Patents by Inventor Hiroyoshi Fukuro

Hiroyoshi Fukuro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7491651
    Abstract: A silica-based coating film on a substrate surface is prepared by forming a reaction mixture comprising a tetraalkoxysilicon compound (A) and/or an alkyl/alkoxy silane compound (B), an alcohol (C), and oxalic acid (D), in such ratios that the amount of alcohol (C) ranges from 0.5 to 100 mols per mol of all alkoxy groups present in the silicon compounds (A) and (B), and the amount of oxalic acid (D) ranges from 0.2 to 2 mols per mol of all alkoxy groups in the silicon compounds (A) and (B), and while maintaining the mixture at a SiO2 concentration ranging from 0.5 to 11%, as calculated from silicon atoms in the mixture, by means of the alcohol (C); heating the reaction mixture at a temperature ranging from 50 to 180° C.
    Type: Grant
    Filed: April 24, 2006
    Date of Patent: February 17, 2009
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kenichi Motoyama, Takakazu Nakada, Hitoshi Furusho, Hiroyoshi Fukuro
  • Patent number: 7455792
    Abstract: Disclosed herein are an organic conductive material and a conductive varnish containing it in an amount of 1 to 80 wt %. The organic conductive material comprises an oligoaniline derivative represented by the formula (1) in which quinoimine as an oxidant formed at the time of synthesis is reduced by a reducing agent and a salt is formed with an electron accepting dopant. (where R1 to R3 independently denote a hydrogen atom, unsubstituted or substituted monovalent hydrocarbon group, organoxy group, or acyl group; A and B independently denote a divalent group represented by the formula (2) or (3) below; where, R4 to R11 independently denote a hydrogen atom, hydroxyl group, unsubstituted or substituted monovalent hydrocarbon group, organoxy group, acyl group, or sulfonic group; and m and n independently denote a positive number equal to or larger than 1 such that m+n?20.
    Type: Grant
    Filed: February 19, 2003
    Date of Patent: November 25, 2008
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Takuji Yoshimoto, Hiroyoshi Fukuro, Hitoshi Furusho, Akira Yanagimoto
  • Patent number: 7211522
    Abstract: The present invention provides a process for forming a silica-based coating film, characterized by heating a reaction mixture comprising a silicon compound (A) represented by Si (OR)4 and/or a silicon compound (B) represented by R1nSi (OR2)4?n (wherein n is an integer of from 1 to 3), an alcohol (C) represented by R3CH2OH and oxalic acid (D) in specific ratios, at a temperature of from 50 to 180° C. in the absence of water, to form a solution of a polysiloxane having a number average molecular weight, as calculated as polystyrene, of from 2,000 to 15,000, applying a coating fluid containing such a solution on a substrate surface, and thermally curing a coating film obtained by such coating, at a temperature of from 80 to 600° C., and such a coating film having a film thickness of from 0.5 to 5 ?m, a coating fluid to be used for such a coating film, and a process for producing such a coating fluid.
    Type: Grant
    Filed: April 19, 2002
    Date of Patent: May 1, 2007
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kenichi Motoyama, Takakazu Nakada, Hitoshi Furusho, Hiroyoshi Fukuro
  • Patent number: 7144607
    Abstract: A polyimide-containing liquid crystal alignment treating agent having a structure of the formula (I) incorporated therein, wherein Q is a single bond or a divalent organic group, R1 to R4 represent aromatic groups, and R1 to R4 may be the same as, or different from, one another.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: December 5, 2006
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Tomohisa Yamada, Hiroyoshi Fukuro, Hideyuki Endo
  • Publication number: 20060189163
    Abstract: A process for easily and efficiently forming a silica-based coating film having a film thickness of from 0.5 to 5 ?m on a substrate, such a coating film, a coating fluid to be used for forming such a coating film, and a process for producing such a coating fluid, are presented. The present invention provides a process for forming a silica-based coating film, characterized by heating a reaction mixture comprising a silicon compound (A) represented by Si(OR)4 and/or a silicon compound (B) represented by R1nSi (OR2)4-n (wherein n is an integer of from 1 to 3), an alcohol (C) represented by R3CH2OH and oxalic acid (D) in specific ratios, at a temperature of from 50 to 180° C. in the absence of water, to form a solution of a polysiloxane having a number average molecular weight, as calculated as polystyrene, of from 2,000 to 15,000, applying a coating fluid containing such a solution on a substrate surface, and thermally curing a coating film obtained by such coating, at a temperature of from 80 to 600° C.
