Patents by Inventor Hiroyuki Muto

Hiroyuki Muto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110164287
    Abstract: It is difficult to appropriately estimate the colorimetric values of an arbitrary patch at a desired temperature with respect to a medium containing a fluorescent whitening agent in consideration of the influence of the fluorescent whitening agent. A target temperature and media type are designated (S601, S602), patches of a plurality of colors are formed on a set medium, and a temperature immediately after fixing (second temperature), patch colorimetric values, and medium white colorimetric values are acquired (S606, S607). Medium white calorimetric values at the target temperature are generated based on the acquired medium white calorimetric values and medium white colorimetric values at a first temperature, which are acquired in advance (S608). Patch calorimetric values at the target temperature are estimated based on the generated medium white colorimetric values and patch colorimetric values.
    Type: Application
    Filed: September 28, 2009
    Publication date: July 7, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kenji Baba, Kazushige Hatori, Hiroyuki Muto
  • Publication number: 20110149319
    Abstract: It is difficult to appropriate estimate the colorimetric values of an arbitrary patch at a desired temperature with respect to an arbitrary medium in consideration of the influence of a fluorescent whitening agent contained in the medium. Target patch colorimetric values obtained when patches of a plurality of colors formed on a medium using color samples are measured at a target temperature designated in step S101. This estimation is implemented when both media-dependent variation correction processing (S102) that estimates patch colorimetric values based on the temperature characteristics of the medium, and toner-dependent variation correction processing (S103) that estimates patch colorimetric values based on the temperature characteristics of the color samples are executed. By correcting image data whose image is to be formed based on the target patch colorimetric values (S104), an arbitrary color patch on an arbitrary medium can be coped with.
    Type: Application
    Filed: September 28, 2009
    Publication date: June 23, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiroyuki Muto, Kazushige Hatori, Kenji Baba
  • Patent number: 7862249
    Abstract: There is provided a ballpoint pen tip in which a shoulder of a bent portion does not touch a paper surface during writing and bleeding caused by deformation of an inner periphery of the bent portion can be prevented, and an ink refill using thereof. The ballpoint pen tip 20 comprises a first tapered surface 22 formed by tapering an outer periphery at a front end of a holder 21, a connecting surface 23 that is formed at a front end side of the first tapered surface 22 and has an outside angle larger than 180° with respect to the first tapered surface 22, a second tapered surface 24 that is formed at a front end side of the connecting surface 23 and has an outside angle smaller than 180° with respect to the connecting surface 23, and a bent portion 25 in which a front end portion of the second tapered surface 24 is bent inwardly so as to hold a writing ball 35 inserted into a ball house 29.
    Type: Grant
    Filed: August 27, 2007
    Date of Patent: January 4, 2011
    Assignee: Mitsubishi Pencil Kabushikikaisha
    Inventors: Mitsuhiro Ohashi, Atsushi Nakajima, Kazuhiko Furukawa, Hiroyuki Muto
  • Publication number: 20100254750
    Abstract: There is provided a ballpoint pen tip in which a shoulder of a bent portion does not touch a paper surface during writing and bleeding caused by deformation of an inner periphery of the bent portion can be prevented, and an ink refill using thereof. The ballpoint pen tip 20 comprises a first tapered surface 22 formed by tapering an outer periphery at a front end of a holder 21, a connecting surface 23 that is formed at a front end side of the first tapered surface 22 and has an outside angle larger than 180° with respect to the first tapered surface 22, a second tapered surface 24 that is formed at a front end side of the connecting surface 23 and has an outside angle smaller than 180° with respect to the connecting surface 23, and a bent portion 25 in which a front end portion of the second tapered surface 24 is bent inwardly so as to hold a writing ball 35 inserted into a ball house 29.
    Type: Application
    Filed: August 27, 2007
    Publication date: October 7, 2010
    Inventors: Mitsuhiro Ohashi, Atsushi Nakajima, Kazuhiko Furukawa, Hiroyuki Muto
  • Publication number: 20100166443
    Abstract: An image processing apparatus is provided in which the accuracy of measurement of an amount of toner adhesion is improved by forming a toner image pattern according to a detection scheme for the amount of toner adhesion. In the image processing apparatus, a toner image pattern control unit 215 determines a detection scheme for the amount of toner adhesion of a toner image based on attribute information of the toner image, decides a toner image pattern according to the results of that determination, and forms that decided toner image pattern. A toner adhesion amount calculation unit 605 measures the amount of toner adhesion for the toner image pattern formed by the toner image pattern control unit 215.
