Patents by Inventor Hiroyuki Chinju

Hiroyuki Chinju has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6303230
    Abstract: This invention relates to laminates in which a layer of polyimide precursors and a layer of photosensitive resins are formed one on top of another on an electric conductor such as a stainless steel foil and also to laminates consisting of a stainless steel foil and successive layers of polyimide precursors and photosensitive resins useful for the manufacture of HDD suspensions. In particular, the use of resins containing a repeating unit derivable from specific aromatic diamines and aromatic carboxylic acid dianhydrides as polyimide precursors makes it possible to fabricate an insulator of high fabrication accuracy and reliability on an electric conductor and, in addition, the laminates are useful as materials for the manufacture of HDD suspensions of an integrated circuit/wiring structure with high accuracy.
    Type: Grant
    Filed: October 22, 1997
    Date of Patent: October 16, 2001
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Hisashi Watanabe, Takashi Tanaka, Hiroyuki Chinju, Seigo Oka, Soichiro Kawamura, Taeko Hayama
  • Patent number: 5601905
    Abstract: A laminate comprising at least two layers of a photosensitive resin layer and a polyimide precursor resin layer; a process for formation of an insulating protective layer using a laminate which comprises laminating a laminate comprising at least photosensitive resin layer and a polyimide precursor resin layer on an insulating board having an exposed circuit; selectively exposing the photosensitive resin layer to active light; developing the resultant photosensitive resin layer; removing the exposed polyimide precursor resin layer by etching it with an alkaline solution using the photosensitive resin layer as a mask; removing the photosensitive resin layer; and then curing the residual polyimide precusor resin layer; and a process for preparation of a printed circuit which comprises forming a polymide precursor resin layer on an insulating board having an exposed circuit, patterning the resin layer with an alkaline solution, and then curing it.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: February 11, 1997
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Hisashi Watanabe, Takashi Tanaka, Kaoru Okamoto, Keiji Yoshizawa, Hiroyuki Chinju, Isamu Takarabe