Patents by Inventor Hirotaka Matsunaga
Hirotaka Matsunaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12263688Abstract: A recording device includes a recording head, a carriage performing a reciprocating movement, a transport unit transporting the medium, and a control unit, wherein the control unit can perform a forward pass for causing the recording head to discharge the liquid along with a forward movement from one side to another side, and a return pass for causing the recording head to discharge the liquid along with a return movement from the other side to the one side, and performs first recording control when recording an image, in which when a feed amount on the one side of the medium is less than a feed amount on the other side, the image is recorded by the forward pass, and when the feed amount on the other side of the medium is less than the feed amount on the one side, the image is recorded by the return pass.Type: GrantFiled: February 6, 2023Date of Patent: April 1, 2025Assignee: Seiko Epson CorporationInventor: Hirotaka Matsunaga
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Patent number: 12257483Abstract: A head includes a face portion, a crown portion, a sole portion, and a hosel portion. The crown portion includes a protruding portion on a crown outer surface. The protruding portion does not form any part of an outer contour line of the head in a front view of the head as viewed from a face side. The protruding portion forms an outer contour line of the head in a heel projection figure in which the head that is placed on a ground plane such that a shaft axis line is perpendicular to the ground plane and a face angle is 0° is viewed from a heel side along the ground plane. In this head, aerodynamic drag and lifting force at a position at which the shaft axis line becomes parallel to the ground plane during downswing can be increased. In this head, air resistance at impact can be suppressed.Type: GrantFiled: December 30, 2021Date of Patent: March 25, 2025Assignee: SUMITOMO RUBBER INDUSTRIES, LTD.Inventors: Naruhiro Mizutani, Kiyofumi Matsunaga, Jun Kodaka, Hirotaka Nakamura, Daisuke Kohno, Shinya Furuta
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Patent number: 12203158Abstract: This copper alloy contains greater than 10 mass ppm and less than 100 mass ppm of Mg, with a balance being Cu and inevitable impurities, which comprise: 10 mass ppm or less of S, 10 mass ppm or less of P, 5 mass ppm or less of Se, 5 mass ppm or less of Te, 5 mass ppm or less of Sb, 5 mass ppm or less of Bi, and 5 mass ppm or less of As. The total amount of S, P, Se, Te, Sb, Bi, and As is 30 mass ppm or less. The mass ratio [Mg]/[S+P+Se+Te+Sb+Bi+As] is 0.6 to 50, an electrical conductivity is 97% IACS or greater. The half-softening temperature ratio TLD/TTD is greater than 0.95 and less than 1.08. The half-softening temperature TLD is 210° C. or higher.Type: GrantFiled: June 30, 2021Date of Patent: January 21, 2025Assignee: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka Matsunaga, Kosei Fukuoka, Kazunari Maki, Kenji Morikawa, Shinichi Funaki, Hiroyuki Mori
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Patent number: 12083807Abstract: Provided is a printing apparatus in which: a platen includes a plurality of contact portions configured to be brought into contact with a printing medium to support the printing medium, and a plurality of non-contact portions configured not to be brought into contact with the printing medium; the plurality of contact portions are disposed at positions differing from each other in a transport direction, and are each provided between the non-contact portions; and when performing marginless printing for discharging ink to an end portion, in the transport direction, of the printing medium, a control unit changes an area of a nozzle used in the marginless printing to any of a plurality of nozzle areas corresponding respectively to the plurality of non-contact portions in the transport direction, in accordance with deposit information indicating the amount of deposits of the ink at the non-contact portions.Type: GrantFiled: March 1, 2022Date of Patent: September 10, 2024Assignee: Seiko Epson CorporationInventor: Hirotaka Matsunaga
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Patent number: 12035469Abstract: A pure copper sheet has a composition including 99.96 mass % or more of Cu, 9.0 mass ppm or more and less than 100.0 mass ppm of a total content of Ag, Sn, and Fe, and inevitable impurities as a balance, in which an average crystal grain size of crystal grains on a rolled surface is 10 ?m or more, the pure copper sheet has crystals in which crystal planes parallel to the rolled surface are a {022} plane, a {002} plane, a {113} plane, a {111} plane, and a {133} plane, and diffraction peak intensities of the individual crystal planes that are obtained by X-ray diffraction measurement by a 2?/? method on the rolled surface satisfy I {022}/(I {022}+I {002}+I {113}+I {111}+I {133})?0.15, I {002}/I {111}?10.0, and I {002}/I {113}?15.0.Type: GrantFiled: March 5, 2021Date of Patent: July 9, 2024Assignee: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka Matsunaga, Yuki Ito, Hiroyuki Mori
