Patents by Inventor Hirotoshi Nakanishi
Hirotoshi Nakanishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11948958Abstract: The solid-state imaging element includes a photoelectric converter, a first separator, and a second separator. The photoelectric converter is configured to perform photoelectric conversion of incident light. The first separator configured to separate the photoelectric converter is formed in a first trench formed from a first surface side. The second separator configured to separate the photoelectric converter is formed in a second trench formed from a second surface side facing a first surface. The present technology is applicable to an individual imaging element mounted on, e.g., a camera and configured to acquire an image of an object.Type: GrantFiled: June 9, 2022Date of Patent: April 2, 2024Assignee: SONY GROUP CORPORATIONInventors: Hideyuki Honda, Tetsuya Uchida, Toshifumi Wakano, Yusuke Tanaka, Yoshiharu Kudoh, Hirotoshi Nomura, Tomoyuki Hirano, Shinichi Yoshida, Yoichi Ueda, Kosuke Nakanishi
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Publication number: 20100089439Abstract: Disclosed is a compound which is an organic semiconductor material having excellent charge transport property. Specifically, disclosed is a compound represented by the following formula (1). (In the formula (1), R1-R4 independently represent a hydrogen atom, or a group selected from the group consisting of alkyl groups having 1-18 carbon atoms and groups represented by the following formula (2): R7?O—R8?a??(2) (2) (wherein R7 represents an alkyl group having 1-18 carbon atoms; R8 represents an alkylene group having 1-20 carbon atoms; a represents an integer of 1-5, and when a is 2 or more, R8's may be the same as or different from each other), and at least one of R1-R4 represents a group represented by the formula (2); R5 and R6 independently represent an alkyl group having 1-18 carbon atoms; and m and n independently represent an integer of 0-4.Type: ApplicationFiled: February 26, 2007Publication date: April 15, 2010Inventors: Yasunori Uetani, Jun Fujiwara, Hirotoshi Nakanishi
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Publication number: 20090039765Abstract: A light emitting polymer composition comprising a light emitting polymer and a compound selected from the following formulae (1a) to (1d): (wherein, X represents an atom or atomic group forming a 5-membered or 6-membered ring together with four carbon atoms on two benzene rings in the formula, Q and T represent each independently a hydrogen atom, halogen atom, alkyl group, alkyloxy group, alkylthio group, aryl group, aryloxy group, arylthio group, arylalkyl group, arylalkyloxy group, arylalkylthio group, alkenyl group, alkynyl group, arylalkenyl group, arylalkynyl group, substituted silyloxy group, substituted silylthio group, substituted silylamino group, substituted amino group, amide group, acid imide group, acyloxy group, mono-valent heterocyclic group, heteroaryloxy group, heteroarylthio group, cyano group or nitro group).Type: ApplicationFiled: August 23, 2005Publication date: February 12, 2009Inventors: Yasunori Uetani, Nobuhiko Shirasawa, Hirotoshi Nakanishi
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Patent number: 7220532Abstract: The present invention provides a chemical amplification type positive resist composition comprising a nitrogen containing compound of the formula (VIa) or (VIb); resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and an acid generator of the formula (I)Type: GrantFiled: September 9, 2003Date of Patent: May 22, 2007Assignee: Sumitomo Chemical Company, LimitedInventors: Yoshiyuki Takata, Isao Yoshida, Hirotoshi Nakanishi
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Publication number: 20070020479Abstract: A light-emitting polymer composition comprising a light-emitting polymer and an ion pair, wherein the ion pair has a negative ion of a specific structure in which one group 13 atom and is bonding to an aryl group having an electron-withdrawing group, or a heterocyclic group having an electron-withdrawing group, directly or through a connecting group; or two or more group 13 atoms, and all the atoms are respectively bonding to an aryl group having an electron-withdrawing group, or a heterocyclic group having an electron-withdrawing group, directly or through a connecting group.Type: ApplicationFiled: May 11, 2004Publication date: January 25, 2007Inventors: Yasunori Uetani, Akira Kamabuchi, Satoshi Kobayashi, Hirotoshi Nakanishi
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Publication number: 20040053171Abstract: The present invention provides a chemical amplification type positive resist composition comprisingType: ApplicationFiled: September 9, 2003Publication date: March 18, 2004Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yoshiyuki Takata, Isao Yoshida, Hirotoshi Nakanishi
