Abstract: A power transmission system having a first resonant element with a resonant frequency, a signal generator that generates an electrical power signal with a predetermined frequency that is the same as the resonant frequency of the first resonator, and a driven element that supplies the electrical power signal to the first resonator via magnetic field resonance coupling. A second resonator having a resonant frequency approximately the same as that of the first resonator can be positioned to receive the power from the first resonator. A magnetic coupling circuit can be magnetic field resonance couple to the first and second resonators for transferring the electrical power signal between them.

Abstract: A noncontact power feed system includes: a noncontact power feed apparatus including a power feed resonance device to supply alternate-current power to an electronic apparatus by resonance in a noncontact manner, and an alternate-current power source section to generate the alternate-current power and supply it to the power feed resonance device; a noncontact relay apparatus including a relay resonance device to receive the alternate-current power and relay it to another electronic apparatus by resonance in a noncontact manner, a relay-side rectifier circuit to form direct-current power for output, and a movement means for moving the noncontact relay apparatus by the direct-current power; and at least one noncontact power reception apparatus including a power reception resonance device to receive the alternate-current power by magnetic field resonance in a noncontact manner, a power-reception-side rectifier circuit to form direct-current power for output, and a load means driven by the direct-current power.

Abstract: Disclosed herein is a wireless charging system, including: a primary device that includes a power transmitter adapted to transmit power wirelessly; and a secondary device that includes a power receiver adapted to receive power transmitted wirelessly from the power transmitter, wherein the secondary device also includes a sensor adapted to detect any anomaly in the power transmission path between the power transmitter and receiver.

Abstract: In an electrical power transmission system according to the present invention, a frequency generator outputs electrical power of an electrical signal having approximately the same frequency component as a resonant frequency of a resonant element to the resonant element via a driven element. The resonant element is an element having impedance and capacitance and generates a magnetic field by the electrical signal from the frequency generator. A magnetic field coupling circuit is a circuit having the same resonant frequency as the resonant element and becomes coupled by magnetic field resonance with the resonant element. The magnetic field coupling circuit causes magnetic field coupling even with another resonant element and transmits electrical power from the resonant element to the other resonant element. The other resonant element outputs electrical power transmitted through the magnetic field coupling circuit to a rectifier circuit via a driven element.

Abstract: Disclosed herein is a wireless power feed system including a power feed device, and a power receiving device configured to receive power transmitted from the power feed device. The power feed device includes a power generator to generate power that should be fed, and a resonant element fed with power generated by the power generator. The power receiving device includes a power receiving element to receive power transmitted from the power feed device, and a matching unit including a function for impedance matching at a connecting part between the power and a load of the power receiving element.

Abstract: A noncontact power feed system includes: a noncontact power feed apparatus including a power feed resonance device to supply alternate-current power to an electronic apparatus by resonance in a noncontact manner, and an alternate-current power source section to generate the alternate-current power and supply it to the power feed resonance device; a noncontact relay apparatus including a relay resonance device to receive the alternate-current power and relay it to another electronic apparatus by resonance in a noncontact manner, a relay-side rectifier circuit to form direct-current power for output, and a movement means for moving the noncontact relay apparatus by the direct-current power; and at least one noncontact power reception apparatus including a power reception resonance device to receive the alternate-current power by magnetic field resonance in a noncontact manner, a power-reception-side rectifier circuit to form direct-current power for output, and a load means driven by the direct-current power.

Abstract: A method of evaluating a shaped beam generated by a charged beam writer, comprises the steps of: a first step of shaping line beams by dividing into 1/n one side of the shaped beam having a dimension "a" in an x direction and a dimension "b" in a y direction perpendicular to the x direction, where n is the number of divisions; a second step of irradiating the shaped line beam upon a surface of the sample or the movable stage for a constant time or longer; a third step of shaping a beam by adding a bias value .delta.

Abstract: An exposure mask for lithography, a method of manufacturing the same, and an exposure method using the same are disclosed. A light-transmitting opening of the exposure mask has a main light-transmitting region located in the middle of the opening and having a first optical path length, and phase shift regions adjacent to a light-shielding layer and having a second optical path length, different from the first optical path length. Light transmitted through each phase shift region interferes with light transmitted through the main light-transmitting region at the edges of the light-transmitting opening, thus enabling a sharp photo-intensity distribution of total transmitted light to be obtained. As a result, the resolution of the exposure mask is improved.

