Patents by Inventor Hiroyuki Hanahata

Hiroyuki Hanahata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090267239
    Abstract: A photosensitive resin composition comprising parts by mass of polycondensate (A) having a structure resulting from dehydration condensation between one or two or more tetracarboxylic acid dianhydride and one or two or more armatic diamines having mutually ortho-positioned amino and phenolic hydroxyl groups and 1 to 100 parts by mass of photosensitive diazonaphthoquinone compound (B), wherein the polycondensate (A) has a weight average molecular weight of 3000 to 70,000.
    Type: Application
    Filed: September 1, 2006
    Publication date: October 29, 2009
    Applicants: ASAHI KASEI EMD CORPORATION, PI R&D CO., LTD.
    Inventors: Takayuki Kanada, Hiroyuki Hanahata, Xingzhou Jin, Shuzo Waki
  • Patent number: 7563557
    Abstract: A polyamide having a structure represented by the chemical formula (1): wherein m and n represent an integer satisfying m?1, n?1, 2?(m+n)?150, 0.3?m/(m+n)?0.9, R1 and R2 represent at least one monovalent organic group containing a photopolymerizable unsaturated bond, X1 represents at least one tetravalent aromatic group, X2 represents at least one trivalent aromatic group, Y1 and Y2 represent at least one divalent organic group, and Z represents at least one monovalent organic group selected from mono-substituted amino and imido groups.
    Type: Grant
    Filed: July 11, 2005
    Date of Patent: July 21, 2009
    Assignee: Asahi Kasei EMD Corporation
    Inventors: Masashi Kimura, Takayuki Kanada, Hiroyuki Hanahata
  • Publication number: 20070248910
    Abstract: A polyamide having a structure represented by the chemical formula (1): wherein m and n represent an integer satisfying m?1, n?1, 2?(m+n)?150, 0.3?m/(m+n)?0.9, R1 and R2 represent at least one monovalent organic group containing a photopolymerizable unsaturated bond, X1 represents at least one tetravalent aromatic group, X2 represents at least one trivalent aromatic group, Y1 and Y2 represent at least one divalent organic group, and Z represents at least one monovalent organic group selected from mono-substituted amino and imido groups.
    Type: Application
    Filed: July 11, 2005
    Publication date: October 25, 2007
    Applicant: ASAHI KASEI EMD CORPORATION
    Inventors: Masashi Kimura, Takayuki Kanada, Hiroyuki Hanahata
  • Patent number: 7081272
    Abstract: A composition comprising a fluid, silica precursor (A) obtained by subjecting alkoxysilane(s) to hydrolysis/polycondensation in the presence of an acid catalyst, a basic compound (B) having a basic hydroxyl group and/or a basic nitrogen atom, wherein the pH of a 0.1 N aqueous solution of compound (B) is 11 or more, and the vapor pressure of compound (B) is 1.3 kPa or lower at 100° C., and an organic compound (C) having a boiling point of 100° C. or higher, compound (C) being compatible with silica precursor (A), wherein the amount of compound (B) is from 0.0015 to 0.5 mol, in terms of the total molar amount of the basic hydroxyl groups and the basic nitrogen atoms in compound (B), per mole of Si atoms contained in silica precursor (A).
    Type: Grant
    Filed: December 13, 2002
    Date of Patent: July 25, 2006
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Yoro Sasaki, Hiroyuki Hanahata, Takaaki Ioka
  • Patent number: 6787191
    Abstract: Disclosed is a coating composition for use in producing an insulating thin film, comprising: (A) at least one silica precursor comprised of at least one compound selected from the group consisting of an alkoxysilane and a hydrolysis product thereof; (B) at least one organic polymer; (C) water; (D) at least one alcohol; and optionally (E) an organic solvent for a mixture of the components (A), (B), (C) and (D); wherein the weight ratio (WR) of the water (C) to the at least one silica precursor (A) satisfies the formula 0.01<WR<10, and the weight of the water (C) is larger than that of the at least one alcohol (D), with the proviso that when the at least one organic polymer (B) is insoluble in a mixture of the water (C) and the alcohol (D), the coating composition comprises all of the components (A) to (E).
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: September 7, 2004
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Hiroyuki Hanahata, Toru Araki, Mikihiko Nakamura
  • Publication number: 20040077757
    Abstract: Disclosed is a coating composition comprising: (A) a silica precursor comprising at least one member selected from the group consisting of alkoxysilanes and hydrolysis/polycondensation products formed by hydrolysis/polycondensation reactions of the alkoxysilanes under acidic conditions, and (B) an organic polymer containing 20% by weight or more, based on the weight of the organic polymer, of an organic block copolymer, wherein the coating composition has an acidic pH value.
    Type: Application
    Filed: February 6, 2003
    Publication date: April 22, 2004
    Inventors: Toru Araki, Jun Li, Hironobu Shirataki, Hiroyuki Hanahata, Shinya Matsuno
  • Publication number: 20030099844
    Abstract: Disclosed is a coating composition for use in producing an insulating thin film, comprising:
    Type: Application
    Filed: October 4, 2002
    Publication date: May 29, 2003
    Inventors: Hiroyuki Hanahata, Toru Araki, Mikihiko Nakamura
  • Patent number: 6245876
    Abstract: The present invention relates to a continuous shaped article such as a polyurethaneurea fiber and a polyurethaneurea film having a birefringence index (&Dgr;n) of from at least 1.0×10−4 to 8.0×10−4 in a nontensile state, a crosslinking density at an elongation of 100% (N100) of at least 5.0×1026/m3, a crosslinking point density at an elongation of 400% (N400) of from 4.0×1026 to 3.0×1027/m3, and a crosslinking point density at the time of breakage (Nt) of at least 1.6×1027/m3, wherein the ratio of the crosslinking density at an elongation of 400% to that at an elongation of 100% (N400/N100) is from 0.9 to 1.3, and a process for producing the same. The present invention has made the continuous shaped article show an initial stress, a strength at break and an elongation at break which are sufficiently high, and a small rise in the stress in the medium elongation range.
    Type: Grant
    Filed: August 27, 1999
    Date of Patent: June 12, 2001
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hiroyuki Hanahata, Yoshihiko Shimaya
  • Patent number: 5541280
    Abstract: A linear segmented polyurethaneurea having a degree of branching (Nb) of 3 or less and obtained by chain-extending a prepolymer with an organic diamine in an organic solvent comprising dimethylformamide or dimethylacetamide, wherein the prepolymer has an isocyanate group at the both ends thereof and comprises a stoichiometrically excessive amount of a diisocyanate component selected from 4,4'-diphenylmethane diisocyanate, 2,4-toluene diisocyanate and 1,4-phenylene diisocyanate and a diol component having a number average molecular weight of 500 to 6000.
    Type: Grant
    Filed: February 23, 1994
    Date of Patent: July 30, 1996
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hiroyuki Hanahata, Seiji Goto