    Type: Application
    Filed: December 2, 2009
    Publication date: July 1, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Hiroyuki Muto
  • Publication number: 20100086201
    Abstract: The colorimetric values of a plurality of reference color patches formed on a specific medium are measured at a plurality of temperatures, and a temperature characteristic LUT in a colorimetric value temperature correction unit is created based on the colorimetric values. Upon creating a calibration LUT, a patch based on arbitrary device values is formed on the medium, and a patch temperature and colorimetric values are acquired immediately after fixing of that patch. A correction target temperature as a temperature upon observation of the medium is, for example, fixed, the colorimetric values are corrected by interpolation processing based on the temperature characteristic LUT to obtain colorimetric values, and a calibration LUT is created based on the colorimetric values.
    Type: Application
    Filed: September 21, 2009
    Publication date: April 8, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Hiroyuki Muto, Kazushige Hatori, Kenji Baba
  • Publication number: 20100053652
    Abstract: In a chart for color calibration which is output and calorimetrically measured for color calibration of a printer device, respective charts of a color chart are arranged obliquely with respect to the alignment direction of grid points in a printer device color space or in a state that a plane in which charts are arranged on grid points and a plane in which charts are not arranged on grid points are alternately combined, on a color space of the color chart. With this configuration, a novel chart for color calibration which assures higher accuracy despite having a smaller number of steps (number of charts), and an image processing method and image processing apparatus using the chart are provided.
    Type: Application
    Filed: August 24, 2009
    Publication date: March 4, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazushige Hatori, Hiroyuki Muto
  • Patent number: 7546673
    Abstract: In a manufacturing method of an electric motor, at a time of in-sequence arc welding each of one end of a plurality of lined-up connector terminals to each of a plurality of lined-up detection signal output terminals by a welding rod provided in a torch of an arc welding machine, the method connects each of the other ends corresponding to the respective one end of a plurality of connector terminals to each of earth terminals of the arc welding machine in sequence.
    Type: Grant
    Filed: March 6, 2008
    Date of Patent: June 16, 2009
    Assignee: Showa Corporation
    Inventors: Hiroyuki Muto, Masami Nakano
  • Publication number: 20090056104
    Abstract: In a manufacturing method of an electric motor, at a time of in-sequence arc welding each of one end of a plurality of lined-up connector terminals to each of a plurality of lined-up detection signal output terminals by a welding rod provided in a torch of an arc welding machine, the method connects each of the other ends corresponding to the respective one end of a plurality of connector terminals to each of earth terminals of the arc welding machine in sequence.
    Type: Application
    Filed: March 6, 2008
    Publication date: March 5, 2009
    Applicant: SHOWA CORPORATION
    Inventors: Hiroyuki Muto, Masami Nakano
  • Publication number: 20090020698
    Abstract: An object of the present invention relates to realizing the processing of a sample by charged particle beams and the monitoring of the processed cross-section with a high throughput. It is possible to process an accurate sample without an intended region lost even when the location and the size of the intended region are unknown by: observing a cross-sectional structure being processed by FIBs by using a secondary particle image generated from a sample by the ion beams shaving a cross section; forming at least two cross sections; and processing the sample while the processing and the monitoring of a processed cross section are carried out.
    Type: Application
    Filed: July 18, 2008
    Publication date: January 22, 2009
    Inventors: Hiroyuki MUTO, Tsuyoshi Ohnishi, Isamu Sekihara
  • Patent number: 7235798
    Abstract: In order to implement faster high precision milling and high resolution image observation in the structure analysis and failure analysis of the MEMS and semiconductor devices, a two-lens optical system is mounted on a focused ion beam apparatus, and in the optical system the distance from an emitter apex in an ion source to an earth electrode included in a condenser lens and disposed nearest to the ion source is in the range of 5 to 14 mm.
    Type: Grant
    Filed: June 14, 2005
    Date of Patent: June 26, 2007
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tohru Ishitani, Hiroyuki Muto, Yuichi Madokoro
  • Patent number: 7084399
    Abstract: For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.