Abstract: A reflection mask has a reflection pattern which is formed on a required portion of the surface of a substrate and on which a voltage sufficient to reflect incident electrically charged beams is applied, and a non-reflection pattern which is formed on the other portion of surface of the substrate and on which a voltage sufficient to emit the electrically charged beams to the non-reflection pattern is applied.

Abstract: An exposure mask for lithography, a method of manufacturing the same, and an exposure method using the same are disclosed. A light-transmitting opening of the exposure mask has a main light-transmitting region located in the middle of the opening and having a first optical path length, and phase shift regions adjacent to a light-shielding layer and having a second optical path length, different from the first optical path length. Light transmitted through each phase shift region interferes with light transmitted through the main light-transmitting region at the edges of the light-transmitting opening, thus enabling a sharp photo-intensity distribution of total transmitted light to be obtained. As a result, the resolution of the exposure mask is improved.

Abstract: A method of correcting astigmatism of a variable shaped beam uses a charged beam lithographic apparatus having a deflector for generating the shaped beam, a focus correction coil for adjusting a focus of the shaped beam, and astigmatism correction coils for correcting the astigmatism of the shaped beam.

Abstract: The dimensions of the cross section of an electron beam emitted from a beam source are changed by deflectors interposed between a pair of aperture masks and are position-corrected by beam position correction deflectors. The electron beam is then irradiated onto a wafer. In accordance with beam dimension signals from a CPU, a correction signal generating circuit supplies correction signals to a beam position correction circuit. The circuit supplies beam position correction signals to the deflectors.

Abstract: A method of positioning a beam to a specific portion of a semiconductor wafer is disclosed. In this method, the positions of two positioning marks formed on the wafer are measured. The position of another of the marks is calculated. Then, an actual position of the mark is measured. The calculated position and the actual position are compared with each other. It is judged whether or not the mark satisfies a predetermined condition. When the mark satisfies the predetermined condition, the specific portion of the semiconductor wafer is determined using the actual position of the mark. When it does not satisfy the predetermined condition, the specific area is determined using the position calculated using the positions of the marks around the mark.

Abstract: Disclosed is a method for measuring the position of a silicon wafer as a workpiece to be exposed. The method is suitably used in an electron beam exposure system. A wafer has a plurality of chip alignment marks which respectively designate a plurality of chip field areas, included in a dicing line area. When the wafer is contained ion a holder and is fixed in the exposure system, edge portions of the wafer are partially scanned with the electron beam to roughly measure the position of the wafer. In accordance with this wafer position data, a wafer surface portion required for detecting only the marks is defined within the dicing line area. In the mark detection with the electron beam, the electron beam irradiates only the defined wafer surface portion of the wafer surface, thereby providing highly precise measurement of the wafer position and avoiding undesirable irritation of the circuit formation area.

Abstract: An electron beam exposure system has first and second apertures through which is passed an electron beam emitted from an electron gun. A rectangular image formed by superposition of the images formed by the first and second apertures is projected onto a target plane through a third aperture by condenser lenses and projection lenses. When a crossover of the electron beam drifts in the direction perpendicular to the axis of the lens system, the current of the electron beam projected on the target plate decreases. The electron beam current is detected by a faraday cup, and the locus of the electron beam is corrected by a coil assembly interposed between the second and third apertures so that the faraday cup may detect the maximum beam current.

Abstract: An electron gun for a shaped beam type electron beam delineating system is provided with a cathode which is prepared from a single crystal of lanthanum hexaboride (LaB.sub.6) the convex end portion of which has a tip radius ranging between 260 and 1,000 microns. The electron gun of the invention has a long effective life for producing a stable electron beam which can irradiate a limiting aperture with a uniform current density and insures the sufficiently high brightness of the electron beam image projected on a target.

Abstract: A method of manufacturing an aperture stop with a rectangular aperture for an electron beam exposure device, comprising the steps of: preparing a single-crystal silicon substrate with one side having a (100) face; providing a mask on said side of the substrate; selectively etching the substrate through the mask from said side to form a projecting portion of rectangular cross section by anisotropic etching; forming an aperture layer by covering said one side of the etched substrate with a high-melting-point metal having good electric conductivity, thereby surrounding said projecting portion; and forming in said aperture layer a rectangular aperture with a cross section corresponding to the cross section of said projecting portion by removing said substrate from the aperture layer.