Abstract: A ceramic porous body including at least Si as a chemical component, the ceramic porous body being obtained by adding a porous silica powder or a porous silica-containing compound powder to a forming raw material to prepare a clay, forming the resulting ceramic clay into a specific shape, and firing the formed product. The ceramic porous body according to the present invention does not produce carbon dioxide or toxic gas during firing and allows the firing time to be reduced in comparison with the case of using a resin powder or a carbon powder as a pore-forming agent by using the porous silica powder or the porous silica-containing compound powder as the pore-forming agent during production. Moreover, a change in pore-forming characteristics or deformation of a formed product rarely occurs.

Abstract: The present invention provides a process for producing ready-to-eat chow mein, which browns a mass of fried noodles so as to be able to always constantly and reliably afford elastic feeling and fragrant flavor as if it were baked on a hot iron plate. Floor, starch, salt, water and the like are mixed to make a material. The material is kneaded. The thus kneaded material is extended and rolled to a predetermined thickness to form a noodle blank. This noodle blank is cut to a predetermined width and waved to form lines of noodles. These lines of noodle are converted to ?-state and then molded to a predetermined shape. Thereafter, they are oil fried to make a mass of noodles. The oil fried mass of noodles is baked to brown its surface until the surface of the mass of noodles has a temperature increased up to 150 degrees C. to 240 degrees C.

Abstract: The present invention provides a process for producing ready-to-eat chow mein which can afford such a feeling and fragrant flavor as experienced when we eat the chow mein baked on a hot iron plate. It mixes floor, starch, table salt, water and the like to form a material and kneads the material. The thus kneaded material is extended and rolled to a predetermined thickness to form a noodle blank. This noodle blank is cut to a predetermined width and waved to form lines of noodle. These lines of noodle are converted to ?-state with a steamer. A seasoning liquid of a predetermined concentration is sprayed to these lines of noodle and then are molded into a predetermined shape. Thereafter, they are oil fried to produce a mass of seasoned and fried noodles. This seasoned and oil fried mass of noodles is baked until it has its surface heated up to 150 degrees C. to 240 degrees C. so as to brown it.

Abstract: A ceramic porous body including at least Si as a chemical component, the ceramic porous body being obtained by adding a porous silica powder or a porous silica-containing compound powder to a forming raw material to prepare a clay, forming the resulting ceramic clay into a specific shape, and firing the formed product. The ceramic porous body according to the present invention does not produce carbon dioxide or toxic gas during firing and allows the firing time to be reduced in comparison with the case of using a resin powder or a carbon powder as a pore-forming agent by using the porous silica powder or the porous silica-containing compound powder as the pore-forming agent during production. Moreover, a change in pore-forming characteristics or deformation of a formed product rarely occurs.

Abstract: An integrated sintered body is provided having at least a first phase and a second phase. The first phase includes alumina as a main component, and the alumina contains a total amount of 12 weight percent or more and 50 weight percent or less of one or more of stabilized zirconia and partially stabilized zirconia. The second phase contains yttrium-aluminum garnet as a main component.

Abstract: The invention provides a film of an yttria-alumina complex oxide having a high peel strength with respect to a substrate. A mixed powder of powdery materials of yttria and alumina is sprayed on a substrate to form a sprayed film made of an yttria-alumina complex oxide. Preferably, the powdery material of yttria has a 50 percent mean particle diameter of not smaller than 0.1 ?m and not larger than 100 ?m, and the powdery material of alumina has a 50 percent mean particle diameter of not smaller than 0.1 ?m and not larger than 100 ?m. Preferably, the yttria-alumina complex oxide contains at least a garnet phase, and may further contain a perovskite phase.

Abstract: A ceramic member, which is usable in a state where at least a part thereof is exposed in a reactor in which halogen plasma is generated, includes a base member containing a first ceramic material, and a coating layer on a surface of the base member containing a second ceramic material more resistant to plasma etching than the first ceramic material. Further, the ceramic member includes a thick portion in a region where an etching rate of the coating layer by the halogen plasma is locally high, and a thickness (tt) of the thick portion and a thickness (tn) of a normal thickness portion other than the thick portion satisfy the following expression (1): tn<tt?(Ee/En)×tn??(1) where En: etching rate of the coating layer in the normal thickness portion; and Ee: etching rate of the coating layer in the thick portion.

Abstract: An object of the invention is to provide an yttria-alumina composite oxide film wherein peeling-off of the film from a substrate may be prevented. An intermediary layer is provided on a substrate containing at least one of alumina and yttria-alumina composite oxide as a main component. In the intermediary layer, a ratio (Y/A) of a molar ratio Y of yttria to a molar ratio A of alumina is not smaller than 0.1 and not larger than 0.9. An yttria-alumina composite oxide film is formed on the intermediary layer. A ratio (YAG (420)/M) of a peak intensity YAG (420) of a (420) plane of a garnet phase to a maximum peak intensity M of crystal phases other than the garnet phase is 2.5 or more in the yttria-alumina composite oxide film based on an X-ray diffraction measurement.

Abstract: Ceramic sintered bodies 1, 11 have first phases 3, 13 and second phases 2, 12, respectively. The first and second phases contact each other. The first phase has a thickness “TA” larger than the thickness “TB” of the second phase. 80 percent or more of particles constituting the first phase have diameters in a range of 0.2 to 3 ?m, and 80 percent or more of particles constituting the second phase have diameters in a range of 0.3 to 3 ?m.

