Patents by Inventor Hiroyuki Nagaksaka

Hiroyuki Nagaksaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure method, exposure apparatus, and method for producing device
    Patent number: 8488108
    Abstract: A method for forming a liquid immersion area with a liquid on an object, includes determining a condition for forming the liquid immersion area based on affinity between the liquid and a liquid contact surface of the object, and forming the liquid immersion area under the determined condition.
    Type: Grant
    Filed: July 31, 2008
    Date of Patent: July 16, 2013
    Assignee: Nikon Corporation
    Inventor: Hiroyuki Nagaksaka
  • Exposure method, exposure apparatus, and method for producing device
    Patent number: 7495744
    Abstract: When exposing a substrate by projecting a pattern image onto the substrate via a projection optical system (PL) and liquid (1), an exposure method includes a determination of a liquid immersion condition to be performed to the substrate, such as a liquid type, depending on a film (SP) formed as a liquid contact surface of the substrate. The liquid type is selected by switching between a first liquid supply section (11) and a third liquid supply section (21). It is possible to smoothly perform immersion exposure for the substrate (P) on which a different photo-resist layer is provided.
    Type: Grant
    Filed: November 22, 2005
    Date of Patent: February 24, 2009
    Assignee: Nikon Corporation
    Inventor: Hiroyuki Nagaksaka