Abstract: A socket for an electrical part of the present invention has a socket body provided with an accommodation portion in which an IC package is accommodated, an open/close mechanism having a heat sink for performing radiation of heat of the IC package accommodated on the socket body, and a latch member for pressing the IC package accommodated on the socket body, in which opening and closing timings of the open/close mechanism and the latch member are set such that the latch member is first closed and the open/close mechanism is thereafter closed.

Abstract: An optical member manufacturing method of the present invention has a growth step of growing an ingot of a fluoride crystal, a plane orientation measurement step of measuring two or more crystal plane orientations of the ingot, a cutout step of cutting out an optical material from the ingot along any one of the crystal plane orientations obtained in the plane orientation measurement step, and a machining step of performing predetermined machining processing on the optical material to obtain an optical member.

Abstract: A socket for an electrical part of the present invention has a socket body provided with an accommodation portion in which an IC package is accommodated, an open/close mechanism having a heat sink for performing radiation of heat of the IC package accommodated on the socket body, and a latch member for pressing the IC package accommodated on the socket body, in which opening and closing timings of the open/close mechanism and the latch member are set such that the latch member is first closed and the open/close mechanism is thereafter closed.

Abstract: A method of evaluating a refractive index homogeneity of an optical member for photolithography, the method comprising: a measurement step of transmitting light having a predetermined wavelength &lgr; through the optical member so as to measure a wavefront aberration; a Zernike fitting step of expanding thus measured wavefront aberration into a polynomial of a Zernike cylindrical function system; a first separating step of separating individual components of the polynomial into a rotationally symmetric element, an odd-symmetric element, and an even-symmetric element; and a second separating step of separating individual components of the polynomial into a plurality of parts according to a degree thereof.

Abstract: A silica glass member manufacturing method of the present invention includes the steps of making a silicon compound react in oxyhydrogen flame using a burner having a multi-tubular structure to obtain fine silica glass particles, depositing the fine silica glass particles on a support rotating and placed to oppose the burner to obtain a silica glass ingot with a temperature distribution in at least one plane perpendicular to a rotational axis of the silica glass ingot, the temperature distribution being symmetrical with respect to the rotational axis and having a maximal value between a center and a peripheral portion of the plane, and obtaining a distribution of signed birefringence values on the basis of birefringence values and directions of phase advance axes measured at a plurality of points in the plane perpendicular to the rotational axis of the silica glass ingot and cutting, from the silica glass ingot, a silica glass member whose signed birefringence values monotonously increase from the center to t

Abstract: A thermal treatment apparatus includes a furnace of a refractory, a stage capable of carrying synthetic silica glass and moving between a first stage position for letting the synthetic silica glass into the furnace and a second stage position for letting the synthetic silica glass out of the furnace, a heat generator for heating the synthetic silica glass, and a driving section connected to the stage, for moving the stage between the first stage position and the second stage position. The thermal treatment apparatus also can include a rotational driving section for rotating the stage.

Abstract: An optical member manufacturing method of the present invention has a growth step of growing an ingot of a fluoride crystal, a plane orientation measurement step of measuring two ormore crystal plane orientations of the ingot, a cutout step of cutting out an optical material from the ingot along any one of the crystal plane orientations obtained in the plane orientation measurement step, and a machining step of performing predetermined machining processing on the optical material to obtain an optical member.

Abstract: A production method of synthetic silica glass according to the present invention comprises a first step of ejecting a silicon compound and a combustion gas containing oxygen and hydrogen from a burner to effect hydrolysis of the silicon compound in oxyhydrogen flame to produce fine particles of silica glass, and thereafter depositing and vitrifying the fine particles of silica glass on a target opposed to the burner to obtain a synthetic silica glass ingot; a second step of heating the synthetic silica glass ingot or the like obtained in the first step up to a first retention temperature of not less than 900° C., retaining the ingot or the like at the first retention temperature, and cooling the ingot or the like at a temperature decrease rate of not more than 10° C./h down to a temperature of not more than 500° C.; and a third step of heating the synthetic silica glass ingot or the like obtained in the second step up to a second retention temperature of not less than 500° C.

Abstract: A silica glass member for use with a light having a specific wavelength of 250 nm or shorter, in which the difference in the maximum and the minimum values of hydroxyl group concentration as measured in a plurality of points within a plane vertical to an optical axis whose center is the crossing point of its optical axis with the optical axis of the silica glass member is 50 ppm or lower; and in which the plurality of signed birefringence values obtained based on the birefringence values measured on several points within a plane vertical to an optical axis whose center is the crossing point of its optical axis with the optical axis of the silica glass member and the direction of the fast axis fall within a range of from −2.0 to +2.0 nm/cm. Thus, a silica glass member having high optical transmittance and a high resistance against ultraviolet radiations is provided.