Abstract: A ceramic member, which is usable in a state where at least a part thereof is exposed in a reactor in which halogen plasma is generated, includes a base member containing a first ceramic material, and a coating layer on a surface of the base member containing a second ceramic material more resistant to plasma etching than the first ceramic material.

Abstract: An object of the present invention is to prevent particle generation from holes formed in a ceramic member. A ceramic member 2 has a hole 20A formed therein. The hole 20A has a diameter “d” in a range of 0.05 mm to 2 mm and a length “L” of 2 mm or more. The member 2 has an inner wall surface 1 facing the hole 20A and the inner wall surface comprises an as-sintered face.

Abstract: A halogen gas plasma-resistant member to be exposed to a halogen gas plasma, includes a main body of said member, and a corrosion-resistant film formed at least a surface of said main body, wherein a peeling resistance of the corrosive film to said main body is not less than 15 MPa.

Abstract: An object of the present invention is to provide an integrated sintered body having a first phase and a second phase containing yttrium-aluminum garnet as a main component, in which the incidence of peeling of the first phase from the second phase is reduced to improve the production yield. A sintered body 1 has at least first phase 3 and second phase 2. The first phase 3 has, as a main component, alumina containing a total amount of 12 weight percent or more and 50 weight percent or less of one or more of stabilized zirconia and partially stabilized zirconia. The second phase 2 contains yttrium-aluminum garnet as a main component.

Abstract: The invention provides a film of an yttria-alumina complex oxide having a high peel strength with respect to a substrate. A mixed powder of powdery materials of yttria and alumina is sprayed on a substrate to form a sprayed film made of an yttria-alumina complex oxide. Preferably, the powdery material of yttria has a 50 percent mean particle diameter of not smaller than 0.1 &mgr;m and not larger than 100 &mgr;m, and the powdery material of alumina has a 50 percent mean particle diameter of not smaller than 0.1 &mgr;m and not larger than 100 &mgr;m. Preferably, the yttria-alumina complex oxide contains at least a garnet phase, and may further contain a perovskite phase.

Abstract: The present invention provides a ceramic structure for improving the resistance against a corrosive substance and to diffuse and supply a fluid over a larger area of the structure. A ceramic laminated article has a ceramic sintered body, and a ceramic film provided on the sintered body by means of chemical vapor deposition. A hollow surrounded by the sintered body and film, and holes in communication with the hollow and the outside are formed in the article. A filling material is filled in the recess of the sintered body and the holes are formed. The thus obtained assembly is heat treated to dissipate and remove the filling material through the communicating holes, so that the recess is left as the hollow.

Abstract: A sintered body having at least a first phase and a second phase contacting one another at an interface is produced. A shaped body having a first shaped phase and a second shaped phase is prepared. The shaped body is sintered to produce the sintered body. A slurry containing a sinterable inorganic powder, a dispersing medium and a gelling agent is filled in a mold and gelled so that the slurry is solidified to provide the first shaped phase.

Abstract: The invention provides a film of an yttria-alumina complex oxide having a high peel strength with respect to a substrate. A mixture of powdery yttria and alumina materials is sprayed on a substrate to form a sprayed yttria-alumina complex oxide film. Preferably, the powdery yttria material has a 50 percent mean particle diameter in a range of 0.1 &mgr;m to 100 &mgr;m, and the powdery alumina material has a 50 percent mean particle diameter in a range of 0.1 &mgr;m to 100 &mgr;m. Preferably, the yttria-alumina complex oxide contains at least garnet phase, and may further contain perovskite phase.

Abstract: An object of the invention is to provide an yttria-alumina composite oxide film wherein peeling-off of the film from a substrate may be prevented. An intermediary layer is provided on a substrate containing at least one of alumina and yttria-alumina composite oxide as a main component. In the intermediary layer, a ratio (Y/A) of a molar ratio Y of yttria to a molar ratio A of alumina is not smaller than 0.1 and not larger than 0.9. An yttria-alumina composite oxide film is formed on the intermediary layer. A ratio (YAG (420)/M) of a peak intensity YAG (420) of a (420) plane of a garnet phase to a maximum peak intensity M of crystal phases other than the garnet phase is 2.5 or more in the yttria-alumina composite oxide film based on an X-ray diffraction measurement.

Abstract: A film structure including a silicon carbide film formed on a surface of an aluminum nitride substrate. The substrate has a first base plane, a second base plane positioned downward with respect to the first base plane and a step plane arranged in an intersecting direction between the first base plane and the second base plane. One or more chamfered planes are arranged between the first base plane and the step plane so as to form a plurality of corner portions each having an angle larger than 130°. Alternatively, at least one round portion having a curvature radium of larger than 0.05 mm is arranged between the first base plane and the step plane.

Abstract: To prevent an exposed surface of an anticorrosive part for an etching apparatus from being corroded, even when a highly corrosive etching gas such as a chlorine-based or fluorine-based plasma gas is used, an anticorrosive part for the etching apparatus for effecting etching treatment is provided. The anticorrosive part includes an anticorrosive part substrate, and a film of silicon carbide covering that surface of the anticorrosive part substrate which is to be exposed to an etching gas, wherein the silicon carbide film is made of polycrystals of silicon carbide having a 3C crystalline system, and (111) planes of the silicon carbide polycrystals are oriented in parallel to the surface of the silicon carbide film.