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Publication number: 20240124954Abstract: A pure copper sheet of the present invention has a composition including 99.96 mass % or more of Cu, 0.01 mass ppm or more and 3.00 mass ppm or less of P, 10.0 mass ppm or less of a total content of Pb, Se, and Te, 3.0 mass ppm or more of a total content of Ag and Fe, and inevitable impurities as a balance, in which an average crystal grain size of crystal grains on a rolled surface is 10 ?m or more, an aspect ratio of the crystal grain on the rolled surface is set to 2.0 or less, and a length percentage of the small tilt grain boundary and the subgrain boundary with respect to all grain boundaries is set to 80% or less in terms of partition fraction.Type: ApplicationFiled: March 8, 2021Publication date: April 18, 2024Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Yuki ITO, Hiroyuki MORI, Norihisa IIDA, Motohiro HITAKA
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Publication number: 20230395278Abstract: In this slit copper material, a purity of Cu is 99.96% by mass or greater, a ratio W/t of a plate width W to a plate thickness t is 10 or greater, an electrical conductivity is 97.0% IACS or greater, and an average value of orientation densities at ?2=5°, in a range of ?1=0° to 90°, and at ?=0° in a plate center portion is 2.0 or greater and less than 30.0.Type: ApplicationFiled: October 20, 2021Publication date: December 7, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Kosei FUKUOKA, Kazunari MAKI
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Publication number: 20230313342Abstract: A slit copper material, a purity of Cu is comprises 99.96% by mass or greater of Cu. In this slit copper material, a ratio W/t of a plate width W to a plate thickness t is 10 or greater, an electrical conductivity is 97.0% IACS or greater, a ratio B/A of an average crystal grain size B in a plate surface layer portion to an average crystal grain size A in a plate center portion is in a range of 0.80 or greater and 1.20 or less, and the average crystal grain size A in the plate center portion is 25 ?m or less.Type: ApplicationFiled: October 20, 2021Publication date: October 5, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Kosei FUKUOKA, Kazunari MAKI
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Publication number: 20230313341Abstract: A copper alloy plastically-worked material comprises Mg in the amount of 10-100 mass ppm and a balance of Cu and inevitable impurities, which comprise 10 mass ppm or less of S, 10 mass ppm or less of P, 5 mass ppm or less of Se, 5 mass ppm or less of Te, 5 mass ppm or less of Sb, 5 mass ppm or less of Bi and 5 mass ppm or less of As. The total amount of S, P, Se, Te, Sb, Bi, and As is 30 mass ppm or less. The mass ratio of [Mg]/[S+P+Se+Te+Sb+Bi+As] is 0.6 or greater and 50 or less. The electrical conductivity is 97% IACS or greater. The tensile strength is 275 MPa or less. The heat-resistant temperature after draw working is 150° C. or higher.Type: ApplicationFiled: June 30, 2021Publication date: October 5, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Yuki ITO, Kosei FUKUOKA, Kazunari MAKI, Kenji MORIKAWA, Shinichi FUNAKI, Hiroyuki MORI
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Patent number: 11732329Abstract: A copper alloy has a composition including: 70 mass ppm or more and 400 mass ppm or less of Mg; 5 mass ppm or more and 20 mass ppm or less of Ag; less than 3.0 mass ppm of P; and a Cu balance containing inevitable impurities. In the copper alloy, the electrical conductivity is 90% IACS or more, and the average value of KAM values is 3.0 or less.Type: GrantFiled: November 27, 2020Date of Patent: August 22, 2023Assignee: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka Matsunaga, Yuki Ito, Hiroyuki Mori, Hiroyuki Matsukawa
