Patents by Inventor Hirotaka MIKAMI

Hirotaka MIKAMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11043363
    Abstract: A plasma processing method is performed by a plasma processing apparatus that includes a process chamber, a conductive first component that is disposed in the process chamber and at least a surface of which is covered with a conductive silicon material, and a second component that is disposed in the process chamber and is at a ground potential or a floating potential with respect to an electric potential of plasma. The method includes forming an oxide layer on the surface of the first component by converting an oxygen-containing gas into plasm, and treating a surface of the second component by converting a halogen-containing gas into plasm.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: June 22, 2021
    Assignee: Tokyo Electron Limited
    Inventor: Hirotaka Mikami
  • Publication number: 20200273673
    Abstract: A plasma processing method is performed by a plasma processing apparatus that includes a process chamber, a conductive first component that is disposed in the process chamber and at least a surface of which is covered with a conductive silicon material, and a second component that is disposed in the process chamber and is at a ground potential or a floating potential with respect to an electric potential of plasma. The method includes forming an oxide layer on the surface of the first component by converting an oxygen-containing gas into plasm, and treating a surface of the second component by converting a halogen-containing gas into plasm.
    Type: Application
    Filed: February 26, 2020
    Publication date: August 27, 2020
    Inventor: Hirotaka MIKAMI