Patents by Inventor Hiroto Horikawa
Hiroto Horikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7466396Abstract: Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.Type: GrantFiled: October 12, 2006Date of Patent: December 16, 2008Assignee: Nikon CorporationInventors: Michael B. Binnard, Douglas C. Watson, W. Thomas Novak, Hiroto Horikawa, Yoshifumi Nakakoji, Hideaki Sakamoto
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Publication number: 20070258068Abstract: The present invention provides an exposure apparatus that can satisfactorily perform a measurement process and can accurately perform an exposure process, even if a liquid immersion method is applied to a twin stage type exposure apparatus. An exposure apparatus (EX) comprises: two substrate stages (PST1, PST2) each capable of holding and moving a substrate (P); an exposure station (STE) that exposes, through a projection optical system (PL) and a liquid (LQ), the substrate (P) held by one substrate stage (PST1); and a measuring station (STA) that measures the substrate (P) held by the other substrate stage (PST2) or the abovementioned substrate stage (PST2); and wherein, the measurement performed at the measuring station (STA) is performed in a state wherein the liquid (LQ) is disposed on the substrate stage (PST2) or the substrate (P).Type: ApplicationFiled: February 17, 2005Publication date: November 8, 2007Inventor: Hiroto Horikawa
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Publication number: 20070139635Abstract: Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.Type: ApplicationFiled: October 12, 2006Publication date: June 21, 2007Applicant: NIKON CORPORATIONInventors: Michael Binnard, Douglas Watson, W. Novak, Hiroto Horikawa, Yoshifumi Nakakoji, Hideaki Sakamoto
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Publication number: 20070030467Abstract: The present invention provides an exposure apparatus that can satisfactorily perform a measurement process and can accurately perform an exposure process, even if a liquid immersion method is applied to a twin stage type exposure apparatus. An exposure apparatus (EX) comprises: two substrate stages (PST1, PST2) each capable of holding and moving a substrate (P); an exposure station (STE) that exposes, through a projection optical system (PL) and a liquid (LQ), the substrate (P) held by one substrate stage (PST1); and a measuring station (STA) that measures the substrate (P) held by the other substrate stage (PST2) or the abovementioned substrate stage (PST2); and wherein, the measurement performed at the measuring station (STA) is performed in a state wherein the liquid (LQ) is disposed on the substrate stage (PST2) or the substrate (P).Type: ApplicationFiled: October 6, 2006Publication date: February 8, 2007Applicant: NIKON CORPORATIONInventor: Hiroto Horikawa
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Patent number: 7081946Abstract: A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a pore 70a connected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section 63, and a pore 70b connected to the suction apparatus 72 which draws out gas in the space between the lower face Ra of the reticle R and the second suction section 64. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.Type: GrantFiled: August 13, 2003Date of Patent: July 25, 2006Assignee: Nikon CorporationInventors: Tsuneyuki Hagiwara, Hiromitsu Yoshimoto, Hiroto Horikawa, Hideo Mizutani
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Publication number: 20060146312Abstract: A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision unwarrantable area outside of the precision warrantable area, a pore connected to a suction apparatus that draws out gas in a space between the lower face of the reticle and the first suction section, and a pore connected to the suction apparatus and that draws out gas in the space between the lower face of the reticle and the second suction section. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.Type: ApplicationFiled: February 23, 2006Publication date: July 6, 2006Applicant: NIKON CORPORATIONInventors: Tsuneyuki Hagiwara, Hiromitsu Yoshimoto, Hiroto Horikawa, Hideo Mizutani
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Publication number: 20050133732Abstract: An exposure method for manufacturing a liquid crystal display utilizes a scanning exposure apparatus to expose a pattern of a mask onto a glass plate. The exposure method includes a step of moving a mask stage that holds the mask in a scanning direction by a first electromagnetic actuator. The first electromagnetic actuator moves the mask stage associating with a guide member that extends in the scanning direction. The method also includes the step of moving the mask stage in a non-scanning direction different from the scanning direction by a second electromagnetic actuator. The second electromagnetic actuator moves the mask stage associating with no guide member, and a moving distance in the non-scanning direction by the second electromagnetic actuator is shorter than a moving distance in the scanning direction by the first electromagnetic actuator.Type: ApplicationFiled: January 12, 2005Publication date: June 23, 2005Applicant: NIKON CORPORATIONInventors: Toshiya Ohtomo, Hiroto Horikawa
