred film having shapes corresponding to shapes of the formed predetermined pattern film or predetermined elements, on the formed transparent film, and a step of forming an opaque film on the pattern-transferred film.

Abstract: A magnetic head includes: a coil; a pole layer; a shield having an end face located in a medium facing surface forward of an end face of the pole layer along a direction of travel of a recording medium; a gap layer between the shield and the pole layer; and a substrate on which the foregoing elements are stacked. The top surface of the pole layer includes: first and second portions with a difference in height therebetween; and a third portion connecting the first and second portions to each other. The first portion has an edge located in the medium facing surface, and the second portion is located farther from the medium facing surface and from the substrate than the first portion. The magnetic head further includes a nonmagnetic layer disposed between the second portion and the gap layer. The nonmagnetic layer has a surface touching the second portion, the surface having an edge located at the boundary between the second and third portions.

Abstract: An electronic device material preform is used when manufacturing an electronic device material where a predetermined functional layer is formed on a surface of a substrate by sputtering. The electronic device material preform includes a discharge-guiding film that conducts electricity and guides abnormal discharge that occurs when the sputtering is carried out. The discharge-guiding film is formed at a predetermined part of an outer circumferential edge of the substrate before the functional layer is formed.

Abstract: A thin-film magnetic head which can keep performances from fluctuating, while restraining an organic insulating material from peeling off is provided. The thin-film magnetic head comprises a lower magnetic pole layer, an upper magnetic pole layer and a first thin-film coil. A resist film made of an organic insulating material is interposed between turns adjacent to each other in the lead constituting the first thin-film coil. The first thin-film coil has a minimum width part and a maximum width part. The minimum width part is arranged closer to an air bearing surface than is a second upper magnetic pole part, while the whole upper face of the minimum width part is covered with the resist film. The maximum width part is arranged on the side farther from the air bearing surface than is the second upper magnetic pole part, while the upper face of the maximum width part is formed with a resist-uncoated area free of the resist film.

Abstract: A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W1; forming a second frame layer having end surfaces facing each other across a space having a width W2 that is larger than the width W1, the space having the width W2 being located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3 that is smaller than the width W1 so as to fill at least a part of the spaces having the width W1 and the width W2 respectively; and forming a pattern film so as to fill at least a part of the trench.

Abstract: A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a transparent film over the formed predetermined pattern film or predetermined elements, a step of forming a pattern-transferred film having shapes corresponding to shapes of the formed predetermined pattern film or predetermined elements, on the formed transparent film, and a step of forming an opaque film on the pattern-transferred film.