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Patent number: 5714620Abstract: A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.Type: GrantFiled: August 27, 1996Date of Patent: February 3, 1998Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5591871Abstract: A bislactone compound represented by the general formula (I): ##STR1## wherein R.sub.1 and R.sub.2 each independently represent a hydrogen atom or an alkyl group having 6 or less carbon atoms, and R.sub.3, R.sub.4, R.sub.5 and R.sub.6 each independently represent a hydrogen atom, a hydroxy group or an alkyl group having 6 or less carbon atoms, which is useful as a stabilizer for polymers and as a raw material of a positive type resist:a process for producing the bislactone compound; anda positive resist composition comprising the bislactone compound.Type: GrantFiled: August 28, 1995Date of Patent: January 7, 1997Assignee: Sumitomo Chemical Co., LtdInventors: Naoko Suzuki, Hirotoshi Nakanishi, Kyouko Nagase
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Patent number: 5587492Abstract: A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.Type: GrantFiled: April 18, 1995Date of Patent: December 24, 1996Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5556995Abstract: A process for preparing the polyhydric phenol compounds represented by the formula (I): ##STR1## (wherein R.sub.1, R.sub.2 and R.sub.3 represent independently hydrogen atom, alkyl group, etc.) which comprises subjecting the compounds represented by the formula (II): ##STR2## (wherein R.sub.1, R.sub.2 and R.sub.3 are as defined above) to a condensation reaction with pyrogallol in the presence of an organic solvent and an acid catalyst.Type: GrantFiled: January 26, 1995Date of Patent: September 17, 1996Assignee: Sumitomo Chemical Co., Ltd.Inventors: Naoko Suzuki, Hirotoshi Nakanishi, Jun Tomioka
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Patent number: 5436107Abstract: A positive resist composition which comprises, in admixture, an alkali-soluble resin; at least one quinone diazide sulfonate of a polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group; anda quinone diazide sulfonate of a phenol compound of the formula ##STR2## wherein R.sub.6 to R.sub.10 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.6 and R.sub.7 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group.Type: GrantFiled: March 18, 1992Date of Patent: July 25, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa, Ayako Ida
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Patent number: 5413895Abstract: A positive resist composition comprising an alkali-soluble resin containing a novolak resin which is obtained by a condensation reaction of a phenol compound and a carbonyl compound and has an area in a GPC pattern of a range in that a molecular weight as converted to polystyrene is not larger than 900 not exceeding 20% of a whole pattern area excluding the unreacted phenol compound, a quinonediazide compound and a polyphenol compound of the formula: ##STR1## in which R.sub.1 and R.sub.2 are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a group: --OCOR.sub.3 in which R.sub.3 is an alkyl group or a phenyl group, x and y are independently an integer of 1 to 3, and m is an integer of 0 to 4, wherein a weight ratio of said polyphenol compound (I) to said alkali-soluble resin is from 3:10 to 5:10, which is excellent in heat resistance, sensitivity, resolution and a depth of focus and leaves no scum after development.Type: GrantFiled: August 18, 1992Date of Patent: May 9, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Jun Tomioka, Koji Kuwana, Hirotoshi Nakanishi, Yasunori Uetani, Ayako Ida
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Patent number: 5407778Abstract: A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid diester of at least one member selected from the phenol compounds represented by the following general formulas: ##STR1## wherein R.sub.1 and R.sub.2 each represent hydrogen, halogen, --OCOR.sub.3, alkyl or alkoxy in which R.sub.3 represents alkyl or phenyl, x and y each represent 1, 2 or 3, and R, R.sub.o, R' and R.sub.o ' each represent hydrogen atom, alkyl or phenyl group; wherein the content of said diester is 50% or greater based on the total light-sensitive quinonediazide material. This composition is excellent in the balance between properties such as resolution, profile and depth of focus.Type: GrantFiled: May 13, 1993Date of Patent: April 18, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Jun Tomioka, Hirotoshi Nakanishi