    Type: Application
    Filed: April 24, 2006
    Publication date: August 24, 2006
    Applicant: Nissan Chemical Industries Ltd.
    Inventors: Kenichi Motoyama, Takakazu Nakada, Hitoshi Furusho, Hiroyoshi Fukuro
  • Publication number: 20050082514
    Abstract: Disclosed herein are an organic conductive material and a conductive varnish containing it in an amount of 1 to 80 wt %. The organic conductive material comprises an oligoaniline derivative represented by the formula (1) in which quinoimine as an oxidant formed at the time of synthesis is reduced by a reducing agent and a salt is formed with an electron accepting dopant. (where R1 to R3 independently denote a hydrogen atom, unsubstituted or substituted monovalent hydrocarbon group, organoxy group, or acyl group; A and B independently denote a divalent group represented by the formula (2) or (3) below; where, R4 to R11 independently denote a hydrogen atom, hydroxyl group, unsubstituted or substituted monovalent hydrocarbon group, organoxy group, acyl group, or sulfonic group; and m and n independently denote a positive number equal to or larger than 1 such that m+n?20.
    Type: Application
    Filed: February 19, 2003
    Publication date: April 21, 2005
    Inventors: Takuji Yoshimoto, Hiroyoshi Fukuro, Hitoshi Furusho, Akira Yanagimoto
  • Patent number: 6821648
    Abstract: An electroluminescent device comprising an anode, a cathode, and at least one electroluminescent organic layer interposed therebetween, wherein a luminescent material in the organic layer emits light upon application of a voltage between the anode and the cathode, is characterized in that a salt of an electron accepting dopant with a polyimide precursor and/or polyimide having oligo-aniline units on side chains is formed as an auxiliary carrier transporting layer between the anode and the organic layer, the polyimide precursor and/or polyimide being obtained from a diamine component containing at least 1 mol % of an oligo-aniline unit-bearing diaminobenzene derivative and a tetracarboxylic dianhydride or derivative thereof.
    Type: Grant
    Filed: May 31, 2002
    Date of Patent: November 23, 2004
    Assignees: Nissan Chemical Industries, Ltd.
    Inventors: Junji Kido, Hitoshi Furusho, Hiroyoshi Fukuro
  • Patent number: 6808766
    Abstract: A liquid crystal alignment agent comprising a polymer having a specific unit structure, and a method for alignment of liquid crystal molecules by light irradiation without any rubbing treatment, provides liquid crystal alignment films with higher heat sensitivity, heat stability and light resistance.
    Type: Grant
    Filed: February 21, 2001
    Date of Patent: October 26, 2004
    Assignees: Nissan Chemical Industries, Ltd., Sagami Chemical Research Center
    Inventors: Yukihiro Miyama, Takayasu Nihira, Hideyuki Endo, Hiroyoshi Fukuro, Yu Nagase, Eiich Akiyama, Nobukatsu Nemoto
  • Publication number: 20040167314
    Abstract: A polyimide-containing liquid crystal alignment treating agent having a structure of the formula (I) incorporated therein, 1
    Type: Application
    Filed: December 12, 2003
    Publication date: August 26, 2004
    Inventors: Tomohisa Yamada, Hiroyoshi Fukuro, Hideyuki Endo
  • Publication number: 20040115955
    Abstract: A process for easily and efficiently forming a silica-based coating film having a film thickness of from 0.5 to 5 &mgr;m on a substrate, such a coating film, a coating fluid to be used for forming such a coating film, and a process for producing such a coating fluid, are presented.
