Patents by Inventor Hiroyuki Kawaura

Hiroyuki Kawaura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240043966
    Abstract: The manufacturing method of a porous silicon material of the present disclosure includes a particle forming step of melting a raw material containing Al as a first element in an amount of 50% by mass or more and Si in an amount of 50% by mass or less to obtain a silicon alloy, a pore forming step of removing the first element from the silicon alloy to obtain a porous material, and a heat treatment step of heating the porous material to diffuse elements other than Si to a surface of the porous material.
    Type: Application
    Filed: October 20, 2023
    Publication date: February 8, 2024
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Hiroyuki KAWAURA, Yasuhito KONDO, Ryo SUZUKI, Hiroshi NOZAKI, Jun YOSHIDA, Tetsuya WASEDA, Mitsutoshi OTAKI
  • Patent number: 11851733
    Abstract: The manufacturing method of a porous silicon material of the present disclosure includes a particle forming step of melting a raw material containing Al as a first element in an amount of 50% by mass or more and Si in an amount of 50% by mass or less to obtain a silicon alloy, a pore forming step of removing the first element from the silicon alloy to obtain a porous material, and a heat treatment step of heating the porous material to diffuse elements other than Si to a surface of the porous material.
    Type: Grant
    Filed: June 20, 2022
    Date of Patent: December 26, 2023
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Hiroyuki Kawaura, Yasuhito Kondo, Ryo Suzuki, Hiroshi Nozaki, Jun Yoshida, Tetsuya Waseda, Mitsutoshi Otaki
  • Publication number: 20230265542
    Abstract: The manufacturing method of a porous silicon material of the present disclosure includes a particle forming step of melting a raw material containing Al as a first element in an amount of 50% by mass or more and Si in an amount of 50% by mass or less to obtain a silicon alloy, a pore forming step of removing the first element from the silicon alloy to obtain a porous material, and a heat treatment step of heating the porous material to diffuse elements other than Si to a surface of the porous material.
    Type: Application
    Filed: April 28, 2023
    Publication date: August 24, 2023
    Applicant: TOTOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Hiroyuki Kawaura, Yasuhito Kondo, Ryo Suzuki, Hiroshi Nozaki, Jun Yoshida, Tetsuya Waseda, Mitsutoshi Otaki
  • Publication number: 20220411897
    Abstract: The manufacturing method of a porous silicon material of the present disclosure includes a particle forming step of melting a raw material containing Al as a first element in an amount of 50% by mass or more and Si in an amount of 50% by mass or less to obtain a silicon alloy, a pore forming step of removing the first element from the silicon alloy to obtain a porous material, and a heat treatment step of heating the porous material to diffuse elements other than Si to a surface of the porous material.
    Type: Application
    Filed: June 20, 2022
    Publication date: December 29, 2022
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Hiroyuki Kawaura, Yasuhito Kondo, Ryo Suzuki, Hiroshi Nozaki, Jun Yoshida, Tetsuya Waseda, Mitsutoshi Otaki
  • Publication number: 20210384499
    Abstract: A main object of the present disclosure is to provide a method for producing an active material with a high productivity. The present disclosure achieves the object by providing a method for producing an active material, the method comprising steps of: a preparing step of preparing a dope solution including a metal ion that is an ion of a metal element M, and an aromatic hydrocarbon compound in a reduced condition, a precursor alloy producing step of producing a precursor alloy by doping the metal element M included in the dope solution to a Si raw material including a Si element, and a void forming step of forming a void by extracting the metal element M from the precursor alloy using an extracting agent.
    Type: Application
    Filed: May 28, 2021
    Publication date: December 9, 2021
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Tetsuya WASEDA, Jun YOSHIDA, Hiroyuki KAWAURA, Yasuhito KONDO, Ryo SUZUKI, Hiroyuki NAKANO, Nobuhiro OGIHARA
  • Publication number: 20200287204
    Abstract: A negative electrode active substance material used for an electricity storage device of the present disclosure includes a silicon phase and a silicide phase represented by a basic composition formula MSi2, where M is one or more of Cr, Ti, Zr, Nb, Mo, and Hf. The negative electrode active substance material may have a structure in which the silicide phase is dispersed in the silicon phase.
    Type: Application
    Filed: February 28, 2020
    Publication date: September 10, 2020
    Inventors: Hiroyuki KAWAURA, Yasuhito KONDO, Yoshinari MAKIMURA, Tetsuya WASEDA, Masaki ADACHI, Jun YOSHIDA, Hiroyuki YAMAGUCHI
  • Patent number: 7331274
    Abstract: A sliding film includes a solid lubricant, a binder resin, and a low-melting-point material. The binder resin is for holding the solid lubricant on a surface of a substrate, and exhibits a glass transition temperature. The low-melting-point material exhibits a melting point lower than the glass transition temperature of the binder resin. The low-melting-point material demonstrates a latent heat which can absorb frictional heat generated between sliding members, and accordingly retards the degradation of the binder resin. As a result, the sliding film produces high seizure resistance.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: February 19, 2008
    Assignees: Kabushiki Kaisha Toyota Jidoshokki, Kabushiki Kaisha Toyota Chuo Kenkyusho
    Inventors: Manabu Sugiura, Takahiro Sugioka, Hiroyuki Kawaura, Takao Kobayashi, Goro Watanabe, Kenichi Suzuki, Hideo Tachikawa, Hideo Hasegawa
  • Publication number: 20050257684
    Abstract: A sliding film includes a solid lubricant, a binder resin, and a low-melting-point material. The binder resin is for holding the solid lubricant on a surface of a substrate, and exhibits a glass transition temperature. The low-melting-point material exhibits a melting point lower than the glass transition temperature of the binder resin. The low-melting-point material demonstrates a latent heat which can absorb frictional heat generated between sliding members, and accordingly retards the degradation of the binder resin. As a result, the sliding film produces high seizure resistance.