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Patent number: 5407779Abstract: A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid ester of at least one phenol compound represented by the following general formulas: ##STR1## wherein R.sub.1 represents hydrogen, halogen, or the like; R.sub.3 represents alkyl or phenyl; x represents 1-3; Q.sub.1 to Q.sub.12 represent hydrogen, alkyl or phenyl; and Z.sub.1 to Z.sub.5 represent the groups of the following formulas: ##STR2## wherein R.sub.2 is hydrogen, halogen or the like; R.sub.3 is as defined above; y is 1-3; and p is 0 or 1. This positive resist composition is excellent in the balance between properties such as resolution, profile, depth of focus, etc.Type: GrantFiled: June 4, 1993Date of Patent: April 18, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Jun Tomioka, Hirotoshi Nakanishi
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Patent number: 5378586Abstract: A positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, first and second quinone diazide sulfonic acid esters of a phenol compound, wherein(a) the first ester is a quinone diazide sulfonic acid diester of a phenol compound having not less than three hydroxyl groups which exhibits a pattern area that is not less than 40% of all pattern areas corresponding to the sensitizer in a high pressure liquid chromatography (HPLC) pattern measured with a primary detector using UV light having a wavelength of 254 nm, and(b) the second ester is a quinone diazide sulfonic acid ester that is a complete ester of a phenol compound having not less than two hydroxyl groups which exhibits a pattern area corresponding to not less than 5% and is less than 60% of all pattern areas corresponding to the sensitizer in the HPLC pattern.Type: GrantFiled: November 16, 1993Date of Patent: January 3, 1995Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Fumio Oi
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Patent number: 5374742Abstract: A positive resist composition comprising an alkali-soluble resin, a quinone diazide compound and a specific hydroxyl group-containing compound can improve sensitivity without deterioration of heat resistance and film thickness retention.Type: GrantFiled: November 8, 1993Date of Patent: December 20, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Hirotoshi Nakanishi
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Patent number: 5362598Abstract: A photoresist composition which comprises a compound of the general formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR.sub.4, --O--R.sub.5, --OSi(R.sub.6).sub.3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R.sub.4, R.sub.5 and R.sub.6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent --CN, --COOR.sub.7, --CONR.sub.8 R.sub.9, ##STR2## R.sub.7 represents an alkyl group; R.sub.8 and R.sub.9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R.sub.Type: GrantFiled: October 6, 1993Date of Patent: November 8, 1994Assignee: Sumitomo Chemical Co., Ltd.Inventors: Naoki Takeyama, Yasunori Uetani, Hirotoshi Nakanishi, Ryotaro Hanawa
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Patent number: 5290657Abstract: A positive resist composition comprising an alkali-soluble resin, a quinone diazide compound and a specific hydroxyl group-containing compound can improve sensitivity without deterioration of heat resistance and film thickness retention.Type: GrantFiled: August 15, 1991Date of Patent: March 1, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Hirotoshi Nakanishi
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Patent number: 5290656Abstract: A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group; X is ##STR2## in which R.sub.1 and R.sub.2 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo-alkyl group, an alkoxy group or an aryl group, provided that when at least one of R.sub.1 and R.sub.Type: GrantFiled: January 19, 1993Date of Patent: March 1, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Makoto Hanabata, Hirotoshi Nakanishi, Koji Kuwana, Yukio Hanamoto, Fumio Oi, Jun Tomioka
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Patent number: 5283155Abstract: A positive resist composition which comprises an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR1## wherein Y.sub.1, Y.sub.2, Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are independently a hydrogen atom, a hydroxyl group, a C.sub.1 -C.sub.4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y.sub.1 and Y.sub.2 is a hydroxyl group, and at least two of Z.sub.1 to Z.sub.7 are hydroxyl groups, and R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are independently a hydrogen atom, a C.sub.1 -C.sub.10 alkyl group, a C.sub.1 -C.sub.4 alkenyl group, a cycloalkyl group or an aryl group, which composition has a high .gamma.-value.Type: GrantFiled: June 11, 1991Date of Patent: February 1, 1994Assignee: Sumitomo Chemical Company, LimitedInventors: Yasunori Uetani, Hirotoshi Nakanishi, Yasunori Doi