    Type: Application
    Filed: October 22, 2003
    Publication date: June 17, 2004
    Inventors: Kenichi Motoyama, Takakazu Nakada, Hitoshi Furusho, Hiroyoshi Fukuro
  • Patent number: 6740371
    Abstract: An alkyldiamine having excellent polymerization reactivity, a polyimide comprising it as a constituting element, and a liquid crystal alignment film excellent in uniformity of liquid crystal alignment, are presented. Namely, the present invention relates to a diaminobenzene derivative represented by the following general formula (1) and to a polyimide obtained by reacting a diamine containing at least 1 mol % of the diaminobenzene derivative represented by the general formula (1), with at least one compound selected from a tetracarboxylic. dianhydride and its derivatives, to obtain a polyimide. precursor having a reduced viscosity of from 0.05 to 5.0 dl/g (in N-methylpyrrolidone at a temperature of 30° C., concentration: 0.5 g/dl) and ring-closing it, and having a repeating unit represented by the general formula (2). Further, the present invention relates to a liquid crystal alignment film containing at least 1 mol % of the above repeating unit.
    Type: Grant
    Filed: December 26, 2001
    Date of Patent: May 25, 2004
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kazuyoshi Hosaka, Hideyuki Nawata, Takayasu Nihira, Hideyuki Isogai, Hideyuki Endou, Hiroyoshi Fukuro
  • Publication number: 20040067444
    Abstract: A method for obtaining an electroconductive tin oxide pattern film simply and efficiently without using a resist film. A method for patterning an electroconductive tin oxide film, characterized by employing a solution having a tin compound and a dopant compound soluble in an organic solvent dissolved in the organic solvent, drying it to such an extent that the dried film retains the solubility in a developing solution, exposing the dried film with a light containing an ultraviolet region to render it partially insoluble, and etching the unexposed portion with the developing solution.
    Type: Application
    Filed: June 30, 2003
    Publication date: April 8, 2004
    Inventors: Makoto Wakabayashi, Kenichi Motoyama, Hitoshi Furusho, Hiroyoshi Fukuro
  • Patent number: 6677099
    Abstract: A positive type photosensitive resin composition which can be developed by an aqueous alkaline solution and which is excellent in the developability and the adhesion to a substrate, is presented.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: January 13, 2004
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kazuhisa Ishii, Tomonari Nakayama, Takayasu Nihira, Hiroyoshi Fukuro
  • Patent number: 6632544
    Abstract: An aromatic amine derivative of the following general formula (1) is useful to form an auxiliary carrier transporting layer in an electroluminescent device. R1 is a monovalent hydrocarbon group or organooxy group, and A and B have the following general formula (2) or (3).
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: October 14, 2003
    Assignees: Nissan Chemical Industries, Ltd.
    Inventors: Junji Kido, Hiroyoshi Fukuro, Hitoshi Furusho, Tomoyuki Enomoto
  • Patent number: 6632545
    Abstract: In an electroluminescent device comprising an anode, a cathode, and an electroluminescent organic layer interposed therebetween, wherein a luminescent material in the organic layer emits light upon application of a voltage between the anode and the cathode, an auxiliary carrier transporting layer which contains an aromatic amine derivative comprising recurring units of formula (1) and having a number average molecular weight of 200-100,000 is formed between the anode and the organic layer. R1 to R4 each are hydrogen, hydroxyl, substituted or unsubstituted monovalent hydrocarbon, organooxy, acyl or sulfonate group, excluding the case where all R1 to R4 are hydrogen atoms at the same time, and n is a positive number of 2-3,000.
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: October 14, 2003
    Assignees: Nissan Chemical Industries, Ltd.
