Patents by Inventor Hiroyuki Fujimura

Hiroyuki Fujimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240147723
    Abstract: A memory device includes source-level material layers including a source contact layer, an alternating stack of insulating layers and electrically conductive layers located over the source-level material layers, a memory opening vertically extending through the alternating stack and the source contact layer, and a memory opening fill structure located in the memory opening and including a vertical semiconductor channel including an intrinsic or first conductivity type semiconductor material, a memory film surrounding the vertical semiconductor channel, and a conical source pedestal in contact with the source contact layer and in contact with a bottom surface of the vertical semiconductor channel, such that at least portion of the conical source pedestal includes a second conductivity type semiconductor material.
    Type: Application
    Filed: July 12, 2023
    Publication date: May 2, 2024
    Inventors: Motoo OHAGA, Tadashi NAKAMURA, Takashi YUDA, Nobuyuki FUJIMURA, Hiroyuki OGAWA
  • Publication number: 20240092646
    Abstract: An ammonia manufacturing apparatus includes: an ammonia synthesis unit synthesizing ammonia under a chemical reaction using hydrogen and nitrogen as a raw material gas in a reactor; and a heat storage unit including a heating medium. The heat storage unit can supply heat from the heating medium to the ammonia synthesis unit when an amount of the raw material gas supplied to the ammonia synthesis unit increases.
    Type: Application
    Filed: January 27, 2021
    Publication date: March 21, 2024
    Applicant: JGC CORPORATION
    Inventors: Hiroyuki ISOBE, Yasushi FUJIMURA, Mototaka KAI, Yuki HOSHINO, Keisuke NARITA
  • Publication number: 20170318180
    Abstract: An image sensor unit (1A) includes: a light condenser (40) that condenses light including image information of an illuminated object; an image sensor (48) that receives the light passed through the light condenser (40) and that converts the light to an electrical signal; and a frame (10A) that houses the light condenser (40) and the image sensor (48), wherein the image sensor unit (1A) includes an urging member (50A) that urges and fixes the light condenser (40) to the frame (45), and the urging member (50A) urges and fixes the light condenser (40) to the frame (10A) from a light entering side or a light emission side of the light.
    Type: Application
    Filed: December 2, 2015
    Publication date: November 2, 2017
    Inventors: Hideo KIYOTA, Yohei HIRATSUKA, Takashi KOBE, Hiroyuki FUJIMURA
  • Publication number: 20170295287
    Abstract: Provided is a manufacturing method of a sensor unit, the sensor unit including: a rod-shaped light condenser that condenses light from an original; a frame that houses the light condenser; and a plurality of urging members that urge the light condenser toward the frame and mount the light condenser on the frame, the manufacturing method including: a light condenser housing step of housing the light condenser in the frame; and an urging member mounting step of pressing, by an assembly machine, the plurality of urging members against the frame.
    Type: Application
    Filed: April 5, 2017
    Publication date: October 12, 2017
    Inventors: Hideo KIYOTA, Yohei HIRATSUKA, Takashi KOBE, Hiroyuki FUJIMURA
  • Publication number: 20080268150
    Abstract: The present invention relates to a film-formation method of a diamond electrode used in an electrolytic processing apparatus and other devices for treating water and waste liquid. This method utilizes CVD such as hot filament CVD including supplying a high-concentration carbon source to form a low-quality thick first diamond film (1) on a substrate at a high rate, and then supplying a low-concentration carbon source to form a high-quality thin second diamond film (2) on the first film at a low rate. This structure can prevent oxidation corrosion due to OH radical and can prevent entry of an electrolytic solution into the film, thereby enhancing durability of the diamond film. The thick first diamond film is formed at a high rate, and the second diamond film is made thin at a low rate. Therefore, a total film-formation time can be short, and a low-cost diamond electrode can be made.
