Patents by Inventor Hiroto Tanigawa

Hiroto Tanigawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240145239
    Abstract: A manufacturing method of a semiconductor element includes forming a plurality of islands, each including a semiconductor layer containing a nitride semiconductor and a support formed on the semiconductor layer, on a sapphire substrate, joining the support to a retention substrate via an adhesive member, peeling off the semiconductor layer from the sapphire substrate by irradiating the semiconductor layer with laser light, and polishing a surface of the semiconductor layers peeled off from the sapphire substrate.
    Type: Application
    Filed: August 9, 2023
    Publication date: May 2, 2024
    Applicant: Oki Electric Industry Co., Ltd.
    Inventors: Shinya JUMONJI, Toru KOSAKA, Takahito SUZUKI, Kenichi TANIGAWA, Yusuke NAKAI, Hiroto KAWADA, Genichirou MATSUO, Yutaka KITAJIMA
  • Publication number: 20240145631
    Abstract: A manufacturing method of a semiconductor element includes forming a plurality of semiconductor layers on a sapphire substrate, each of the semiconductor layers having a first surface on the sapphire substrate side and a second surface on the opposite side, joining the second surfaces of the plurality of semiconductor layers to a retention member via an adhesive member, peeling off the plurality of semiconductor layers from the sapphire substrate by irradiating the first surfaces of the plurality of semiconductor layers with laser light, and polishing the first surfaces of the plurality of semiconductor layers. At least one semiconductor layer among the plurality of semiconductor layers includes a polishing indication part extending from the second surface toward the first surface. The polishing is executed until the polishing indication part is exposed to the polished surface.
    Type: Application
    Filed: August 8, 2023
    Publication date: May 2, 2024
    Applicant: Oki Electric Industry Co., Ltd.
    Inventors: Shinya JUMONJI, Toru KOSAKA, Takahito SUZUKI, Kenichi TANIGAWA, Yusuke NAKAI, Hiroto KAWADA, Genichirou MATSUO, Yutaka KITAJIMA
  • Publication number: 20220194913
    Abstract: Provided is an alicyclic epoxy compound product used in applications for forming a cured product excellent in transparency and heat resistance. An alicyclic epoxy compound product of the present disclosure has a purity of a compound represented by Formula (1) of 85 wt. % or greater; and a total content of a compound represented by Formula (a) and a compound represented by Formula (b) of 0.5 wt. % or less, where X represents a single bond or a linking group. The alicyclic epoxy compound product of the present disclosure can be produced through subjecting a compound represented by Formula (1?) to a dehydration reaction to obtain a compound represented by Formula (1?), and reacting the resulting compound represented by Formula (1?) with an organic peracid.
    Type: Application
    Filed: April 10, 2020
    Publication date: June 23, 2022
    Applicant: DAICEL CORPORATION
    Inventors: Hiroko INOUE, Hiroto TANIGAWA
  • Patent number: 10611876
    Abstract: Provided is an epoxy-amine adduct. The epoxy-amine adduct is a compound that may be a compound I containing two or more amino groups per molecule, a compound corresponding to the compound I, except being modified with a compound II-1 containing two or more (meth)acryloyl groups per molecule, a compound corresponding to the compound I, except being modified with a lactone II-2, or a salt of the compound I. The compound I is an adduct between an epoxide (A) containing two or more cycloaliphatic epoxy groups per molecule and an amine (B) containing two or more amino groups per molecule. The compound I includes a constitutional unit represented by Formula (I) and a constitutional unit represented by Formula (II) and contains amino groups at both ends.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: April 7, 2020
    Assignee: DAICEL CORPORATION
    Inventors: Hiroko Inoue, Hiroto Tanigawa, Masanori Sakane, Toshihiko Nijukken, Tomio Ozaki, Tomoyuki Ono, Hiroshi Sakurai, Hiroshi Kimura, Takeshi Naito
  • Publication number: 20170029557
    Abstract: Provided is a compound that contributes to better adhesion between resins and additive materials in polymer composites and is readily blendable with another component such as a resin. Related is an epoxy-amine adduct. The epoxy-amine adduct is a compound selected from the group consisting of a compound I containing two or more amino groups per molecule, a compound corresponding to the compound I, except being modified with a compound II-1 containing two or more (meth)acryloyl groups per molecule, a compound corresponding to the compound I, except being modified with a lactone II-2, and a salt of the compound I. The compound I is an adduct between an epoxide (A) containing two or more cycloaliphatic epoxy groups per molecule and an amine (B) containing two or more amino groups per molecule. The compound I includes a constitutional unit represented by Formula (I) and a constitutional unit represented by Formula (II) and contains amino groups at both ends.
