Patents by Inventor Hiroyuki ARAFUNE

Hiroyuki ARAFUNE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11912952
    Abstract: A material comprising: a support 10; and a brush layer 20 containing a brush-like polymer chain assemblage 21 formed of a plurality of polymer chains and a swelling liquid 22, in which a brush layer 20 is swollen with the swelling liquid 22, the brush layer 20 retaining on the surface a lubricating liquid 30, and the swelling liquid 22 contained in the brush layer 20 and the lubricating liquid 30 being phase-separated to form a liquid-liquid phase separation interface 40 in between and a sliding system using the material.
    Type: Grant
    Filed: December 1, 2020
    Date of Patent: February 27, 2024
    Assignees: KYOTO UNIVERSITY, NATIONAL INSTITUTE OF TECHNOLOGY, NATIONAL UNIVERSITY CORPORATION YOKOHAMA NATIONAL UNIVERSITY
    Inventors: Yoshinobu Tsujii, Keita Sakakibara, Takaya Sato, Hiroyuki Arafune, Ken Nakano, Mayu Miyazaki
  • Patent number: 11739284
    Abstract: A composite material comprising a plurality of polymer chains fixed to a base and swelled with a mixture which contains a salt and a hydrogen bond-donating compound and has a melting point maintained at 100° C. or less.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: August 29, 2023
    Assignees: NISSHINBO HOLDINGS INC., NATIONAL INSTITUTE OF TECHNOLOGY
    Inventors: Satoshi Kubota, Gen Masuda, Takaya Sato, Hiroyuki Arafune
  • Publication number: 20230034470
    Abstract: A material comprising: a support 10; and a brush layer 20 containing a brush-like polymer chain assemblage 21 formed of a plurality of polymer chains and a swelling liquid 22, in which a brush layer 20 is swollen with the swelling liquid 22, the brush layer 20 retaining on the surface a lubricating liquid 30, and the swelling liquid 22 contained in the brush layer 20 and the lubricating liquid 30 being phase-separated to form a liquid-liquid phase separation interface 40 in between and a sliding system using the material.
    Type: Application
    Filed: December 1, 2020
    Publication date: February 2, 2023
    Inventors: Yoshinobu TSUJII, Keita SAKAKIBARA, Takaya SATO, Hiroyuki ARAFUNE, Ken NAKANO, Mayu MIYAZAKI
  • Publication number: 20220389347
    Abstract: A composite material comprising a plurality of polymer chains fixed to a base and swelled with a mixture which contains a salt and a hydrogen bond-donating compound and has a melting point maintained at 100° C. or less.
    Type: Application
    Filed: September 23, 2020
    Publication date: December 8, 2022
    Applicants: NISSHINBO HOLDINGS INC., NATIONAL INSTITUTE OF TECHNOLOGY
    Inventors: Satoshi KUBOTA, Gen MASUDA, Takaya SATO, Hiroyuki ARAFUNE
  • Patent number: 11274176
    Abstract: A composite including a plurality of block copolymer chains dispersed in a base polymer, the block copolymer chains including a polymer block (A) and a polymer block (B) having lower affinity for the base polymer than that of the polymer block (A), wherein each of the block copolymer chains has the polymer block (A) at two or more locations of the block copolymer chain, and in at least some of the block copolymer chains, the polymer blocks (A) are at least partially located in the base polymer and the polymer blocks (B) are at least partially exposed from the base polymer.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: March 15, 2022
    Assignees: NATIONAL INSTITUTE OF TECHNOLOGY, NATIONAL UNIVERSITY CORPORATION YOKOHAMA NATIONAL UNIVERSITY, KYOTO UNIVERSITY, NISSHINBO HOLDINGS INC.
    Inventors: Takaya Sato, Hiroyuki Arafune, Takashi Morinaga, Saika Honma, Toshio Kamijo, Ken Nakano, Yoshinobu Tsujii
  • Publication number: 20200002455
    Abstract: A composite including a plurality of block copolymer chains dispersed in a base polymer, the block copolymer chains including a polymer block (A) and a polymer block (B) having lower affinity for the base polymer than that of the polymer block (A), wherein each of the block copolymer chains has the polymer block (A) at two or more locations of the block copolymer chain, and in at least some of the block copolymer chains, the polymer blocks (A) are at least partially located in the base polymer and the polymer blocks (B) are at least partially exposed from the base polymer.
    Type: Application
    Filed: March 2, 2018
    Publication date: January 2, 2020
    Applicants: NATIONAL INSTITUTE OF TECHNOLOGY, NATIONAL UNIVERSITY CORPORATION YOKOHAMA NATIONAL UNIVERSITY, KYOTO UNIVERSITY, NISSHINBO HOLDINGS INC.
    Inventors: Takaya SATO, Hiroyuki ARAFUNE, Takashi MORINAGA, Saika HONMA, Toshio KAMIJO, Ken NAKANO, Yoshinobu TSUJII