Patents by Inventor Hiroyuki Nii

Hiroyuki Nii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for resist pattern-refinement, and fine pattern-forming method
    Patent number: 9354523
    Abstract: A composition for resist pattern-refinement includes an ion represented by formula (1-1), an ion represented by formula (1-2), an ion represented by formula (2-1), an ion represented by formula (2-2) and a solvent. A total amount of the ions blended is no less than 50% by mass with respect to a sum of components other than the solvent. R1 represents a monovalent organic group having 1 to 30 carbon atoms or a fluorine atom; Z represents a single bond or a divalent linking group; R2 represents a single bond, a divalent hydrocarbon group having 1 to 10 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; M+ represents a monovalent cation; and R3 represents a monovalent organic group having 1 to 30 carbon atoms.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: May 31, 2016
    Assignee: JSR Corporation
    Inventors: Yuuko Kiridoshi, Hiroyuki Nii, Tsuyoshi Furukawa, Takeo Shioya
  • COMPOSITION FOR FORMING FINE RESIST PATTERN, AND FINE PATTERN-FORMING METHOD
    Publication number: 20160011513
    Abstract: A composition for resist pattern-refinement includes an ion represented by formula (1-1), an ion represented by formula (1-2), an ion represented by formula (2-1), an ion represented by formula (2-2) and a solvent. A total amount of the ions blended is no less than 50% by mass with respect to a sum of components other than the solvent. R1 represents a monovalent organic group having 1 to 30 carbon atoms or a fluorine atom; Z represents a single bond or a divalent linking group; R2 represents a single bond, a divalent hydrocarbon group having 1 to 10 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; M+ represents a monovalent cation; and R3 represents a monovalent organic group having 1 to 30 carbon atoms.
    Type: Application
    Filed: July 9, 2015
    Publication date: January 14, 2016
    Applicant: JSR Corporation
    Inventors: Yuuko Kiridoshi, Hiroyuki Nii, Tsuyoshi Furukawa, Takeo Shioya