    Type: Application
    Filed: December 16, 2014
    Publication date: February 2, 2017
    Applicant: DAICEL CORPORATION
    Inventors: Hiroko INOUE, Hiroto TANIGAWA, Masanori SAKANE, Toshihiko NIJUKKEN, Tomio OZAKI, Tomoyuki ONO, Hiroshi SAKURAI, Hiroshi KIMURA, Takeshi NAITO
  • Patent number: 7732627
    Abstract: A high-purity cycloaliphatic diepoxy compound of General Formula (II) is an epoxidized product of a cycloaliphatic diolefinic compound of General Formula (I) having an isomer content as detected in gas chromatography (GC) of 15% or less: wherein X represents a bivalent group selected from the group consisting of, for example, O, S, —SO—, —SO2—, —CH2—, and —C(CH3)2—; and R1 to R18 may be the same as or different from each other and each represent hydrogen atom, a halogen atom, a hydrocarbon group which may contain oxygen atom or a halogen atom, or an alkoxy group which may be substituted. Such a high-purity cycloaliphatic diepoxy compound is prepared by producing the cycloaliphatic diolefinic compound through distillation, epoxidizing the compound with an aliphatic percarboxylic acid containing substantially no water, carrying out desolvation, and further purifying the epoxidized compound through distillation.
    Type: Grant
    Filed: December 27, 2005
    Date of Patent: June 8, 2010
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Hideyuki Takai, Hiroto Tanigawa, Katsuya Maruo
  • Publication number: 20080045729
    Abstract: A high-purity cycloaliphatic diepoxy compound of General Formula (II) is an epoxidized product of a cycloaliphatic diolefinic compound of General Formula (I) having an isomer content as detected in gas chromatography (GC) of 15% or less: wherein X represents a bivalent group selected from the group consisting of, for example, O, S, —SO—, —SO2—, —CH2—, and —C(CH3)2—; and R1 to R18 may be the same as or different from each other and each represent hydrogen atom, a halogen atom, a hydrocarbon group which may contain oxygen atom or a halogen atom, or an alkoxy group which may be substituted. Such a high-purity cycloaliphatic diepoxy compound is prepared by producing the cycloaliphatic diolefinic compound through distillation, epoxidizing the compound with an aliphatic percarboxylic acid containing substantially no water, carrying out desolvation, and further purifying the epoxidized compound through distillation.
    Type: Application
    Filed: December 27, 2005
    Publication date: February 21, 2008
    Inventors: Hideyuki Takai, Hiroto Tanigawa, Katsuya Maruo
  • Patent number: 6610638
    Abstract: The present invention No. I is to obtain a high purity 3-alkoxy-1-propanol having the content of alcoholic impurities of not more than 0.3% by weight by allowing to react acrolein with a linear or branched alcohol having a carbon number of 1-4 using acrolein having the content of propionaldehyde of not more than 1% by weight as a raw material, a 3-alkoxy-1-propanol is produced by a hydrogenation reaction using hydrogen of a reaction mass under the presence of a catalyst, followed by recovering through a distillation of the 3-alkoxy-1-propanol having the content of alcoholic impurities of not more than 0.3% by weight from a crude solution in the hydrogenation reaction.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: August 26, 2003
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Hiroto Tanigawa, Hiroto Miyake, Hiroshi Koyama, Akihiko Fujita, Katsuya Maruo
  • Publication number: 20020183564
    Abstract: An alicyclic unsaturated alcohol (for example, tetrahydrobenzyl alcohol) having the purity of 99% by weight or more, the water content of 0.1% by weight or less and the acid value of 0.1 mg KOH/g or less can be produced, with high selectivity, by hydrogenating using an unsaturated cyclic aldehyde having the acid value of 10 mg KOH/g or less as a raw material; terminating the hydrogenation in the conversion of 70 to 99.8%; and rectifying the reaction product containing the unreacted unsaturated cyclic aldehyde. The high purity alicyclic unsaturated alcohol is useful as raw material chemicals for synthesizing drugs, agricultural chemicals, perfumes, and dyes etc.