    Type: Application
    Filed: July 21, 2004
    Publication date: October 30, 2008
    Applicant: EBARA CORPORATION
    Inventors: Hiroyuki Fujimura, Kanichi Ito
  • Patent number: 7291255
    Abstract: High-purity hydrogen is recovered from a pyrolysis gas, composed mainly of hydrogen and carbon monoxide, produced by pyrolysis of an organic material such as biomass. A method for producing such high-purity hydrogen includes supplying a reducing gas produced by pyrolysis of an organic material to an anode side of a high-temperature steam electrolyzer having a diaphragm comprising solid oxide electrolyte; and supplying steam to a cathode side of the high-temperature steam electrolyzer to produce hydrogen and oxygen by electrolytic action. The oxygen produced in the cathode side of the high-temperature electrolyzer passes through the diaphragm and reacts with the reducing gas to create concentration gradient of oxygen ion, thus lowering electrolysis voltage.
    Type: Grant
    Filed: July 21, 2003
    Date of Patent: November 6, 2007
    Assignee: Ebara Corporation
    Inventors: Hiroyuki Fujimura, Chi Matsumura, Takahiro Oshita, Kanichi Ito
  • Publication number: 20060216514
    Abstract: The present invention intends to provide a diamond-coated silicon to be used in an industrially applicable diamond electrode. A diamond-coated silicon comprising a silicon substrate having a thickness of 500 ?m or less is coated at least partially with electrically conductive diamond. The silicon substrate having a thickness of 500 ?m or less is manufactured by the plate-like crystal growth process, and then the silicon substrate is coated with the electrically conductive diamond by the chemical vapor deposition process to manufacture the diamond-coated silicon. The diamond-coated silicon is flexible and can be stuck to an electrically conductive support substrate, and thereby a large area electrode and a three-dimensional electrode structure can be readily obtained.
    Type: Application
    Filed: December 24, 2003
    Publication date: September 28, 2006
    Applicant: Ebara Corporation
    Inventors: Hiroyuki Fujimura, Roberto Serikawa, Naoki Ishikawa, Takahiro Mishima
  • Publication number: 20060137579
    Abstract: A gasification system has a gasification furnace (1) for gasifying wastes to produce a combustible gas and a combustion furnace (2) for combusting char and/or tar produced by gasification in the gasification furnace (1). The gasification system also has a return line for returning a combustion gas discharged from the combustion furnace (2) to the gasification furnace (1) and the combustion furnace (2).
    Type: Application
    Filed: July 23, 2004
    Publication date: June 29, 2006
    Inventors: Hiroyuki Fujimura, Takahiro Oshita, Norihisa Miyoshi, Seiichiro Toyoda, Kei Matsuoka, Tatsuya Hasegawa
  • Publication number: 20060124349
    Abstract: The present invention intends to provide an industrially applicable diamond electrode and a diamond-coated silicon used in the electrode. A silicon substrate having a thickness of 500 ?m or less, at least partially coated with electrically conductive diamond is used as a diamond-coated silicon. In addition, an electrically conductive support substrate and the diamond-coated silicon is used as an electrode. The diamond-coated silicon is flexible and it can be adhered to the electrically conductive support substrate, and thereby a large area electrode and a three-dimensional electrode structure can be easily obtained.
    Type: Application
    Filed: December 24, 2003
    Publication date: June 15, 2006
    Inventors: Hiroyuki Fujimura, Roberto Serikawa, Naoki Ishikawa, Takahiro Mishima
  • Patent number: 6902711
    Abstract: An apparatus for treating wastes includes a fluidized bed reactor for partially combusting the wastes at a relatively low temperature, and a separate relatively high temperature reactor for separate gasification of gaseous material and char from the first gasification. This synthesis gas thus formed is cooled, subjected to a conversion operation in a converter to produce hydrogen.
    Type: Grant
    Filed: March 21, 2000
    Date of Patent: June 7, 2005
    Assignees: Ebara Corporation, Ube Industries, Ltd.
    Inventors: Hiroyuki Fujimura, Yoshio Hirayama, Shosaku Fujinami, Shuichi Nagato, Tetsuhisa Hirose, Takahiro Oshita, Masaaki Irie, Kazuo Takano, Toshio Fukuda
  • Publication number: 20040124095
    Abstract: High-purity hydrogen is recovered from a pyrolysis gas, composed mainly of hydrogen and carbon monoxide, produced by pyrolysis of an organic material such as biomass. A method for producing such high-purity hydrogen includes supplying a reducing gas produced by pyrolysis of an organic material to an anode side of a high-temperature steam electrolyzer having a diaphragm comprising solid oxide electrolyte; and supplying steam to a cathode side of the high-temperature steam electrolyzer to produce hydrogen and oxygen by electrolytic action. The oxygen produced in the cathode side of the high-temperature electrolyzer passes through the diaphragm and reacts with the reducing gas to create concentration gradient of oxygen ion, thus lowering electrolysis voltage.