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Publication number: 20040100624Abstract: A reticle holder 18 has; a first suction section 63 facing a precision warrantable area AR1 having a predetermined surface precision, of a lower face Ra of a reticle R; a second suction section 64 facing a precision unwarrantable area AR2 outside of the precision warrantable area AR1; a pore 70a connected to a suction apparatus which draws out gas in a space between the lower face Ra of the reticle R and the first suction section 63, and a pore 70b connected to the suction apparatus 72 which draws out gas in the space between the lower face Ra of the reticle R and the second suction section 64. As a result, the reticle can be held stably, without deteriorating the surface precision of the precision warrantable area.Type: ApplicationFiled: August 13, 2003Publication date: May 27, 2004Applicant: NIKON CORPORATIONInventors: Tsuneyuki Hagiwara, Hiromitsu Yoshimoto, Hiroto Horikawa, Hideo Mizutani
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Patent number: 6721034Abstract: It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.Type: GrantFiled: June 8, 1999Date of Patent: April 13, 2004Assignee: Nikon CorporationInventor: Hiroto Horikawa
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Patent number: 6262797Abstract: It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.Type: GrantFiled: April 27, 2000Date of Patent: July 17, 2001Assignee: Nikon CorporationInventor: Hiroto Horikawa
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Patent number: 6211946Abstract: It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.Type: GrantFiled: May 25, 1999Date of Patent: April 3, 2001Assignee: Nikon CorporationInventors: Toshiya Ohtomo, Hiroto Horikawa
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Patent number: 6124923Abstract: It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.Type: GrantFiled: January 8, 1999Date of Patent: September 26, 2000Assignee: Nikon CorporationInventor: Hiroto Horikawa
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Patent number: 5991005Abstract: A stage apparatus comprising a support device for supporting a table at its center of gravity and a drive device for driving the table at positions apart from the center of gravity of the table without contacting with the table. The stage apparatus effectively reduces stresses created in the table and/or any thermal deformation of the table. The table is connected to three pairs of table support bars on the stage through three respective plate springs so as to minimize any harmful deformation of the table, which could otherwise occur when the table is driven for motion or displacement in the Z-direction or for adjustment of the tilt of the table. The stage apparatus includes three drive units with respective drive pins for driving the stage. For example, when the three drive pins are driven simultaneously by the associated drive units, the table is caused thereby to translate along the Z-axis.Type: GrantFiled: April 9, 1997Date of Patent: November 23, 1999Assignee: Nikon CorporationInventors: Hiroto Horikawa, Yutaka Hayashi
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Patent number: 5850280Abstract: It is an object of the present invention to reduce the weight of a stage unit and suppress heat generation of the driving unit of the stage, thereby improving the surface accuracy of the stage or measurement precision of an interferometer for measuring the position of the stage. A reticle base, a scanning stage mounted on the reticle stage and moved in the scanning direction, and a fine adjustment stage mounted on the scanning stage and capable of being finely moved in the X and Y directions and in the rotational direction are provided as a reticle stage. A first electromagnetic actuator for performing driving in the scanning direction, and a second electromagnetic actuator, having a smaller thrust than that of the first electromagnetic actuator, for performing driving in a direction perpendicular to the scanning direction are provided as the driving unit of the fine adjustment stage.Type: GrantFiled: September 23, 1997Date of Patent: December 15, 1998Assignee: Nikon CorporationInventors: Toshiya Ohtomo, Hiroto Horikawa