Patents by Inventor Hiroyuki Kashiwagi

Hiroyuki Kashiwagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250031489
    Abstract: A substrate has a moth-eye nano pattern on a surface of the substrate in which cone-shaped protrusions are periodically formed, a first semiconductor layer on the moth-eye nano pattern and having a photonic crystal layer, an active layer on the first semiconductor layer and having a light-emitting layer, and a second semiconductor layer on the active layer.
    Type: Application
    Filed: November 1, 2022
    Publication date: January 23, 2025
    Applicants: KYOTO UNIVERSITY, STANLEY ELECTRIC CO., LTD.
    Inventors: Susumu NODA, Hiroyuki KASHIWAGI, Shunya IDE, Tessei IWASAKI, Yasuyuki KAWAKAMI, Yusuke YOKOBAYASHI
  • Patent number: 11618698
    Abstract: A waste fluid treatment apparatus includes a sedimentation tank that stores the processing waste fluid with the processing debris contained therein, an inflow port provided on the sedimentation tank for introduction of the processing waste fluid into the sedimentation tank, an acidification unit configured to acidify the processing waste fluid to be introduced from the inflow port into the sedimentation tank, whereby the processing debris is allowed to settle at a higher rate compared with a rate at which the processing debris would settle if the processing waste water is neutral, and an outflow port provided on the sedimentation tank for discharge of acidic supernatant that is obtained by allowing the processing debris in the processing waste fluid to settle in the sedimentation tank from the sedimentation tank.
    Type: Grant
    Filed: December 9, 2020
    Date of Patent: April 4, 2023
    Assignee: DISCO CORPORATION
    Inventors: Kenji Takenouchi, Hiroyuki Kashiwagi, Jun Suwano
  • Patent number: 11390536
    Abstract: A waste liquid treating apparatus for purifying a waste liquid discharged from a processing apparatus includes a waste liquid accommodating tank for the waste liquid discharged by the processing apparatus, a spray water seal type pump that sucks a spray together with air in a processing region where a processing unit is disposed, a sealing water reservoir tank that recovers the spray and reserves the spray as a waste liquid, and a waste liquid filter unit that filters that waste liquid and the waste liquid in the waste liquid accommodating tank, to purify the waste liquid into fresh water. A fresh water reservoir tank reserves the fresh water obtained by filtering the waste liquid, and a pure water producing unit purifies the fresh water reserved in the fresh water reservoir tank into pure water. A temperature control unit controls the temperature of the pure water.
    Type: Grant
    Filed: July 21, 2020
    Date of Patent: July 19, 2022
    Assignee: DISCO CORPORATION
    Inventors: Tadaomi Matsumoto, Masaru Saito, Takeshi Furonaka, Hiroyuki Kashiwagi
  • Patent number: 11301466
    Abstract: A non-transitory computer-readable recording medium records an output control program for causing a computer to execute processing of: in a case where input of a question is accepted, extracting an accuracy of each of one or a plurality of answers to the question, the accuracy being stored in a storage unit; and selecting an answer to be output from the one or plurality of answers so that a total value of the accuracy of the one or plurality of answers to the question is equal to or larger than a first threshold.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: April 12, 2022
    Assignee: FUJITSU LIMITED
    Inventors: Yu Tomita, Masahiro Koya, Taki Kono, Hiroyuki Kashiwagi
  • Patent number: 11075864
    Abstract: A non-transitory computer readable recording medium records a conversation control program that causes a computer to execute processing including: receiving an instruction to change a specific input message among messages displayed in times series to another input message; and displaying the other input message and a response message to the other input message in time series.
    Type: Grant
    Filed: August 10, 2020
    Date of Patent: July 27, 2021
    Assignee: FUJITSU LIMITED
    Inventors: Taki Kono, Yu Tomita, Masahiro Koya, Hiroyuki Kashiwagi
  • Publication number: 20210188670
    Abstract: A waste fluid treatment apparatus includes a sedimentation tank that stores the processing waste fluid with the processing debris contained therein, an inflow port provided on the sedimentation tank for introduction of the processing waste fluid into the sedimentation tank, an acidification unit configured to acidify the processing waste fluid to be introduced from the inflow port into the sedimentation tank, whereby the processing debris is allowed to settle at a higher rate compared with a rate at which the processing debris would settle if the processing waste water is neutral, and an outflow port provided on the sedimentation tank for discharge of acidic supernatant that is obtained by allowing the processing debris in the processing waste fluid to settle in the sedimentation tank from the sedimentation tank.
    Type: Application
    Filed: December 9, 2020
    Publication date: June 24, 2021
    Inventors: Kenji TAKENOUCHI, Hiroyuki KASHIWAGI, Jun SUWANO
  • Publication number: 20210024374
    Abstract: A waste liquid treating apparatus for purifying a waste liquid discharged from a processing apparatus includes a waste liquid accommodating tank for the waste liquid discharged by the processing apparatus, a spray water seal type pump that sucks a spray together with air in a processing region where a processing unit is disposed, a sealing water reservoir tank that recovers the spray and reserves the spray as a waste liquid, and a waste liquid filter unit that filters that waste liquid and the waste liquid in the waste liquid accommodating tank, to purify the waste liquid into fresh water. A fresh water reservoir tank reserves the fresh water obtained by filtering the waste liquid, and a pure water producing unit purifies the fresh water reserved in the fresh water reservoir tank into pure water. A temperature control unit controls the temperature of the pure water.
    Type: Application
    Filed: July 21, 2020
    Publication date: January 28, 2021
    Inventors: Tadaomi MATSUMOTO, Masaru SAITO, Takeshi FURONAKA, Hiroyuki KASHIWAGI
  • Publication number: 20200374245
    Abstract: A non-transitory computer readable recording medium records a conversation control program that causes a computer to execute processing including: receiving an instruction to change a specific input message among messages displayed in times series to another input message; and displaying the other input message and a response message to the other input message in time series.