    Inventors: Junji Kido, Hiroyoshi Fukuro, Hitoshi Furusho, Tomoyuki Enomoto
  • Patent number: 6489431
    Abstract: A polyimide precursor having a repeating unit represented by the following general formula (1), wherein R1 contains a bivalent organic group constituting a diamine having a hexafluoropropylidene group in its molecule represented by the following general formula (2), and the reduced viscosity is from 0.05 to 5.0 dl/g (in N-methylpyrrolidone at a temperature of 30° C., concentration: 0.5 g/dl), and a polyimide obtained by imidizing said precursor: (wherein R1 is a bivalent organic group constituting a diamine, A is a hydrogen atom, a linear alkyl group including a methyl group, or a trifluoromethyl group, and n is the number of a substituent on an aromatic ring and an integer of from 1 to 4).
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: December 3, 2002
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kazuhisa Ishii, Takayasu Nihira, Hiroyoshi Fukuro
  • Patent number: 6472012
    Abstract: The present invention relates to an antireflection film effective for improving the transparency of an image display device such as a liquid crystal display (LCD), a plasma display (PDP), CRT, EL or a touch panel, to an optical product made of glass, such as a lens for eye glasses, and to an antireflection glass. The present invention is also directed to a process of coating a glass surface with a mixture comprising particular silicon compounds and thermosetting the coating film at a temperature ranging from 480 to 520° C. This process can be used to form an antireflection film on a glass surface having a refractive index ranging from 1.33 to 1.38 and a contact angle of water of at most 40 degrees.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: October 29, 2002
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Takakazu Nakada, Kenichi Motoyama, Rie Gunji, Makoto Wakabayashi, Hitoshi Furusho, Hiroyoshi Fukuro
  • Patent number: 6441127
    Abstract: An alignment treating agent for a liquid crystal cell, which comprises a polyimide resin of the formula (I): wherein R1 is a tetravalent organic group constituting a tetracarboxylic acid or its derivative, R2 is a bivalent organic group constituting a diamine, and m is a positive integer, provided that at least 10 mol % of R2 is a bivalent organic group selected from the group consisting of: wherein X is H, OH, an alkyl group, an alkoxy group, a carboxyl group, an acyl group or a halogen atom, said polyimide resin being made insoluble in an organic solvent by coating a precursor solution of said polyimide resin on a substrate, followed by heating.
    Type: Grant
    Filed: January 19, 1994
    Date of Patent: August 27, 2002
    Assignee: Nissan Chemical Industries Ltd.
    Inventors: Kiyoshi Sawahata, Toyohiko Abe, Yoshihiro Tsuruoka, Hiroyoshi Fukuro
  • Patent number: 6274695
    Abstract: The present invention relates to a treating agent for liquid crystal alignment, which is an agent for liquid crystal alignment to be used for a method in which polarized ultraviolet rays or electron rays are irradiated on a polymer thin film formed on a substrate in a predetermined direction relative to the substrate plane, and said substrate is used for aligning liquid crystal without rubbing treatment, wherein said agent for liquid crystal alignment contains a polymer compound having photochemically reactive groups in the polymer main chain and a glass transition temperature of at least 200° C.
    Type: Grant
    Filed: November 1, 1999
    Date of Patent: August 14, 2001
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Hideyuki Endou, Takayasu Nihira, Hiroyoshi Fukuro
  • Publication number: 20010012565
    Abstract: The present invention relates to an antireflection film effective for improving the transparency of an image display device such as a liquid crystal display (LCD), a plasma display (PDP), CRT, EL or a touch panel, to an optical product made of glass, such as a lens for eye glasses, and to an antireflection glass. The present invention is also directed to a process of coating a glass surface with a mixture comprising particular silicon compounds and thermosetting the coating film at a temperature ranging from 480 to 520° C. This process can be used to form an antireflection film on a glass surface having a refractive index ranging from 1.33 to 1.38 and a contact angle of water of at most 40 degrees.
    Type: Application
    Filed: November 30, 2000
    Publication date: August 9, 2001
    Inventors: Takakazu Nakada, Kenichi Motoyama, Rie Gunji, Makoto Wakabayashi, Hitoshi Furusho, Hiroyoshi Fukuro