    Type: Grant
    Filed: October 27, 2004
    Date of Patent: August 1, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Muto, Tohru Ishitani, Yuichi Madokoro
  • Publication number: 20050279952
    Abstract: In order to implement faster high precision milling and high resolution image observation in the structure analysis and failure analysis of the MEMS and semiconductor devices, a two-lens optical system is mounted on a focused ion beam apparatus, and in the optical system the distance from an emitter apex in an ion source to an earth electrode included in a condenser lens and disposed nearest to the ion source is in the range of 5 to 14 mm.
    Type: Application
    Filed: June 14, 2005
    Publication date: December 22, 2005
    Inventors: Tohru Ishitani, Hiroyuki Muto, Yuichi Madokoro
  • Publication number: 20050092922
    Abstract: For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.
    Type: Application
    Filed: October 27, 2004
    Publication date: May 5, 2005
    Inventors: Hiroyuki Muto, Tohru Ishitani, Yuichi Madokoro
  • Patent number: 6887008
    Abstract: There is provided a ballpoint pen tip that minimizes thin spots such as impact thin spots even if upward writing or an impact causes entry of air, allows rapid return to normal writing, and minimizes manufacturing costs. A writing ball and a check ball included in the ballpoint pen tip are placed close to each other with a slight clearance therebetween to leave an inner space with a slight capacity. Thus, even if air enters from a caulking portion, the volume of the air stored inside is slight, and an air pool can be rapidly eliminated. Further, both the writing ball and the check ball can be provided in a front end of the ballpoint pen tip, and assembly operations can be easily performed without inverting the ballpoint pen tip.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: May 3, 2005
    Assignee: Mitsubishi Pencil Kabushikikaisha
    Inventors: Toru Kitao, Hiroyuki Muto
  • Patent number: 6822245
    Abstract: For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: November 23, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Muto, Tohru Ishitani, Yuichi Madokoro
  • Publication number: 20040081507
    Abstract: There is provided a ballpoint pen tip that minimizes thin spots such as impact thin spots even if upward writing or an impact causes entry of air, allows rapid return to normal writing, and minimizes manufacturing costs. A writing ball and a check ball included in the ballpoint pen tip are placed close to each other with a slight clearance therebetween to leave an inner space with a slight capacity. Thus, even if air enters from a caulking portion, the volume of the air stored inside is slight, and an air pool can be rapidly eliminated. Further, both the writing ball and the check ball can be provided in a front end of the ballpoint pen tip, and assembly operations can be easily performed without inverting the ballpoint pen tip.
    Type: Application
    Filed: October 20, 2003
    Publication date: April 29, 2004
    Inventors: Toru Kitao, Hiroyuki Muto
  • Patent number: 6598460
    Abstract: An explosion-proof apparatus includes a pressure resistant explosion-proof case, heater, manifold, and analyzer unit. The heater is disposed in the pressure resistant explosion-proof case. The manifold is heated by the heater in the pressure resistant explosion-proof case and supplies heat from the heater to an outside of the pressure resistant explosion-proof case by heat conduction. The analyzer unit is disposed outside the pressure resistant explosion-proof case in contact with the manifold, and is heated by heat supplied from the manifold.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: July 29, 2003
    Assignee: Yamatake Corporation
    Inventor: Hiroyuki Muto
  • Publication number: 20020043097
    Abstract: An explosion-proof apparatus includes a pressure resistant explosion-proof case, heater, manifold, and analyzer unit. The heater is disposed in the pressure resistant explosion-proof case. The manifold is heated by the heater in the pressure resistant explosion-proof case and supplies heat from the heater to an outside of the pressure resistant explosion-proof case by heat conduction. The analyzer unit is disposed outside the pressure resistant explosion-proof case in contact with the manifold, and is heated by heat supplied from the manifold.
    Type: Application
    Filed: January 31, 2001
    Publication date: April 18, 2002
    Inventor: Hiroyuki Muto
  • Publication number: 20020008208
    Abstract: For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.
    Type: Application
    Filed: February 27, 2001
    Publication date: January 24, 2002
    Applicant: Hitachi, Ltd.
    Inventors: Hiroyuki Muto, Tohru Ishitani, Yuichi Madokoro