Patents by Inventor Hiroyuki Miyagishi

Hiroyuki Miyagishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
    Patent number: 11814725
    Abstract: There is provided a technique of cleaning an interior of a supply part by performing a cycle a predetermined number of times, the cycle including: (a) supplying a first gas, which is one of a cleaning gas and an additive gas that reacts with the cleaning gas, from the supply part toward an interior of a process container in which a substrate has been processed by supplying a processing gas from the supply part to the substrate; and (b) supplying a second gas, which is the other one of the cleaning gas and the additive gas and is different from the first gas, from the supply part toward the interior of the process container in a state in which a part of the first gas remains in the supply part after supply of the first gas is stopped.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: November 14, 2023
    Assignee: KOKUSAI ELECTRIC CORPORATION
    Inventors: Koei Kuribayashi, Takeo Hanashima, Hiroyuki Miyagishi, Hiroto Yamagishi
  • METHOD OF CLEANING, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
    Publication number: 20190368036
    Abstract: There is provided a technique of cleaning an interior of a supply part by performing a cycle a predetermined number of times, the cycle including: (a) supplying a first gas, which is one of a cleaning gas and an additive gas that reacts with the cleaning gas, from the supply part toward an interior of a process container in which a substrate has been processed by supplying a processing gas from the supply part to the substrate; and (b) supplying a second gas, which is the other one of the cleaning gas and the additive gas and is different from the first gas, from the supply part toward the interior of the process container in a state in which a part of the first gas remains in the supply part after supply of the first gas is stopped.
    Type: Application
    Filed: June 4, 2019
    Publication date: December 5, 2019
    Applicant: KOKUSAI ELECTRIC CORPORATION
    Inventors: Koei Kuribayashi, Takeo Hanashima, Hiroyuki Miyagishi, Hiroto Yamagishi