    Type: Application
    Filed: May 30, 2002
    Publication date: December 5, 2002
    Inventors: Hiroto Tanigawa, Koichi Okumura, Masaya Uenoya, Kango Fujitani, Yoshihiro Kihara
  • Patent number: 6482995
    Abstract: An alicyclic unsaturated alcohol (for example, tetrahydrobenzyl alcohol) having the purity of 99% by weight or more, the water content of 0.1% by weight or less and the acid value of 0.1 mg KOH/g or less can be produced, with high selectivity, by hydrogenating using an unsaturated cyclic aldehyde having the acid value of 10 mg KOH/g or less as a raw material; terminating the hydrogenation in the conversion of 70 to 99.8%; and rectifying the reaction product containing the unreacted unsaturated cyclic aldehyde. The high purity alicyclic unsaturated alcohol is useful as raw material chemicals for synthesizing drugs, agricultural chemicals, perfumes, and dyes etc.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: November 19, 2002
    Assignee: Daicel Chemical Industries, Ltd
    Inventors: Hiroto Tanigawa, Koichi Okumura, Masaya Uenoya, Kango Fujitani, Yoshihiro Kihara
  • Patent number: 6384247
    Abstract: Heliotropin is oxidized with a percarboxylic acid in the presence of formic acid and an optionally added organic solvent, to thereby produce sesamol at high efficiency while suppressing by-production of heliotropic acid.
    Type: Grant
    Filed: June 15, 2001
    Date of Patent: May 7, 2002
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Hiroto Tanigawa, Kenji Oka
  • Publication number: 20020016479
    Abstract: Heliotropin is oxidized with a percarboxylic acid in the presence of formic acid and an optionally added organic solvent, to thereby produce sesamol at high efficiency while suppressing by-production of heliotropic acid.
    Type: Application
    Filed: June 15, 2001
    Publication date: February 7, 2002
    Inventors: Hiroto Tanigawa, Kenji Oka
  • Patent number: 5648531
    Abstract: A process for continuously producing acetic anhydride alone or acetic anhydride and acetic acid by reacting methyl acetate and/or dimethyl ether and, optionally, water and/or methanol, with carbon monoxide alone or carbon monoxide and hydrogen in the presence of a rhodium compound and methyl iodide as principal catalysts. Trace impurities causative of tar formation are distilled and separated in an evaporator and/or a subsequent refining step to remove the same. The removal of the trace impurities causative of tar formation serves to decrease the amount of tar formed as an impurity.
    Type: Grant
    Filed: March 22, 1995
    Date of Patent: July 15, 1997
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yoshiaki Morimoto, Hiroto Tanigawa, Kazuyuki Akita
  • Patent number: 5516735
    Abstract: A concentrated catalyst solution provided in the carbonylation reaction in which methyl acetate or dimethyl ether is chemically bonded with carbon monoxide in the presence of a catalyst system comprising a rhodium compound and an alkali metal iodide to produce acetic anhydride is subjected to a carbonylation treatment with carbon monoxide or a mixture of carbon monoxide and hydrogen before it is applied to a process for separating the tar contained in the catalyst solution, thereby increasing the iodide ion content of the catalyst solution, thus enabling the rhodium compound to be stabilized.When the concentration of the iodide ion in the concentrated catalyst solution is increased by this method, there is no possibility of the balances between the rhodium concentration and, the alkali metal concentration and the iodine concentration of the carbonylation reaction system being disturbed even when the catalyst solution as reprocessed is returned to the carbonylation reaction system.
    Type: Grant
    Filed: October 21, 1994
    Date of Patent: May 14, 1996
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Hiroto Tanigawa
  • Patent number: 5385875
    Abstract: A concentrated catalyst solution used in a carbonylation reaction in which methyl acetate or dimethyl ether is chemically bonded with carbon monoxide in the presence of a catalyst system comprising a rhodium compound and an alkali metal iodide to produce acetic anhydride is subjected to a carbonylation treatment with carbon monoxide, or a mixture of carbon monoxide and hydrogen, before it is applied to a process for separating the tar contained in the catalyst solution, thereby increasing the iodide ion content of the catalyst solution and enabling the rhodium compound to be stabilized.The balances between the rhodium concentration, the alkali metal concentration and the iodine concentration of the carbonylation reaction system are not disturbed, even when the catalyst solution as reprocessed is returned to the carbonylation reaction system.
    Type: Grant
    Filed: January 24, 1994
    Date of Patent: January 31, 1995
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Hiroto Tanigawa
  • Patent number: 5232884
    Abstract: A process for producing a carbonic acid ester which comprises reacting an alcohol with carbon monoxide and oxygen in the presence of a catalyst comprising a compound of divalent copper is disclosed, wherein the catalyst deactivated as a result of the carbonic acid ester-producing reaction is regenerated by subjecting a reaction mixture or a concentrate thereof containing the deactivated catalyst to water-replacement treatment, followed by heat treatment and weak-acid treatment.
    Type: Grant
    Filed: June 30, 1992
    Date of Patent: August 3, 1993
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Hiroto Tanigawa