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Patent number: 11725258Abstract: This copper alloy for electronic or electric devices contains 100 mass ppm or greater and 400 mass ppm or less of Mg, 5 mass ppm or greater and 20 mass ppm or less of Ag, and less than 5 mass ppm of P with a balance being Cu and inevitable impurities, in which when a ratio of J3, in which all three grain boundaries constituting a grain boundary triple junction are special grain boundaries, to all grain boundary triple junctions is defined as NFJ3 and a ratio of J2, in which two grain boundaries constituting a grain boundary triple junction are special grain boundaries and one grain boundary constituting the grain boundary triple junction is a random grain boundary, to all grain boundary triple junctions is defined as NFJ2, an expression of 0.22<(NFJ2/(1?NFJ3))0.5?0.45 is satisfied.Type: GrantFiled: September 11, 2020Date of Patent: August 15, 2023Assignee: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka Matsunaga, Yuki Ito, Hiroyuki Mori, Hiroyuki Matsukawa
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Publication number: 20230250514Abstract: This copper alloy contains greater than 10 mass ppm and less than 100 mass ppm of Mg, with a balance being Cu and inevitable impurities, which comprise: 10 mass ppm or less of S, 10 mass ppm or less of P, 5 mass ppm or less of Se, 5 mass ppm or less of Te, 5 mass ppm or less of Sb, 5 mass ppm or less of Bi, and 5 mass ppm or less of As. The total amount of S, P, Se, Te, Sb, Bi, and As is 30 mass ppm or less. The mass ratio [Mg]/[S+P+Se+Te+Sb+Bi+As] is 0.6 to 50, an electrical conductivity is 97% IACS or greater. The half-softening temperature ratio TLD/TTD is greater than 0.95 and less than 1.08. The half-softening temperature TLD is 210° C. or higher.Type: ApplicationFiled: June 30, 2021Publication date: August 10, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Kosei FUKUOKA, Kazunari MAKI, Kenji MORIKAWA, Shinichi FUNAKI, Hiroyuki MORI
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Publication number: 20230249484Abstract: A recording device includes a recording head, a carriage performing a reciprocating movement, a transport unit transporting the medium, and a control unit, wherein the control unit can perform a forward pass for causing the recording head to discharge the liquid along with a forward movement from one side to another side, and a return pass for causing the recording head to discharge the liquid along with a return movement from the other side to the one side, and performs first recording control when recording an image, in which when a feed amount on the one side of the medium is less than a feed amount on the other side, the image is recorded by the forward pass, and when the feed amount on the other side of the medium is less than the feed amount on the one side, the image is recorded by the return pass.Type: ApplicationFiled: February 6, 2023Publication date: August 10, 2023Inventor: Hirotaka Matsunaga
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Publication number: 20230243020Abstract: A copper alloy plastically-worked material comprises Mg in the amount of greater than 10 mass ppm and 100 mass ppm or less and a balance of Cu and inevitable impurities, that comprise 10 mass ppm or less of S, 10 mass ppm or less of P, 5 mass ppm or less of Se, 5 mass ppm or less of Te, 5 mass ppm or less of Sb, 5 mass ppm or less of Bi, and 5 mass ppm or less of As. The total amount of S, P, Se, Te, Sb, Bi, and As is 30 mass ppm or less. The mass ratio of [Mg]/[S+P+Se+Te+Sb+Bi+As] is 0.6 or greater and 50 or less, the electrical conductivity is 97% IACS or greater. The tensile strength is 200 MPa or greater. The heat-resistant temperature is 150° C. or higher.Type: ApplicationFiled: June 30, 2021Publication date: August 3, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Yuki ITO, Kosei FUKUOKA, Kazunari MAKI, Kenji MORIKAWA, Shinichi FUNAKI, Hiroyuki MORI
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Publication number: 20230243018Abstract: This copper alloy of one aspect contains greater than 10 mass ppm and less than 100 mass ppm of Mg, with a balance being Cu and inevitable impurities, in which among the inevitable impurities, a S amount is 10 mass ppm or less, a P amount is 10 mass ppm or less, a Se amount is 5 mass ppm or less, a Te amount is 5 mass ppm or less, an Sb amount is 5 mass ppm or less, a Bi amount is 5 mass ppm or less, an As amount is 5 mass ppm or less, a total amount of S, P, Se, Te, Sb, Bi, and As is 30 mass ppm or less, a mass ratio [Mg]/[S+P+Se+Te+Sb+Bi+As] is 0.6 to 50, an electrical conductivity is 97% IACS or greater, and a residual stress ratio at 150° C. for 1000 hours is 20% or greater.Type: ApplicationFiled: June 30, 2021Publication date: August 3, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Kosei FUKUOKA, Kazunari MAKI, Kenji MORIKAWA, Shinichi FUNAKI, Hiroyuki MORI
