Abstract: A semiconductor device includes a first area including a logic circuit, a second area including a functional circuit, a first power line, a second power line that supplies a power to the logic circuit and the functional circuit, and a first power switch circuit connected to the first power line and the second power line, wherein the first power switch circuit includes a first transistor larger than a transistor provided in the logic circuit and being connected to the first power line and the second power line, an end cap provided in an area next to the functional circuit, and a second transistor provided between the end cap and an area including the first transistor, the second transistor being of a same size as the transistor provided in the logic circuit and being connected to the first power line and the second power line.

Abstract: A semiconductor integrated circuit device includes first and second semiconductor chips stacked one on top of the other. First power supply lines in the first semiconductor chip are connected with second power supply lines in the second semiconductor chip through a plurality of first vias. The directions in which the first power supply lines and the second power supply lines extend are orthogonal to each other.

Abstract: A semiconductor device includes a first area including a logic circuit, a second area including a functional circuit, a first power line, a second power line that supplies a power to the logic circuit and the functional circuit, and a first power switch circuit connected to the first power line and the second power line, wherein the first power switch circuit includes a first transistor larger than a transistor provided in the logic circuit and being connected to the first power line and the second power line, an end cap provided in an area next to the functional circuit, and a second transistor provided between the end cap and an area including the first transistor, the second transistor being of a same size as the transistor provided in the logic circuit and being connected to the first power line and the second power line.

Abstract: A semiconductor integrated circuit device includes first and second semiconductor chips stacked one on top of the other. First power supply lines in the first semiconductor chip are connected with second power supply lines in the second semiconductor chip through a plurality of first vias. The directions in which the first power supply lines and the second power supply lines extend are orthogonal to each other.

Abstract: A semiconductor device includes a first area including a logic circuit, a second area including a functional circuit, a first power line, a second power line that supplies a power to the logic circuit and the functional circuit, and a first power switch circuit connected to the first power line and the second power line, wherein the first power switch circuit includes a first transistor larger than a transistor provided in the logic circuit and being connected to the first power line and the second power line, an end cap provided in an area next to the functional circuit, and a second transistor provided between the end cap and an area including the first transistor, the second transistor being of a same size as the transistor provided in the logic circuit and being connected to the first power line and the second power line.

Abstract: A resin particle dispersion containing core/shell-type resin particles and water is described. A shell portion resin of the core/shell-type resin particles contains a constitutional unit derived from a (meth)acrylic acid ester containing a hydrocarbon group having from 4 to 8 carbon atoms. A core portion resin of the core/shell-type resin particles contains a constitutional unit derived from a (meth)acrylamide-based monomer whose solubility parameter lies within the range of from 17.0 to 21.0 (J/cm3)0.5 in an amount of not less than 5% by mass, and a glass transition temperature of the core portion resin is not higher than 50° C. An acid value of the core/shell-type resin particles is from 50 to 100 mgKOH/g. A process for producing the resin particle dispersion and a printing method using the resin particle dispersion is also described.

Abstract: A semiconductor device includes a first chip including a substrate and a first wiring layer formed on a first surface of the substrate; and a second wiring layer formed on a second surface of the substrate opposite to the first surface of the substrate. The second wiring layer includes a first power line to which a first power potential is applied; a second power line to which a second power potential is applied; a third power line to which a third power potential is applied; a first switch connected between the first power line and the second power line; and a second switch provided on one of the first power line or the third power line. The first chip includes a first circuit provided between the first power line and the third power line.

Abstract: A semiconductor device has: a first chip having a substrate and a first wiring layer; and a second wiring layer formed on a second surface of the substrate. The second wiring layer has a first power supply line, and a second power supply line. The first chip has a first ground line, a third power supply line, a fourth power supply line, vias formed in the substrate and connecting the first power supply line and the third power supply line, a first area in which the first ground line and the fourth power supply line are arranged, and a first circuit connected between the first ground line and the third power supply line. A switch is connected between the first power supply line and the second power supply line. In a plan view, the third power supply line, the vias, and the first circuit are arranged in the first area.

Abstract: A semiconductor device includes a chip that includes a substrate and a first interconnection layer on a surface of the substrate; and a second interconnection layer on another surface opposite to the surface of the substrate. The second interconnection layer includes a first power line having a first power potential, a second power line having a second power potential, and a switch between the first power line and the second power line. The chip includes a first grounding line, a third power line having the second power potential, a first region having the first grounding line and the third power line, a second grounding line, a fourth power line having the first power potential, and a second region having the second grounding line and the fourth power line. In plan view, the switch is between the first region and the second region.

Abstract: A semiconductor device includes first and second power supply lines formed in a first wiring layer and extending in a first direction; third and fourth power supply lines formed in a second wiring layer, extending in a second direction, and connected to the first and second power supply lines, respectively; a fifth power supply line formed in the first wiring layer; and a first power switch circuit including a transistor provided between the first and fifth power supply lines. The transistor overlaps at least one of the third and fourth power supply lines. The first power switch circuit includes first and second wirings formed in the second wiring layer, extending in the second direction, not overlapping the third and fourth power supply lines, and connected to a source of the transistor and the fifth power supply line, and to a drain and the third power supply line, respectively.

