Patents by Inventor Hirotaka Tagoshi

Hirotaka Tagoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6783840
    Abstract: The present invention provides a resist ink composition comprising a compound (a) having at least one oxetanyl group and at least one epoxy group within the same molecule and a compound (b) capable of initiating cationic polymerization under irradiation by an active energy ray and/or under heat. This resist ink composition has high photosensitivity and enables the final curing by a brief heating and the cured film exhibits good physical properties.
    Type: Grant
    Filed: October 29, 2001
    Date of Patent: August 31, 2004
    Assignee: Showa Denko K.K.
    Inventors: Takeo Watanabe, Takashi Sato, Hirotaka Tagoshi
  • Publication number: 20030022958
    Abstract: The present invention provides a resist ink composition comprising a compound (a) having at least one oxetanyl group and at least one epoxy group within the same molecule and a compound (b) capable of initiating cationic polymerization under irradiation by an active energy ray and/or under heat. This resist ink composition has high photosensitivity and enables the final curing by a brief heating and the cured film exhibits good physical properties.
    Type: Application
    Filed: October 29, 2001
    Publication date: January 30, 2003
    Inventors: Takeo Watanabe, Takashi Sato, Hirotaka Tagoshi
  • Publication number: 20020161068
    Abstract: The present invention provides a polymerizable composition comprising (a) an alicyclic alkane having at least one oxetanyl group and at least one epoxy group within the same molecule and (b) a compound capable of initiating cationic polymerization under irradiation of an active energy ray and/or under heat exhibits high activity in the photo- or heat-cationic ring-opening polymerization exhibiting high activity, e.g., rapid polymerizability, rapid curability, under irradiation of an active energy ray and/or under heat. The present invention also provides a polymerization product thereof.
    Type: Application
    Filed: March 26, 2002
    Publication date: October 31, 2002
    Inventors: Takeo Watanabe, Takashi Sato, Hirotaka Tagoshi
  • Patent number: 6342330
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Grant
    Filed: January 2, 2001
    Date of Patent: January 29, 2002
    Assignees: Toyo Gosei Kogyo Co., Ltd., Showa Denko K.K.
    Inventors: Masaharu Watanabe, Noriaki Tochizawa, Hirotaka Tagoshi, Tetsuhiko Yamaguchi
  • Publication number: 20010012597
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Application
    Filed: January 2, 2001
    Publication date: August 9, 2001
    Inventors: Masaharu Watanabe, Noriaki Tochizawa, Hirotaka Tagoshi, Tetsuhiko Yamaguchi
  • Publication number: 20010003633
    Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
    Type: Application
    Filed: January 2, 2001
    Publication date: June 14, 2001
    Inventors: Masaharu Watanabe, Noriaki Tochizawa, Hirotaka Tagoshi, Tetsuhiko Yamaguchi
  • Patent number: 6153185
    Abstract: Disclosed is a composition comprising a plant capable of growing in the presence of at least water and light, a nonionic water-absorptive polymer, and water, and a method of use of the composition as well as a method of fabricating a revegetation material.
    Type: Grant
    Filed: March 13, 1998
    Date of Patent: November 28, 2000
    Assignee: Showa Denko Kabushiki Kaisha
    Inventors: Minoru Takeda, Hirotaka Tagoshi, Susumu Tago
  • Patent number: 6090899
    Abstract: A high-flow concrete additive comprises a polymer of 10-100 wt % of an N-vinylacetamide, 0-50 wt % of a compound CH.sub.2 .dbd.CR.sup.3 X.sup.1 R.sup.4 SO.sub.3 X.sup.2 wherein R.sup.3 is hydrogen or methyl, R.sup.4 is alkylene of 1 to 4 carbon atoms, X.sup.1 is CONH or COO, and X.sup.2 is hydrogen, an alkali metal, ammonium salt or organic ammonium salt, and 0-40 wt % of a compound CH.sub.2 .dbd.CR.sup.5 X.sup.3 wherein R.sup.5 is hydrogen or methyl and X.sup.3 is CN, COOR.sup.6, CONH.sub.2, CONHR.sup.7, CONR.sup.8 R.sup.9, COR.sup.10, OCOR.sup.11 or OR.sup.12, in which R.sup.6 is hydrogen, an alkali metal, ammonium salt, organic ammonium salt or alkyl group of 1 to 4 carbon atoms, R.sup.7, R.sup.8 and R.sup.9 are alkyl groups of 1 to 4 carbon atoms, and R.sup.10, R.sup.11 and R.sup.12 are alkyl groups of 1 to 4 carbon atoms.