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Publication number: 20230243019Abstract: This copper alloy contains 10-100 mass ppm of Mg, with a balance being Cu and inevitable impurities, which comprise; 10 mass ppm or less of S, 10 mass ppm or less of P, 5 mass ppm or less of Se, 5 mass ppm or less of Te, 5 mass ppm or less of Sb, 5 mass ppm or less of Bi, 5 mass ppm or less of As. The total amount of S, P, Se, Te, Sb, Bi, and As is 30 mass ppm or less. The mass ratio [Mg]/[S+P+Se+Te+Sb+Bi+As] is 0.6 to 50. The electrical conductivity is 97% IACS or greater. The half-softening temperature is 200° C. or higher. The residual stress ratio RSG at 180° C. for 30 hours is 20% or greater. The ratio RSG/RSB at 180° C. for 30 hours is greater than 1.0.Type: ApplicationFiled: June 30, 2021Publication date: August 3, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Kosei FUKUOKA, Kazunari MAKI, Kenji MORIKAWA, Shinichi FUNAKI, Hiroyuki MORI
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Patent number: 11655523Abstract: This copper alloy for electronic or electric devices includes: Mg: 0.15 mass % or greater and less than 0.35 mass %; and P: 0.0005 mass % or greater and less than 0.01 mass %, with a remainder being Cu and unavoidable impurities, wherein an amount of Mg [Mg] and an amount of P [P] in terms of mass ratio satisfy [Mg]+20×[P]<0.5, and 0.20<(NFJ2/(1?NFJ3))0.5?0.45 is satisfied in a case where a proportion of J3, in which all three grain boundaries constituting a grain boundary triple junction are special grain boundaries, to total grain boundary triple junctions is represented by NFJ3, and a proportion of J2, in which two grain boundaries constituting a grain boundary triple junction are special grain boundaries and one grain boundary is a random grain boundary, to the total grain boundary triple junctions is represented by NFJ2.Type: GrantFiled: March 28, 2019Date of Patent: May 23, 2023Assignee: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka Matsunaga, Kenichiro Kawasaki, Hiroyuki Mori, Kazunari Maki, Yoshiteru Akisaka
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Publication number: 20230114969Abstract: A pure copper sheet has a composition including 99.96 mass% or more of Cu, 9.0 mass ppm or more and less than 100.0 mass ppm of a total content of Ag, Sn, and Fe, and inevitable impurities as a balance, in which an average crystal grain size of crystal grains on a rolled surface is 10 µm or more, the pure copper sheet has crystals in which crystal planes parallel to the rolled surface are a {022} plane, a {002} plane, a {113} plane, a {111} plane, and a {133} plane, and diffraction peak intensities of the individual crystal planes that are obtained by X-ray diffraction measurement by a 2?/? method on the rolled surface satisfy I {022}/(I {022} + I {002} + I {113} + I {111} + I {133}) ? 0.15, I {002}/I {111} ? 10.0, and I {002}/I {113} ? 15.0.Type: ApplicationFiled: March 5, 2021Publication date: April 13, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Yuki ITO, Hiroyuki MORI
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Publication number: 20230112081Abstract: A pure copper sheet of the present invention has a composition including 99.96 mass % or more of Cu, 0.01 mass ppm or more and 3.00 mass ppm or less of P, 3.0 mass ppm or more of a total content of Ag and Fe, and inevitable impurities as a balance, in which an average crystal grain size of crystal grains on a rolled surface is 10 ?m or more, and, in a case where a measurement area of 1 mm2 or more is measured by an EBSD method at measurement intervals of 5 ?m steps, a measurement point where a CI value analyzed with data analysis software OIM is 0.1 or less is excluded, and a boundary where an orientation angle between adjacent pixels is 5° or more is regarded as a crystal grain boundary, a Kernel average misorientation (KAM) value is 1.50 or less.Type: ApplicationFiled: March 8, 2021Publication date: April 13, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Yuki ITO, Hiroyuki MORI, Norihisa IIDA, Motohiro HITAKA
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Publication number: 20230090953Abstract: A pure copper sheet of the present invention has a composition including 99.96 mass % or more of Cu, 10.0 mass ppm or less of a total content of Pb, Se, and Te, 3.0 mass ppm or more of a total content of Ag and Fe, and inevitable impurities as a balance, in which an average crystal grain size of crystal grains on a rolled surface is 10 ?m or more, an aspect ratio of the crystal grain on the rolled surface is 2.0 or less, and an average crystal grain size of the crystal grains on the rolled surface after a pressure heat treatment performed under conditions of a pressure of 0.6 MPa, a heating temperature of 850° C., and a retention time at the heating temperature of 90 minutes is 500 ?m or less.Type: ApplicationFiled: March 5, 2021Publication date: March 23, 2023Applicant: MITSUBISHI MATERIALS CORPORATIONInventors: Hirotaka MATSUNAGA, Yuki ITO, Hiroyuki MORI