Abstract: A method of evaluating a refractive index homogeneity of an optical member for photolithography, the method comprising:

Abstract: A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

Abstract: In a projection optical system having at least two silica glass optical members, a birefringence value is measured at each of points in a plane normal to the optical axis with the center at an intersection of each optical member with the optical axis, a distribution of signed birefringence values in each optical member is obtained by assigning a positive sign to each birefringence value when a direction of the fast axis thereof is a radial direction to the intersection with the optical axis and assigning a negative sign to each birefringence value when the direction of the fast axis thereof is normal to the radial direction, and the optical members are combined with each other so as to satisfy such a placement condition that a signed birefringence characteristic value of the entire projection optical system calculated based on the distributions of signed birefringence values is between −0.5 and +0.5 nm/cm both inclusive.

Abstract: The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 mn or less, such as an ArF (193 nm) excimer laser, is used The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.

Abstract: A silica glass has a structure determination temperature of 1200 K or lower and an OH group concentration of at least 1,000 ppm. The silica glass is used for photolithography together with light in a wavelength region of 400 nm or shorter.

Abstract: An illuminating apparatus is disclosed which comprises a light source, an optical system for condensing light emitted from the light source and illuminating an object with the condensed light, and an optical member which absorbs light having wavelengths from 260 to 340 nm among the light emitted from the light source, wherein the optical member is made of glass or crystalline material to which metal is doped.

Abstract: In a projection optical system having at least two silica glass optical members, a birefringence value is measured at each of points in a plane normal to the optical axis with the center at an intersection of each optical member with the optical axis, a distribution of signed birefringence values in each optical member is obtained by assigning a positive sign to each birefringence value when a direction of the fast axis thereof is a radial direction to the intersection with the optical axis and assigning a negative sign to each birefringence value when the direction of the fast axis thereof is normal to the radial direction, and the optical members are combined with each other so as to satisfy such a placement condition that a signed birefringence characteristic value of the entire projection optical system calculated based on the distributions of signed birefringence values is between −0.5 and +0.5 nm/cm both inclusive.

Abstract: In a projection optical system having at least two silica glass optical members, a birefringence value is measured at each of points in a plane normal to the optical axis with the center at an intersection of each optical member with the optical axis, a distribution of signed birefringence values in each optical member is obtained by assigning a positive sign to each birefringence value when a direction of the fast axis thereof is a radial direction to the intersection with the optical axis and assigning a negative sign to each birefringence value when the direction of the fast axis thereof is normal to the radial direction, and the optical members are combined with each other so as to satisfy such a placement condition that a signed birefringence characteristic value of the entire projection optical system calculated based on the distributions of signed birefringence values is between −0.5 and +0.5 nm/cm both inclusive.

Abstract: The present invention teaches a computerized automatic morphing photography booth for generating a synthesized composite or altered image from two or more initial images and a method therefor. The initial images to be converted may be real-time images taken on sight and/or stored images previously programmed into the memory of the computer. The computer maps out the essential characteristics of each image and converts the two images into the composite image by blending, merging and/or superimposing some or all of the characteristics mapped out for each initial image. The invention further teaches stationary or moving cameras which are capable of centering the composite in a picture frame.

Abstract: A method for producing a silica glass for photolithography, which comprises the following steps: jetting a starting material gas, an oxygen gas and a hydrogen gas from a burner and depositing and consolidating silica glass powder on a target to form an ingot having a growing direction, where the ingot is grown in such a manner that at least a part of glass synthesis face on the ingot having the silica glass powder deposited and consolidated is a plane substantially perpendicular to the growing direction of the ingot, thereby to obtain the ingot having a portion in which striae are substantially perpendicular to the growing direction of the ingot; and cutting out of the ingot the portion in which the striae are substantially perpendicular to the growing direction of the ingot, thereby to obtain a silica glass having striae which are substantially parallel to each other and are planar.

Abstract: In a method for evaluating the homogeneity of the refractive index of an optical member, the refractive index distribution of the optical member is measured, the measured refractive index distribution is separated into a rotationally symmetric element and a non-rotationally symmetric element in the optical axis direction before or after correction of the power element, and the rotationally symmetric element is further subjected to 2nd/4th-order element correction. Upon execution of such comprehensive evaluation, a photolithography optical member, which can realize a fine, sharp exposure-transfer pattern (e.g., a line width of 0.3 &mgr;m or less) is provided.