Patents by Inventor Hiroyuki Kenmochi
Hiroyuki Kenmochi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090317733Abstract: Disclosed is a compound having excellent electron transporting ability, which is useful for electrophotographic photosensitive bodies or organic EL devices. Specifically disclosed is a novel quinone compound having a structure represented by general formula (I). Also disclosed is a highly sensitive, positive charge type electrophotographic photosensitive body for copying machines and printers, wherein the novel organic material is used as a charge-transporting material in a photosensitive layer. Also specifically disclosed is an electrophotographic photosensitive body having a photosensitive layer formed on a conductive base and containing a charge-generating material and a charge-transporting material, wherein the photosensitive layer contains at least one of the above-described compounds. Further disclosed is an electrophotographic apparatus using such a positive charge type electrophotographic photosensitive body.Type: ApplicationFiled: January 17, 2007Publication date: December 24, 2009Applicant: Fuji Electric Device Technology Co., Ltd.Inventors: Kenichi Okura, Yoichi Nakamura, Motohiro Takeshima, Yoshiki Hasegawa, Hiroyuki Kenmochi, Tohru Kobayashi
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Patent number: 7105684Abstract: An object of the present invention is to provide a novel monomer compound having a lactone structure which gives polymers having more excellent feature as resist material, etc. The present invention relates to a compound represented by the following formula [1]: wherein R1 and R2 are an alkyl group; R3 and R4 are each independently hydrogen atom or an alkyl group; R5 is hydrogen atom, acryloyl group or methacryloyl group; and X is a methylene group which may have an alkyl group or an ethylene group which may have an alkyl group. The present invention provides a compound having a lactone structure which gives a polymer having more excellent feature particularly as a resist material and also provides a hydroxy lactone being useful as a material, etc. therefor.Type: GrantFiled: July 26, 2004Date of Patent: September 12, 2006Assignee: Takasago International CorporationInventors: Tomoya Sawaki, Hiroyuki Kenmochi, Yoji Hori
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Patent number: 6992197Abstract: A novel monomer compound having a lactone moiety of the present invention can be converted into polymers usable as resist materials with excellent properties, etc., and an alcohol compound having a lactone moiety of the invention is useful as a material for the monomer compound. The compounds are represented by the following general formula [1]: wherein one of R1 and R2 represents a hydrogen atom, an acryloyl group, or a methacryloyl group, and the other represents an alkyl group; R3 and R4 independently represent a hydrogen atom or an alkyl group; R5 and R6 both represent a hydrogen atom or are combined to form a methylene chain that may have an alkyl group; and R7 and R8 independently represent a hydrogen atom or a methyl group.Type: GrantFiled: June 10, 2004Date of Patent: January 31, 2006Assignee: Takasago International CorporationInventors: Junji Nakamura, Shigetaka Numasawa, Hiroyuki Kenmochi, Yoji Hori
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Publication number: 20050059830Abstract: An object of the present invention is to provide a novel monomer compound having a lactone structure which gives polymers having more excellent feature as resist material, etc. The present invention relates to a compound represented by the following formula [1]: wherein R1 and R2 are an alkyl group; R3 and R4 are each independently hydrogen atom or an alkyl group; R5 is hydrogen atom, acryloyl group or methacryloyl group; and X is a methylene group which may have an alkyl group or an ethylene group which may have an alkyl group. The present invention provides a compound having a lactone structure which gives a polymer having more excellent feature particularly as a resist material and also provides a hydroxy lactone being useful as a material, etc. therefor.Type: ApplicationFiled: July 26, 2004Publication date: March 17, 2005Applicant: TAKASAGO INTERNATIONAL CORPORATIONInventors: Tomoya Sawaki, Hiroyuki Kenmochi, Yoji Hori
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Publication number: 20050032887Abstract: A novel monomer compound having a lactone moiety of the present invention can be converted into polymers usable as resist materials with excellent properties, etc., and an alcohol compound having a lactone moiety of the invention is useful as a material for the monomer compound. The compounds are represented by the following general formula [1]: wherein one of R1 and R2 represents a hydrogen atom, an acryloyl group, or a methacryloyl group, and the other represents an alkyl group; R3 and R4 independently represent a hydrogen atom or an alkyl group; R5 and R6 both represent a hydrogen atom or are combined to form a methylene chain that may have an alkyl group; and R7 and R8 independently represent a hydrogen atom or a methyl group.Type: ApplicationFiled: June 10, 2004Publication date: February 10, 2005Applicant: Takasago International CorporationInventors: Junji Nakamura, Shigetaka Numasawa, Hiroyuki Kenmochi, Yoji Hori
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Patent number: 5959161Abstract: To offer a method of producing useful para-menthane-3,8-diol having the excellent repellent action to harmful living things, including noxious insects, in high purity and high yield, simply, and economically by the use of citronellal as a raw material compound.The above-mentioned problems are resolved by the production method of this invention wherein citronellal is treated with aqueous sulfuric acid solution of 0.02 to 1.0 wt. % in concentration to produce para-menthane-3,8-diol. In case of recovering the produced para-menthane-3,8-diol, a method is preferably adopted, wherein after the reaction product is extracted with an aliphatic hydrocarbon solvent of 5 to 8 in carbon number, the extract is cooled down at temperature higher than the melting point of said aliphatic hydrocarbon solvent and of -10.degree. C. or less to crystallize para-menthane-3,8-diol.Type: GrantFiled: October 27, 1998Date of Patent: September 28, 1999Assignee: Takasago International CorporationInventors: Hiroyuki Kenmochi, Teruyoshi Akiyama, Yoshifumi Yuasa, Toyohiko Kobayashi, Akio Tachikawa