Patents by Inventor Hirotatsu Fujii

Hirotatsu Fujii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for developing photosensitive resin relief printing plate
    Patent number: 6727045
    Abstract: A developing method for a photosensitive resin printing plate which can reduce the cost for treating waste liquid by using an aqueous developing liquid not containing surfactant and recycling and reusing the developing liquid. A photosensitive resin printing plate which is hardened in a prescribed pattern by exposure is developed by spraying an aqueous developing liquid comprising either water only or two phases of gas and liquid to a surface of printing plate under a high pressure (water pressure 1 to 30 MPa, gas pressure not lower than 0.1 MPa), a hygroscopic photosensitive resin mixed in a worn-out developing liquid is separated and removed by means of filter or the like, and filtrate is recycled and reused as a developing liquid.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: April 27, 2004
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventor: Hirotatsu Fujii
  • Method and apparatus for developing photosensitive resin relief printing plate
    Publication number: 20020182543
    Abstract: A developing method for a photosensitive resin printing plate which can reduce the cost for treating waste liquid by using an aqueous developing liquid not containing surfactant and recycling and reusing the developing liquid. A photosensitive resin printing plate which is hardened in a prescribed pattern by exposure is developed by spraying an aqueous developing liquid comprising either water only or two phases of gas and liquid to a surface of printing plate under a high pressure (water pressure 1 to 30 MPa, gas pressure not lower than 0.1 MPa), a hygroscopic photosensitive resin mixed in a worn-out developing liquid is separated and removed by means of filter or the like, and filtrate is recycled and reused as a developing liquid.
    Type: Application
    Filed: June 6, 2002
    Publication date: December 5, 2002
    Inventor: Hirotatsu Fujii