    Type: Application
    Filed: May 20, 2005
    Publication date: November 24, 2005
    Inventors: Manabu Sugiura, Takahiro Sugioka, Hiroyuki Kawaura, Takao Kobayashi, Goro Watanabe, Kenichi Suzuki, Hideo Tachikawa, Hideo Hasegawa
  • Patent number: 6410154
    Abstract: The invention relates to TiAl-base alloys with excellent oxidation resistance, and a method for producing the same. The TiAl-base alloy of the invention comprises a substrate and a surface part formed on the substrate, the surface part comprising at least one element of Cr, Nb, Ta and W and having a surface condition capable of forming a dense film of an oxide of the element or Al2O3 in high-temperature oxidizing atmospheres. The method of the invention comprises heating a TiAl-base alloy material having an Al content of from 15 at. % to 55 at. % in the presence of an oxide having a smaller negative value of standard free energy of formation than that of alumina. The method of the invention provides TiAl-base alloys with excellent oxidation resistance.
    Type: Grant
    Filed: November 28, 1997
    Date of Patent: June 25, 2002
    Assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho
    Inventors: Hiroyuki Kawaura, Kazuaki Nishino, Takashi Saito
  • Publication number: 20020009383
    Abstract: The invention relates to TiAl-base alloys with excellent oxidation resistance, and a method for producing the same. The TiAl-base alloy of the invention comprises a substrate and a surface part formed on the substrate, the surface part comprising at least one element of Cr, Nb, Ta and W and having a surface condition capable of forming a dense film of an oxide of the element or Al2O3 in high-temperature oxidizing atmospheres. The method of the invention comprises heating a TiAl-base alloy material having an Al content of from 15 at. % to 55 at. % in the presence of an oxide having a smaller negative value of standard free energy of formation than that of alumina. The method of the invention provides TiAl-base alloys with excellent oxidation resistance. The TiAl-base alloys of the invention have significantly improved oxidation resistance and are resistant to heat at high temperatures of 900° C. or higher.
    Type: Application
    Filed: November 28, 1997
    Publication date: January 24, 2002
    Inventors: HIROYUKI KAWAURA, KAZUAKI NISHINO, TAKASHI SAITO
  • Patent number: 6309699
    Abstract: The invention provides a method of producing an oxidation-resistant metallic part which exhibits oxidation resistance even in an oxidation atmosphere. The method includes the step of applying mechanical energy to a surface of a metallic part in the presence of particulates, and forming a protective coating in a surface of the metallic part. When the metallic part thus treated is exposed in a high temperature-oxidation atmosphere, the protective coating is oxidized to restrain the proceeding of the oxidation of the metallic part, that is the internally proceeding formation of TiO2, thus serving a remarkable improvement of the oxidation resistance.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: October 30, 2001
    Assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho
    Inventors: Hiroyuki Kawaura, Hiroshi Kawahara, Takashi Saito, Kazuaki Nishino, Nobuhiko Matsumoto, Tadahiko Furuta
  • Publication number: 20010001968
    Abstract: The invention provides a method of producing an oxidation-resistant metallic part which exhibits sufficiently good oxidation resistance even in an oxidation atmosphere. The method includes the step of applying mechanical energy to a surface of a metallic part in the presence of particulates, and forming a protective coating in a surface of the metallic part. When the metallic part thus treated is exposed in a high temperature-oxidation atmosphere, the protective coating is oxidized to restrain the proceeding of the oxidation of the metallic part, that is the internally proceeding formation of TiO 2, thus serving a remarkable improvement of the oxidation resistance.
    Type: Application
    Filed: February 22, 1999
    Publication date: May 31, 2001
    Inventors: HIROYUKI KAWAURA, HIROSHI KAWAHARA, TAKASHI SAITO, KAZUAKI NISHINO, NOBUHIKO MATSUMOTO, TADAHIKO FURUTA
  • Patent number: 5980659
    Abstract: Surface-treating metallic parts are produced by applying mechanical energy to the surface of a metallic part and to a substance on or near the surface of the metallic part. The substance is different from the metallic part in composition. The applying step forms a mechanically-alloyed layer from the metallic part and the substance in the surface of the metallic part. The surface-modified layer such as the mechanically-alloyed layer is a non-peeling alloyed layer having a composition or structure different from that of the metallic part. The method is effective in surface-treating light metal materials of which the surfaces are difficult to treat. For example, the method is applicable to soft Mg alloys and Al alloys to improve their surface hardness, and the thus-treated alloys are usable in slide parts which are required to have good wear resistance.
    Type: Grant
    Filed: July 15, 1997
    Date of Patent: November 9, 1999
    Assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho
    Inventors: Hiroyuki Kawaura, Hiroshi Kawahara, Kazuaki Nishino, Takashi Saito
  • Patent number: 4892759
    Abstract: Particles of a layer-forming agent containing at least one element for forming a surface layer of e.g. a carbide on the material to be treated are disposed in a furnace below and/or at the side of the material to be treated. A fluidizing gas is introduced into the furnace below the layer-forming agent for fluidizing a powder of alumina or other refractory material to form a fluidized bed above the layer-forming agent, while the agent is not fluidized. The furnace is heated and a solid halide is supplied into the furnace below the layer-forming agent. The halide is sublimable to produce a gas which activates the element, so that it may combine with a particular element which the material to be treated contains, whereby the surface layer is formed thereon. An apparatus for forming such a surface layer is also provided.
    Type: Grant
    Filed: August 5, 1988
    Date of Patent: January 9, 1990
    Inventors: Tohru Arai, Hiromasa Takeda, Hiroyuki Kawaura