    Type: Application
    Filed: August 10, 2020
    Publication date: November 26, 2020
    Applicant: FUJITSU LIMITED
    Inventors: Taki KONO, Yu Tomita, Masahiro KOYA, Hiroyuki KASHIWAGI
  • Publication number: 20200311073
    Abstract: A non-transitory computer-readable recording medium records an output control program for causing a computer to execute processing of: in a case where input of a question is accepted, extracting an accuracy of each of one or a plurality of answers to the question, the accuracy being stored in a storage unit; and selecting an answer to be output from the one or plurality of answers so that a total value of the accuracy of the one or plurality of answers to the question is equal to or larger than a first threshold.
    Type: Application
    Filed: June 15, 2020
    Publication date: October 1, 2020
    Applicant: FUJITSU LIMITED
    Inventors: Yu Tomita, Masahiro KOYA, Taki KONO, Hiroyuki KASHIWAGI
  • Patent number: 10773425
    Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.
    Type: Grant
    Filed: January 2, 2018
    Date of Patent: September 15, 2020
    Assignees: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATION
    Inventors: Kensuke Demura, Satoshi Nakamura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
  • Patent number: 10668496
    Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: June 2, 2020
    Assignees: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATION
    Inventors: Satoshi Nakamura, Kensuke Demura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
  • Patent number: 10118317
    Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: November 6, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshihisa Kawamura, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi
  • Patent number: 10018908
    Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.
    Type: Grant
    Filed: January 23, 2017
    Date of Patent: July 10, 2018
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Naomi Shida, Kenji Todori, Shigehiko Mori, Reiko Yoshimura, Hiroyuki Kashiwagi, Ikuo Yoneda, Tsukasa Tada
  • Publication number: 20180117795
    Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.
    Type: Application
    Filed: January 2, 2018
    Publication date: May 3, 2018
    Applicants: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATION
    Inventors: Kensuke DEMURA, Satoshi Nakamura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
  • Publication number: 20180117796
    Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a stage that support a template having a convex portion where a concavo-convex pattern is formed; a supply head that supplies a liquid-repellent material in liquid form to the template on the stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; and a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, a volatile solvent that dissolves the liquid-repellent component, and a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.
    Type: Application
    Filed: January 2, 2018
    Publication date: May 3, 2018
    Applicants: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATION
    Inventors: Kensuke DEMURA, Satoshi NAKAMURA, Daisuke MATSUSHIMA, Masayuki HATANO, Hiroyuki KASHIWAGI
  • Patent number: 9960007
    Abstract: An electron beam irradiation device includes a stage, a main body unit, and a first mechanism. The main body unit includes a substrate, first members, and a first layer. The first members are arranged to be separated in a second direction intersecting a first direction and is provided at a first surface of the substrate opposing the stage. The first layer is provided between the stage and the first members and between the stage and the substrate. The first layer converts a light ray into an electron beam. The first mechanism is provided in the stage and moves the stage in the second direction. A distance of the movement is not less than a spacing between a center in the second direction of the first member and a center in the second direction of one other first member adjacent to the first member.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: May 1, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Kazuto Matsuki, Ryoichi Susuki, Hiroyuki Kashiwagi, Takashi Sato
  • Publication number: 20180022016
    Abstract: According to one embodiment, a template for imprint includes a base, a convex portion, and a liquid-repellent layer. The base has a main surface. The convex portion is provided on the main surface. The convex portion has an end surface on a side opposite to the main surface, and a concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The liquid-repellent layer is formed on at least the side surface of the convex portion so as to avoid the concavo-convex pattern. The liquid-repellent layer repels the liquid material to be transferred.
    Type: Application
    Filed: September 29, 2017
    Publication date: January 25, 2018
    Applicants: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATION
    Inventors: Satoshi NAKAMURA, Kensuke DEMURA, Daisuke MATSUSHIMA, Masayuki HATANO, Hiroyuki KASHIWAGI
  • Publication number: 20180016673
    Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a support unit, a vaporization unit, and an adhesion preventing plate. The support unit supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The support unit supports the template with the convex portion facing downward. The vaporization unit is located below the template on the support unit and configured to vaporize a liquid-repellent material. The adhesion preventing plate is located below the template on the support unit and configured to allow the liquid-repellent material vaporized to adhere to the side surface of the convex portion of the template and to prevent it from adhering to the concavo-convex pattern.
    Type: Application
    Filed: September 26, 2017
    Publication date: January 18, 2018
    Applicants: SHIBAURA MECHATRONICS CORPORATION, TOSHIBA MEMORY CORPORATION
    Inventors: Satoshi NAKAMURA, Kensuke DEMURA, Daisuke MATSUSHIMA, Masayuki HATANO, Hiroyuki KASHIWAGI, Chen KANG, Ganachev Ivan PETROV
  • Publication number: 20180015497
    Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.
    Type: Application
    Filed: September 27, 2017
    Publication date: January 18, 2018
    Applicants: Shibaura Mechatronics Corporation, Toshiba Memory Corporation
    Inventors: Satoshi Nakamura, Kensuke Demura, Daisuke Matsushima, Masayuki Hatano, Hiroyuki Kashiwagi
  • Publication number: 20170131630
    Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.
    Type: Application
    Filed: January 23, 2017
    Publication date: May 11, 2017
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi SHIDA, Kenji TODORI, Shigehiko MORI, Reiko YOSHIMURA, Hiroyuki KASHIWAGI, lkuo YONEDA, Tsukasa TADA