    Type: Grant
    Filed: August 7, 1996
    Date of Patent: July 18, 2000
    Assignee: Showa Denko K.K.
    Inventors: Takanori Futami, Tetsuhiko Yamaguchi, Hirotaka Tagoshi
  • Patent number: 5395895
    Abstract: A thermally reversible crosslinked resin composition comprising a specific ethylenic copolymer, a specific polyhydric alcohol and a specific reaction promoter and a molded article produced by utilizing the resin composition are disclosed. Because the resin composition and the molded article have a high reaction rate of dissociation of the crosslinking during heating and a high reaction rate of formation of the crosslinking during cooling, they can be utilized for various applications, such as melt molding and the like, as the the thermally reversible crosslinked resin composition and the thermally reversible crosslinked molded article which are substantially valuable for commercial application.
    Type: Grant
    Filed: June 17, 1993
    Date of Patent: March 7, 1995
    Assignee: Showa Denko K.K.
    Inventors: Hirotaka Tagoshi, Yasuhiro Mikawa, Masahiro Ueno, Shintaro Inazawa, Katsuaki Tsutsumi, Hiroyuki Hagi, Yukio Okamoto
  • Patent number: 5270439
    Abstract: A method of producing a curable composition containing a prepolymer having a polythioether skeleton, characterized by comprising addition reacting (A) 4,4'-bis(methacryloylthio)-diphenylsulfide having the formula (I): ##STR1## wherein R is a polyvalent organic group composed of an aliphatic or aromatic hydrocarbon and n represents an integer of 2 or more, with the functional group equivalent ratio of the mercapto groups of the component (B) (ii) to the methacryloyl groups of the component (A) being from 0.02 to 1.01, in another vinyl monomer copolymerizable with 4,4'-bis(methacryloylthio)diphenylsulfide having the above formula (I) in the presence of a base catalyst.
    Type: Grant
    Filed: September 28, 1992
    Date of Patent: December 14, 1993
    Assignee: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Satoshi Maruyama, Naoki Minorikawa, Tsutomu Arakawa, Haruo Yoshida, Hirotaka Tagoshi, Kazuto Abe
  • Patent number: 5183917
    Abstract: 4,4'-Bis(methacryloylthio)diphenylsulfide having the formula (I): ##STR1## and a curable composition characterized by comprising: (A) 4,4'-bis(methacryloylthio)diphenylsulfide having the above formula (I):(B) (i) another vinyl monomer copolymerizable with 4,4'-bis(methacryloylthio)diphenylsulfide having the above formula (I), and (ii) a polythiol represented by the formula (II):R-(SH).sub.n (II)wherein R is a polyvalent organic group and n represents an integer of 2 or more, wherein the content of the component (B)(i), when the component (B)(i) is present, in the total amount of said components (A), (B)(i) and (B)(ii) is 10 to 90% by weight, and the functional group equivalent ratio of the mercapto groups of the component (B)(ii), when the component (B)(ii) is present, to the methacryloyl groups of the component (A) is from 0.02 to 1.
    Type: Grant
    Filed: June 20, 1990
    Date of Patent: February 2, 1993
    Assignee: Showa Denko K.K.
    Inventors: Satoshi Maruyama, Naoki Minorikawa, Tsutomu Arakawa, Haruo Yoshida, Hirotaka Tagoshi, Kazuto Abe
  • Patent number: 4518756
    Abstract: Polymerizable compositions capable of giving transparent resin having a high refractive index of at least 1.57 which are useful as optical materials and glass adhesives are disclosed. The compositions comprise a mono(meth)acrylate having a biphenyl skeleton and a di(meth)acrylate having a biphenyl skeleton or a bisphenol skeleton. The compositions cure rapidly, particularly under irradiation of ultraviolet light.
    Type: Grant
    Filed: November 14, 1983
    Date of Patent: May 21, 1985
    Assignees: Showa Denko Kabushiki Kaisha, Showa Highpolymer Co., Ltd.
    Inventors: Haruo Yoshida, Hirotaka Tagoshi, Yasushi Morohashi, Toshiaki Tanikoshi