Abstract: A hydrogenated copolymer containing a hydrogenated copolymer (a) prepared by hydrogenating a copolymer of a vinyl aromatic compound and a conjugated diene compound, and a hydrogenated copolymer (b) prepared by hydrogenating a copolymer of a vinyl aromatic compound and a conjugated diene compound, wherein a mass ratio (a)/(b) of a content of the hydrogenated copolymer (a) to a content of the hydrogenated copolymer (b) is 5/95 to 95/5, the hydrogenated copolymer (a) has a hydrogenated polymer block (B1) and a hydrogenated polymer block (B2), the hydrogenated polymer block (B1) consists of a vinyl aromatic compound and a conjugated diene compound and has a content of the vinyl aromatic compound of 40 to 80 mass %, and the hydrogenated polymer block (B2) mainly contains a conjugated diene compound and has a vinyl bond content of 60 to 100 mol % before hydrogenation.

Abstract: In a method of manufacturing an electroforming mold, a first photoresist layer is formed on an upper surface of a bottom conductive film of a substrate, and the first photoresist layer is divided into a first soluble portion and a first insoluble portion. A conductive material is thermally deposited on an upper surface of the first photoresist layer within a predetermined temperature range, to thereby form an intermediate conductive film. An intermediate conductive film is patterned. A second photoresist layer is formed on an exposed upper surface of the first photoresist layer after the intermediate conductive film is removed, and on an upper surface of the intermediate conductive film remaining after patterning. The second photoresist layer is divided into a second soluble portion and a second insoluble portion. Next, the first and second photoresist layers are developed, and the first and second soluble portions are removed.

Abstract: In a method of manufacturing an electroforming mold, a first photoresist layer is formed on an upper surface of a bottom conductive film of a substrate, and the first photoresist layer is divided into a first soluble portion and a first insoluble portion. A conductive material is thermally deposited on an upper surface of the first photoresist layer within a predetermined temperature range, to thereby form an intermediate conductive film. An intermediate conductive film is patterned. A second photoresist layer is formed on an exposed upper surface of the first photoresist layer after the intermediate conductive film is removed, and on an upper surface of the intermediate conductive film remaining after patterning. The second photoresist layer is divided into a second soluble portion and a second insoluble portion. Next, the first and second photoresist layers are developed, and the first and second soluble portions are removed.

Abstract: In a method of manufacturing an electroforming mold, a first photoresist layer is formed on an upper surface of a bottom conductive film of a substrate, and the first photoresist layer is divided into a first soluble portion and a first insoluble portion. A conductive material is thermally deposited on an upper surface of the first photoresist layer within a predetermined temperature range, to thereby form an intermediate conductive film. An intermediate conductive film is patterned. A second photoresist layer is formed on an exposed upper surface of the first photoresist layer after the intermediate conductive film is removed, and on an upper surface of the intermediate conductive film remaining after patterning. The second photoresist layer is divided into a second soluble portion and a second insoluble portion. Next, the first and second photoresist layers are developed, and the first and second soluble portions are removed.

Abstract: A renewable adsorbent enabling to adsorb cesium selectively and efficiently, and to reuse cesium by eluting adsorbed cesium, and its manufacturing method are provided. Polyethylene (PE)/polypropylene (PP) based non-woven fabric may be exposed with electron beam, PE/PP based non-woven fabric to which electron beam was exposed is contacted to the monomer solution containing acrylonitrile (AN), dimethyl sulfoxide (DMSO), Tween80 (polyoxyethylene sorbitan monooleate) as a surfactant, and AMP (ammonium molybdophosphate n-hydrate) as an inorganic ion exchanger, and then the inorganic ion exchanger (AMP) is supported directly by the non-ionic graft chain.

Abstract: A renewable adsorbent enabling to adsorb cesium selectively and efficiently, and to reuse cesium by eluting adsorbed cesium, and its manufacturing method are provided. Polyethylene (PE)/polypropylene (PP) based non-woven fabric may be exposed with electron beam, PE/PP based non-woven fabric to which electron beam was exposed is contacted to the monomer solution containing acrylonitrile (AN), dimethyl sulfoxide (DMSO), Tween80 (polyoxyethylene sorbitan monooleate) as a surfactant, and AMP (ammonium molybdophosphate n-hydrate) as an inorganic ion exchanger, and then the inorganic ion exchanger (AMP) is supported directly by the non-ionic graft chain.