Abstract: A semiconductor device includes a first chip including a substrate and a first interconnection layer formed on a first surface of the substrate; and a second interconnection layer formed on a second surface opposite to the first surface of the substrate. The second interconnection layer includes a first power line to which a first power potential is applied, a second power line to which a second power potential is applied, and a first switch connected between the first power line and the second power line. The first chip includes a first grounding line, a third power line to which the second power potential is applied, and a first region in which the first grounding line and the third power line are disposed. In plan view, the first switch overlaps the first region.

Abstract: A semiconductor device includes a first area including a logic circuit, a second area including a functional circuit, a first power line, a second power line that supplies a power to the logic circuit and the functional circuit, and a first power switch circuit connected to the first power line and the second power line, wherein the first power switch circuit includes a first transistor larger than a transistor provided in the logic circuit and being connected to the first power line and the second power line, an end cap provided in an area next to the functional circuit, and a second transistor provided between the end cap and an area including the first transistor, the second transistor being of a same size as the transistor provided in the logic circuit and being connected to the first power line and the second power line.

Abstract: A power switch cell using vertical nanowire (VNW) FETs includes a switch element configured to be capable of switching between electrical connection and disconnection between a global power interconnect and a local power interconnect. The switch element is constituted by at least one VNW FET. The top electrode of the VNW FET constituting the switch element is connected with the global power interconnect.

Abstract: A semiconductor device includes a substrate; first and second fins protruding from the substrate; a first transistor including the first fin; a second transistor above the first transistor; and a first power supply line electrically connected to the first fin through the second fin. The first transistor includes first and second impurity areas in the first fin, and a first gate insulating film on the first fin between the first and second impurity areas. The second transistor includes a first semiconductor area above the first fin, a third impurity area in the first semiconductor area above the first impurity area, a fourth impurity area in the first semiconductor area above the second impurity area, and a second gate insulating film on the first semiconductor area between the third and fourth impurity areas. The first and second transistors have a common gate on the first and second gate insulating films.

Abstract: A semiconductor device includes a first power supply line, a second power supply line, a first ground line, a switch circuit connected to the first and the second power supply line, and a switch control circuit connected to the first ground line and the first power supply line. The switch circuit includes a first and a second transistor of a first conductive type. A first gate electrode of the first transistor is connected to a second gate electrode of the second transistor. The switch control circuit includes a third transistor of a second conductive type, and a fourth transistor of a third conductive type. A third gate electrode of the third transistor is connected to a fourth gate electrode of the fourth transistor. A semiconductor device includes a signal line that electrically connects a connection point between the third and fourth transistor to the first and second gate electrode.

Abstract: A semiconductor device includes a semiconductor substrate, a first standard cell including a first active region and a second active region, and a power switching circuit including a first switching transistor electrically connected between a first interconnect and a second interconnect over the semiconductor substrate, and including a first buffer connected to a gate of the first switching transistor, the first buffer including a third active region and a fourth active region, and wherein the first buffer adjoins, in a plan view, the first standard cell in a first direction, wherein an arrangement of the first active region matches an arrangement of the third active region in a second direction different from the first direction, and wherein an arrangement of the second active region matches an arrangement of the fourth active region in the second direction.

Abstract: The present invention relates to [1] a process for producing a metal fine particle dispersion containing metal fine particles (a) dispersed with a polymer B, including the step 1 of mixing a metal oxide A, the polymer B and a compound C with each other, in which the polymer B contains a hydrophilic group; the compound C is a dihydric alcohol represented by the general formula (1); and the metal fine particles (a) have a cumulant average particle size of not more than 50 nm, and [2] an ink containing the metal line particle dispersion obtained by the production process described in the above [1].

Abstract: The present invention relates to a water-based metal fine particle dispersion containing metal fine particles (a) dispersed with a dispersant B, in which the dispersant B contains a vinyl-based polymer (b) containing a constitutional unit derived from a hydrophobic monomer, a constitutional unit derived from a carboxy group-containing monomer and a constitutional unit derived from a polyalkylene glycol segment-containing monomer in an amount of not less than 85% by mass, the fine particles (a) have a cumulant average particle size of 2 to 50 nm, and a concentration of metal in the dispersion is 30 to 80% by mass, and a process for producing the dispersion; a metallic printing ink containing the dispersion; and a metallic printing method using the ink.

Abstract: A semiconductor device includes a first semiconductor chip, and a second semiconductor chip, wherein the first semiconductor chip includes a substrate including a first principal surface facing the second semiconductor chip and a second principal surface opposite to the first principal surface, a first power supply line and a second power supply line arranged on the second principal surface of the substrate, a power supply switch circuit arranged electrically between the first power supply line and the second power supply line, a first via arranged in the substrate to extend from the first power supply line to the first principal surface, and a second via arranged in the substrate to extend from the second power supply line to the first principal surface, wherein the second semiconductor chip includes a third power supply line connected to the first via, and a fourth power supply line connected to the second via.

Abstract: A semiconductor integrated circuit device includes first and second semiconductor chips stacked one on top of the other. First power supply lines in the first semiconductor chip are connected with second power supply lines in the second semiconductor chip through a plurality of first vias. The directions in which the first power supply lines and the second power supply lines extend are orthogonal to each other.