Patents by Inventor Hirotoshi ANDO

Hirotoshi ANDO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240288678
    Abstract: An object is to provide an exposure method and an exposure device for obtaining a photo-alignment film where the accuracy of an alignment pattern is high, and a method of forming an optically-anisotropic layer. In a case where linearly polarized light is focused in a ring shape with an optical member and a film including a compound having a photo-aligned group is exposed, while rotating a polarization direction of the polarized light, the film and the optical member are relatively moved in a direction tilted with respect to an optical axis of the optical member.
    Type: Application
    Filed: April 23, 2024
    Publication date: August 29, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Hirotoshi ANDO, Takehiko HARASAWA, Satoshi NAGANO, Yasuhiro SEKIZAWA
  • Publication number: 20240248405
    Abstract: Provided is an exposure method and an exposure device for obtaining a photo-alignment film where the accuracy of an alignment pattern is high, and a method of manufacturing an optically-anisotropic layer. Provided is an exposure method in which linearly polarized light is focused in a ring shape with an optical member to expose a film including a compound having a photo-aligned group, the method including: an exposure step of relatively moving the film and the optical member in an optical axis direction of the optical member while rotating a polarization direction of the linearly polarized light.
    Type: Application
    Filed: April 8, 2024
    Publication date: July 25, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Hirotoshi ANDO, Takehiko HARASAWA, Satoshi NAGANO, Yasuhiro SEKIZAWA
  • Patent number: 11314087
    Abstract: There are provided a projection image-displaying member, a windshield glass, and a head-up display system in which both high visible light transmittance and good tint of a screen image displayed are achieved. The projection image-displaying member has a selectively reflecting layer that wavelength-selectively reflects light. The selectively reflecting layer has a maximum reflectivity in a wavelength range of 700 to 850 nm at an incidence angle of 5° and has a peak with a reflectivity of 15% or more in a wavelength range of 470 to 540 nm. The selectively reflecting layer further has two or more peaks of reflectivity in a wavelength range of 540 to 700 nm.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: April 26, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Hirotoshi Ando, Wataru Majima, Akihiro Anzai, Katsuyuki Takada, Kenji Hayashi
  • Publication number: 20200326539
    Abstract: There are provided a projection image-displaying member, a windshield glass, and a head-up display system in which both high visible light transmittance and good tint of a screen image displayed are achieved. The projection image-displaying member has a selectively reflecting layer that wavelength-selectively reflects light. The selectively reflecting layer has a maximum reflectivity in a wavelength range of 700 to 850 nm at an incidence angle of 5° and has a peak with a reflectivity of 15% or more in a wavelength range of 470 to 540 nm. The selectively reflecting layer further has two or more peaks of reflectivity in a wavelength range of 540 to 700 nm.
    Type: Application
    Filed: June 29, 2020
    Publication date: October 15, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Hirotoshi ANDO, Wataru MAJIMA, Akihiro ANZAI, Katsuyuki TAKADA, Kenji HAYASHI
  • Publication number: 20190079304
    Abstract: A half mirror includes an observation surface, a molded resin layer, and a polarization reflection plate in this order, at least one high-Re retardation film is included between the observation surface and the polarization reflection plate, a total front phase difference of the high-Re retardation film is 3,000 nm or greater, and a first high-Re retardation film is included as the high-Re retardation film between the observation surface and the molded resin layer.
    Type: Application
    Filed: November 2, 2018
    Publication date: March 14, 2019
    Applicant: FUJIFILM Corporation
    Inventors: Hirotoshi ANDO, Takao TAGUCHI, Mikio TOMARU