Abstract: A simulation apparatus has: a first processing part configured to obtain a value of a parameter in a first set relating to the forming of the pattern; a second processing part configured to obtain a value of a parameter in a second set that is at least partially same as the parameter in the first set and relating to the forming of the pattern; and an integration processing part configured to evaluate, based on the value of the parameter in the first set and the value of the parameter in the second set, a state of the pattern formed on the substrate and a forming condition when the pattern is formed, and to determine based on the result of the evaluation whether or not to make at least one of the first processing part and the second processing part recalculate the value of the parameter in the corresponding set.

Abstract: A simulation apparatus has: a first processing part configured to obtain a value of a parameter in a first set relating to the forming of the pattern; a second processing part configured to obtain a value of a parameter in a second set that is at least partially same as the parameter in the first set and relating to the forming of the pattern; and an integration processing part configured to evaluate, based on the value of the parameter in the first set and the value of the parameter in the second set, a state of the pattern formed on the substrate and a forming condition when the pattern is formed, and to determine based on the result of the evaluation whether or not to make at least one of the first processing part and the second processing part recalculate the value of the parameter in the corresponding set.

Abstract: A simulation apparatus has: a first processing part configured to obtain a value of a parameter in a first set relating to the forming of the pattern; a second processing part configured to obtain a value of a parameter in a second set that is at least partially same as the parameter in the first set and relating to the forming of the pattern; and an integration processing part configured to evaluate, based on the value of the parameter in the first set and the value of the parameter in the second set, a state of the pattern formed on the substrate and a forming condition when the pattern is formed, and to determine based on the result of the evaluation whether or not to make at least one of the first processing part and the second processing part recalculate the value of the parameter in the corresponding set.

Abstract: An exposure apparatus has a stage having a substrate holder and a plate member around the substrate holder to surround a substrate on the substrate holder. A liquid supply mechanism includes a supply port above the stage at a more outward position than an optical path of light from a projection system and supplies liquid onto the stage from the supply port. A liquid recovery mechanism includes a recovery port above the stage at a more outward position than the supply port and recovers the liquid supplied from the supply port. The liquid supply and recovery mechanisms form a liquid immersion region that includes the optical path on part of the stage with the liquid supplied from the supply port. The stage has a passageway below the plate member and recovers the liquid from the liquid immersion region that infiltrates a gap between the plate member and the substrate.

Abstract: A simulation apparatus has: a first processing part configured to obtain a value of a parameter in a first set relating to the forming of the pattern; a second processing part configured to obtain a value of a parameter in a second set that is at least partially same as the parameter in the first set and relating to the forming of the pattern; and an integration processing part configured to evaluate, based on the value of the parameter in the first set and the value of the parameter in the second set, a state of the pattern formed on the substrate and a forming condition when the pattern is formed, and to determine based on the result of the evaluation whether or not to make at least one of the first processing part and the second processing part recalculate the value of the parameter in the corresponding set.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes: a projection system; a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet; a second nozzle member having a gas supply inlet via which a gas is supplied, the gas being supplied via the gas supply inlet to a space surrounding the liquid immersion area during the exposure; and a stage system having a holder by which the substrate is held. The substrate held by the holder is moved below and relative to the projection system, the first nozzle member and the second nozzle member.

Abstract: A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.

Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.

Abstract: An exposure apparatus where liquid supply operation and liquid recovery operation for forming a liquid immersion region are excellently performed to form the liquid immersion region in a desired condition, enabling high exposure accuracy and measurement accuracy to be achieved. An exposure apparatus (EX) is an apparatus that exposes a substrate (P) by emitting exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus has a liquid supply mechanism (10) having a supply opening (13) capable of supplying the liquid (LQ) in the direction substantially parallel to the surface of the substrate (P).

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.

Abstract: An exposure apparatus where liquid supply operation and liquid recovery operation for forming a liquid immersion region are excellently performed to form the liquid immersion region in a desired condition, enabling high exposure accuracy and measurement accuracy to be achieved. An exposure apparatus (EX) is an apparatus that exposes a substrate (P) by emitting exposure light (EL) on the substrate (P) through liquid (LQ). The exposure apparatus has a liquid supply mechanism (10) having a supply opening (13) capable of supplying the liquid (LQ) in the direction substantially parallel to the surface of the substrate (P).

Abstract: An exposure apparatus is provided that performs well a liquid supply operation for forming a liquid immersion region and a liquid recovery operation to form a liquid immersion region in a desired state, thereby allowing high exposure accuracy and high measurement accuracy. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a liquid (LQ), and includes a liquid supply mechanism (10) that has a supply port (13) capable of supplying the liquid (LQ) substantially in parallel with a surface of the substrate (P).

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.