Abstract: The present invention is one capable of collecting the metal dissolving in a solution, wherein graft chains of a glycidylalkyl(meth)acrylate represented by the following general formula (1) are formed in the polymer substrate and the graft chain has an amino group or a sulfonic acid group: (In the general formula (1), R1 represents a hydrogen atom or a methyl group; R2 represents a linear or branched alkylene group having from 4 to 10 carbon atoms.

Abstract: To provide an electroforming mold for manufacturing a multi-step structure minute component and a method for manufacturing the same, for which height control is possible and manufacturing process does not become complicated. On the upper face of a film of an electroconductive layer 2 formed on the upper face of a substrate 1, a resist 3 is formed in which a first soluble portion 3b and a first insoluble portion 3a are formed. Next, a light-absorbing body 10 is formed on the upper face of the resist, exposure and development are carried out, in addition a film of an electroconductive layer 2 is formed on the upper face thereof, and a light-absorbing body 10 and an electroconductive layer 5 on the upper face of the light-absorbing body 10 are removed by liftoff. Further, a resist is formed on the upper face thereof, in which a second soluble portion 6b and a second insoluble portion 6a are formed.

Abstract: An electroforming mold has a first negative type photosensitive material formed on an electroconductive substrate, and a first through-hole extends through the firs photosensitive material to expose the electroconductive substrate. An electroconductive layer formed on an upper face of the first photosensitive material surrounds the first through-hole. A second negative type photosensitive material formed on an upper face of the electroconductive layer has a second through-hole that overlies and exposes both the first through-hole and a peripheral part of the electroconductive layer that surrounds the first through-hole. Because the electroconductive substrate and the electroconductive layer are separated from one another, the first and second through-holes precipitate an electroformed object independently during use of the electroforming mold resulting in a uniform electroformed object.

Abstract: In a method of manufacturing an electroforming mold, a first photoresist layer is formed on an upper surface of a bottom conductive film of a substrate, and the first photoresist layer is divided into a first soluble portion and a first insoluble portion. A conductive material is thermally deposited on an upper surface of the first photoresist layer within a predetermined temperature range, to thereby form an intermediate conductive film. An intermediate conductive film is patterned. A second photoresist layer is formed on an exposed upper surface of the first photoresist layer after the intermediate conductive film is removed, and on an upper surface of the intermediate conductive film remaining after patterning. The second photoresist layer is divided into a second soluble portion and a second insoluble portion. Next, the first and second photoresist layers are developed, and the first and second soluble portions are removed.

Abstract: To provide an electroforming mold for manufacturing a multi-step structure minute component and a method for manufacturing the same, for which height control is possible and manufacturing process does not become complicated. On the upper face of a film of an electroconductive layer 2 formed on the upper face of a substrate 1, a resist 3 is formed in which a first soluble portion 3b and a first insoluble portion 3a are formed. Next, a light-absorbing body 10 is formed on the upper face of the resist, exposure and development are carried out, in addition a film of an electroconductive layer 2 is formed on the upper face thereof, and a light-absorbing body 10 and an electroconductive layer 5 on the upper face of the light-absorbing body 10 are removed by liftoff. Further, a resist is formed on the upper face thereof, in which a second soluble portion 6b and a second insoluble portion 6a are formed.

Abstract: To provide an electroforming mold for manufacturing a multi-step structure minute component and a method for manufacturing the same, for which height control is possible and manufacturing process does not become complicated. On the upper face of a film of an electroconductive layer 2 formed on the upper face of a substrate 1, a resist 3 is formed in which a first soluble portion 3b and a first insoluble portion 3a are formed. Next, a light-absorbing body 10 is formed on the upper face of the resist, exposure and development are carried out, in addition a film of an electroconductive layer 2 is formed on the upper face thereof, and a light-absorbing body 10 and an electroconductive layer 5 on the upper face of the light-absorbing body 10 are removed by liftoff. Further, a resist is formed on the upper face thereof, in which a second soluble portion 6b and a second insoluble portion 6a are formed.