    Type: Application
    Filed: July 21, 2003
    Publication date: July 1, 2004
    Inventors: Hiroyuki Fujimura, Chi Matsumura, Takahiro Oshita, Kanichi Ito
  • Patent number: 6676716
    Abstract: A method and apparatus for treating wastes by gasification recovers useful resources including energy, valuables such as metals, and gases for use as synthesis gas for chemical industries or fuel. The wastes are gasified in a fluidized-bed reactor at a relatively low temperature. Gaseous material and char produced in the fluidized-bed reactor are introduced into a high-temperature combustor, and low calorific gas or medium calorific gas is produced in the high-temperature combustor at a relatively high temperature. The fluidized-bed reactor preferably is a revolving flow-type fluidized-bed reactor. The high-temperature combustor preferably is a swirling-type high-temperature combustor.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: January 13, 2004
    Assignee: Ebara Corporation
    Inventors: Hiroyuki Fujimura, Shosaku Fujinami, Tetsuhisa Hirose, Takahiro Oshita, Masaaki Irie, Kazuo Takano
  • Patent number: 6669822
    Abstract: The present invention relates to a waste carbonization method which produces charcoal and/or activated carbon from solid wastes, such as wood waste, and renders produced gas completely harmless. Solid wastes B are exposed to gas generated in pyrolysis gasification of other wastes A in a gasification furnace 1 to produce charcoal and/or activated carbon from the solid wastes B.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: December 30, 2003
    Assignee: Ebara Corporation
    Inventors: Hiroyuki Fujimura, Kazuo Takano, Akira Uchino, Takahiro Ohshita, Tetsuhisa Hirose
  • Patent number: 6569395
    Abstract: A method for flue gas desulfurization in which sulfur oxides in the flue gas are converted into powdery ammonium compound, including providing an aqueous ammonia spraying device configured to atomize aqueous ammonia into droplets, cooling flue gas containing sulfur oxides down to a temperature between a saturation temperature of water and 80° C., adjusting the aqueous ammonia spraying device such that the aqueous ammonia is atomized into droplets having a Sauter mean diameter of 0.5 &mgr;m to 30 &mgr;m, and spraying the aqueous ammonia into the flue gas which has been cooled in the cooling step.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: May 27, 2003
    Assignee: Ebara Corporation
    Inventors: Hiroyuki Fujimura, Masahiro Izutsu
  • Patent number: 6455011
    Abstract: A method and apparatus for treating wastes by two-stage gasification recovers metals or ash content in the wastes in such a state that they can be recycled, and gases containing carbon monoxide (CO) and hydrogen gas (H2) for use as synthesis gas for ammonia (NH3) or production of hydrogen gas. The wastes are gasified in a fluidized-bed reactor at a low temperature. Then, gaseous material and char produced in the fluidized-bed reactor are introduced into a high-temperature combustor, and gasified at a high temperature and ash content is converted into molten slag. After water scrubbing and a CO conversion reaction, the gas is separated into H2 and residual gas. The residual gas is then supplied to the fluidized-bed reactor as a fluidizing gas.
    Type: Grant
    Filed: September 9, 1999
    Date of Patent: September 24, 2002
    Assignees: Ebara Corporation, Ube Industries, Ltd.
    Inventors: Hiroyuki Fujimura, Yoshio Hirayama, Shosaku Fujinami, Kazuo Takano, Masaaki Irie, Tetsuhisa Hirose, Shuichi Nagato, Takahiro Oshita, Toshio Fukuda
  • Publication number: 20010011438
    Abstract: A method and apparatus for treating wastes by gasification recovers useful resources including energy, valuables such as metals, and gases for use as synthesis gas for chemical industries or fuel. The wastes are gasified in a fluidized-bed reactor at a relatively low temperature. Gaseous material and char produced in the fluidized-bed reactor are introduced into a high-temperature combustor, and low calorific gas or medium calorific gas is produced in the high-temperature combustor at a relatively high temperature. The fluidized-bed reactor preferably is a revolving flow-type fluidized-bed reactor. The high-temperature combustor preferably is a swirling-type high-temperature combustor.
    Type: Application
    Filed: January 19, 2001
    Publication date: August 9, 2001
    Applicant: THE FURUKAWA ELECTRIC CO., LTD.
    Inventors: Hiroyuki Fujimura, Shosaku Fujinami, Tetsuhisa Hirose, Takahiro Oshita, Masaaki Irie, Kazuo Takano
  • Patent number: 6190429
    Abstract: A method and apparatus for treating wastes by gasification recovers useful resources including energy, valuables such as metals, and gases for use as synthesis gas for chemical industries or fuel. The wastes are gasified in a fluidized-bed reactor at a relatively low temperature. Gaseous material and char produced in the fluidized-bed reactor are introduced into a high-temperature combustor, and low calorific gas or medium calorific gas is produced in the high-temperature combustor at a relatively high temperature. The fluidized-bed reactor preferably is a revolving flow-type fluidized-bed reactor. The high-temperature combustor preferably is a swirling-type high-temperature combustor.
    Type: Grant
    Filed: February 23, 1999
    Date of Patent: February 20, 2001
    Assignee: Ebara Corporation
    Inventors: Hiroyuki Fujimura, Shosaku Fujinami, Tetsuhisa Hirose, Takahiro Oshita, Masaaki Irie, Kazuo Takano
  • Patent number: 6063355
    Abstract: A method of treating wastes includes partially combusting the wastes in a fluidized bed reactor at a relatively low temperature followed by separate gasification of gaseous material and char from the first gasification in a separate relatively high temperature reactor. This forms synthesis gas that is cooled, subjected to a conversion operation to produce hydrogen.
    Type: Grant
    Filed: January 21, 1999
    Date of Patent: May 16, 2000
    Assignees: Ebara Corporation, UBE Industries, Ltd.
    Inventors: Hiroyuki Fujimura, Yoshio Hirayama, Shosaku Fujinami, Shuichi Nagato, Tetsuhisa Hirose, Takahiro Oshita, Masaaki Irie, Kazuo Takano, Toshio Fukuda
  • Patent number: 5980858
    Abstract: A method and apparatus for treating wastes by two-stage gasification recovers metals or ash content in the wastes in such a state that they can be recycled, and gases containing carbon monoxide (CO) and hydrogen gas (H.sub.2) for use as synthesis gas for ammonia (NH.sub.3) or production of hydrogen gas. The wastes are gasified in a fluidized-bed reactor at a low temperature. Then, gaseous material and char produced in the fluidized-bed reactor are introduced into a high-temperature combustor, and gasified at a high temperature and ash content is converted into molten slag. After water scrubbing and a CO conversion reaction, the gas is separated into H.sub.2 and residual gas. The residual gas is then supplied to the fluidized-bed reactor as a fluidizing gas.
    Type: Grant
    Filed: October 22, 1997
    Date of Patent: November 9, 1999
    Assignees: Ebara Corporation, Ube Industries, Lt.
    Inventors: Hiroyuki Fujimura, Yoshio Hirayama, Shosaku Fujinami, Kazuo Takano, Masaaki Irie, Tetsuhisa Hirose, Shuichi Nagato, Takahiro Oshita, Toshio Fukuda
  • Patent number: 5922090
    Abstract: A method and apparatus for treating wastes by gasification recovers useful resources including energy, valuables such as metals, and gases for use as synthesis gas for chemical industries or fuel. The wastes are gasified in a fluidized-bed reactor at a relatively low temperature. Gaseous material and char produced in the fluidized-bed reactor are introduced into a high-temperature combustor, and low calorific gas or medium calorific gas is produced in the high-temperature combustor at a relatively high temperature. The fluidized-bed reactor preferably is a revolving flow-type fluidized-bed reactor. The high-temperature combustor preferably is a swirling-type high-temperature combustor.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: July 13, 1999
    Assignee: Ebara Corporation
    Inventors: Hiroyuki Fujimura, Shosaku Fujinami, Tetsuhisa Hirose, Takahiro Oshita, Masaaki Irie, Kazuo Takano